High sensitivity ultraviolet radiation detector

Claim 2

A high sensitivity ultraviolet radiation detecting photodiode formed in silicon carbide and comprising: a single crystal substrate of silicon carbide having a first conductivity type; a first epitaxial layer of silicon carbide upon said substrate and having the same conductivity type as said substrate; a top epitaxial layer of silicon carbide upon said first epitaxial layer for being exposed to incident electromagnetic radiation, and having the opposite conductivity type from said first layer and said substrate; said first epitaxial layer and said top epitaxial layer forming a p-n junction therebetween; said first layer having a carrier concentration sufficiently lower than the carrier concentration of said top layer so that the depletion region of said p-n junction forms predominantly in said first layer at equilibrium; said first layer further having a defined thickness that is sufficient to support said depletion region and that is greater than the diffusion length of minority carriers in said first layer so that electron-hole pairs generated by photons absorbed in said first layer will diffuse to said depletion region within their carrier lifetimes; said top epitaxial layer having a defined thickness less than the thickness of said first layer and that is larger than the zero bias depletion layer width in said top layer while small enough to avoid substantial absorption of ultraviolet radiation in said top layer and thin enough so that radiation in the ultraviolet range generates carriers predominantly in said depletion region of said p-n junction; said top epitaxial layer further having a carrier concentration large enough to substantially reduce the series and sheet resistance; and ohmic contacts to said top epitaxial layer and to said substrate.

Claim 3

A photodiode according to claim 1 wherein said substrate has p-type conductivity, said first epitaxial layer has p-type conductivity, and said top epitaxial layer has n-type conductivity.

Claim 4

A photodiode according to claim 2 wherein said ohmic contact to said top epitaxial layer comprises nickel and said ohmic contact to said substrate comprises aluminum or an aluminum alloy.

Claim 5

A photodiode according to claim 1 wherein said substrate has n-type conductivity, said first epitaxial layer has n-type conductivity, and said top epitaxial layer has p-type conductivity.

Claim 6

A photodiode according to claim 4 wherein said ohmic contact to said top epitaxial layer comprises aluminum or an aluminum alloy and said ohmic contact to said substrate comprises nickel.

Claim 7

A photodiode according to claim 1 wherein the thickness of said top epitaxial layer is sufficiently greater than the thickness of said ohmic contact to said top epitaxial layer to prevent spiking of the ohmic contact through said top epitaxial layer to said first epitaxial layer therebeneath.

Claim 8

A photodiode according to claim 6 wherein the ratio of the thickness of said top epitaxial layer to the thickness of said ohmic contact is at least about 4:1.

Claim 9

A photodiode according to claim 6 wherein the ratio of the thickness of said top epitaxial layer to the thickness of said ohmic contact is between about 4:1 and 6:1.

Claim 10

A photodiode according to claim 1 wherein said substrate and said first and top epitaxial layers are formed from a single polytype of silicon carbide.

Claim 11

A photodiode according to claim 9 wherein said single polytype is selected from the group consisting of 6H, 4H, 2H, 15R, and 3C.

Claim 12

A photodiode according to claim 1 and further comprising an antireflective coating upon said top layer.

Claim 13

A photodiode according to claim 11 wherein said antireflective coating is selected from the group consisting of silicon dioxide and aluminum oxide.

Claim 14

A high sensitivity ultraviolet radiation detecting photodiode formed in silicon carbide and comprising: a single crystal substrate of silicon carbide having a first conductivity type; an additional epitaxial layer of silicon carbide upon said substrate and having the opposite conductivity type from said substrate; a first epitaxial layer of silicon carbide upon said additional epitaxial layer and having the same conductivity type as said additional epitaxial layer; a top epitaxial layer of silicon carbide upon said first epitaxial layer for being exposed to incident electromagnetic radiation, and having the opposite conductivity type from said first layer and said additional layer; said first epitaxial layer and said top epitaxial layer forming a p-n junction therebetween; said first layer having a carrier concentration sufficiently lower than the carrier concentration of said top layer so that the depletion region of said p-n junction forms predominantly in said first layer at equilibrium; said first layer further having a defined thickness that is sufficient to support said depletion region and that is greater than the diffusion length of minority carriers in said first layer so that electron-hole pairs generated by photons absorbed in said first layer will diffuse to said depletion region within their carrier lifetimes; said top epitaxial layer having a defined thickness less than the thickness of said first layer and that is larger than the zero bias depletion layer width in said top layer while small enough to avoid substantial absorption of ultraviolet radiation in said top layer and thin enough so that radiation in the ultraviolet range generates carriers predominantly in said depletion region of said p-n junction; said top epitaxial layer further having a carrier concentration large enough to substantially reduce the series and sheet resistance; and ohmic contacts to said top epitaxial layer and to said substrate.

Claim 15

A high sensitivity ultraviolet radiation detecting photodiode formed in silicon carbide and comprising: a single crystal substrate of silicon carbide having a first conductivity type; an additional epitaxial layer of silicon carbide upon said substrate and having the opposite conductivity type from said substrate; a first epitaxial layer of silicon carbide upon said additional epitaxial layer and having the same conductivity type as said additional epitaxial layer; a top epitaxial layer of silicon carbide upon said first epitaxial layer for being exposed to incident electromagnetic radiation, and having the opposite conductivity type from said first layer and said additional layer; said first epitaxial layer and said top epitaxial layer forming a p-n junction therebetween; said first layer having a carrier concentration sufficiently lower than the carrier concentration of said top layer so that the depletion region of said p-n junction forms predominantly in said first layer at equilibrium; said first layer further having a defined thickness that is sufficient to support said depletion region and that is greater than the diffusion length of minority carriers in said first layer so that electron-hole pairs generated by photons absorbed in said first layer will diffuse to said depletion region within their carrier lifetimes; said top epitaxial layer having a defined thickness less than the thickness of said first layer and that is larger than the zero bias depletion layer width in said top layer while small enough to avoid substantial absorption of ultraviolet radiation in said top layer and thin enough so that radiation in the ultraviolet range generates carriers predominantly in said depletion region of said p-n junction; said top epitaxial layer further having a carrier concentration large enough to substantially reduce the series and sheet resistance; and ohmic contacts to said top epitaxial layer and to said substrate.

Claim 16

A high sensitivity ultraviolet radiation detecting photodiode formed in silicon carbide and comprising: a single crystal substrate of alpha silicon carbide having a first conductivity type; a first epitaxial layer of silicon carbide upon said substrate and having the same conductivity type as said substrate; a top epitaxial layer of silicon carbide upon said first epitaxial layer and having the opposite conductivity type from said first layer and said substrate, said top layer having a thickness of no more than about 300 nanometers; a p-n junction between said first epitaxial layer and said top epitaxial layer; and ohmic contacts to said substrate and to said top layer.

Claim 17

A high sensitivity ultraviolet radiation detecting photodiode formed in silicon carbide and comprising: a single crystal substrate of alpha silicon carbide having a first conductivity type; a first epitaxial layer of silicon carbide upon said substrate and having the same conductivity type as said substrate; a top epitaxial layer of silicon carbide upon said first epitaxial layer and having the opposite conductivity type from said first layer and said substrate, said top layer having a thickness of no more than about 300 nanometers; a p-n junction between said first epitaxial layer and said top epitaxial layer; and ohmic contacts to said substrate and to said top layer.

Claim 18

A photodiode according to claim 14 wherein said silicon carbide substrate comprises alpha silicon carbide and has a flat interface surface that is inclined more than one degree off axis with respect to a basal plane thereof substantially towards one of the <1120> directions, and with said first epitaxial layer comprising alpha silicon carbide homoepitaxially deposited on said substrate interface surface.

Claim 19

A photodiode according to claim 14 wherein said substrate comprises 6H alpha silicon carbide and said first epitaxial layer comprises beta silicon carbide upon said substrate and having the opposite conductivity type from said substrate and wherein said beta silicon carbide is epitaxially deposited in the [111] growth direction on the (0001) Si face of said 6H silicon carbide substrate such that the (111) crystallography of the beta silicon carbide thin film matches the (0001) crystallography of the 6H silicon carbide substrate and such that the beta silicon carbide (101) face is parallel to the 6H silicon carbide (11 20) face and the beta silicon carbide (111) face is parallel to the 6H silicon carbide (0001) face.

Claim 20

A photodiode according to claim 14 wherein the carrier concentration of said top layer is greater than the carrier concentration of said first layer by an amount sufficient for the depletion region to form predominantly in said first layer.

Claim 21

A photodiode according to claim 14 wherein said first epitaxial layer has a thickness of between 2 and 5 microns.

Claim 22

A high sensitivity ultraviolet radiation detecting photodiode formed in silicon carbide and comprising: a single crystal substrate of alpha silicon carbide having a first conductivity type; an additional epitaxial layer of silicon carbide upon said substrate and having the opposite conductivity type from said substrate; a first epitaxial layer of silicon carbide upon said additional epitaxial layer and having the same conductivity type as said additional epitaxial layer; a top epitaxial layer of silicon carbide upon said first epitaxial layer and having the opposite conductivity type from said first layer and said additional layer, said top layer having a thickness of no more than about 300 nanometers; a p-n junction between said first epitaxial layer and said top epitaxial layer; and ohmic contacts to said substrate and to said top layer.

Claim 23

A high sensitivity ultraviolet radiation detecting photodiode formed in silicon carbide and comprising: a single crystal substrate of alpha silicon carbide having a first conductivity type; an additional epitaxial layer of silicon carbide upon said substrate and having the opposite conductivity type from said substrate; a first epitaxial layer of silicon carbide upon said additional epitaxial layer and having the same conductivity type as said additional epitaxial layer; a top epitaxial layer of silicon carbide upon said first epitaxial layer and having the opposite conductivity type from said first layer and said additional layer, said top layer having a thickness of no more than about 300 nanometers; a p-n junction between said first epitaxial layer and said top epitaxial layer; and ohmic contacts to said substrate and to said top layer.

Claim 24

A high sensitivity radiation detecting photodiode formed in silicon carbide and comprising: a monocrystalline silicon carbide substrate a first monocrystalline portion of silicon carbide upon said substrate and having a first conductivity type; a second monocrystalline portion of silicon carbide adjacent said first portion and having the opposite conductivity type from said first portion; and a p-n junction between said adjacent first and second portions for providing a dark current density of no more than about 1×10 -9 amps/cm 2 at a reverse bias of -1.0 volts and at temperatures of 170° C. or less.

Claim 25

A high sensitivity radiation detecting photodiode formed in silicon carbide and comprising: a monocrystalline silicon carbide substrate a first monocrystalline portion of silicon carbide upon said substrate and having a first conductivity type; a second monocrystalline portion of silicon carbide adjacent said first portion and having the opposite conductivity type from said first portion; and a p-n junction between said adjacent first and second portions for providing a dark current density of no more than about 1×10 -9 amps/cm 2 at a reverse bias of -1.0 volts and at temperatures of 170° C. or less.

Claim 26

A photodiode according to claim 20 wherein said p-n junction provides a dark current density of no more than about 1×10 -11 amps/cm 2 at a reverse bias of -1.0 volts and at temperatures of 100° C. or less.

Claim 27

A photodiode according to claim 20 wherein said p-n junction provides a dark current density of no more than about 7×10 -13 amps/cm 2 at a reverse bias of -1.0 volts and at temperatures of 60° C. or less.

Claim 28

A photodiode according to claim 20 wherein said first monocrystalline portion of silicon carbide comprises an epitaxial layer upon said substrate and said second portion comprises a well within said epitaxial layer.

Claim 29

A photodiode according to claim 23 wherein said well comprises an ion implanted well.

Claim 32

A method according to claim 25 wherein the step of exposing the photodiode comprises exposing a photodiode that has a dark current density of no more than about 1×10 -11 amps/cm -2 at a reverse bias of -1.0 volts and at temperatures of 100° C. or less.

Claim 33

A method according to claim 25 wherein the step of exposing the photodiode comprises exposing a photodiode that has a dark current density of no more than about 7×10 -13 amps/cm -2 at a reverse bias of -1.0 volts and at temperatures of 60° C. or less.