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US5084299A
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Method for patterning electroless plated metal on a polymer substrate
Assignee: Microelectronics and Computer Technology Corp
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Filing: 1990-10-19
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Granted: 1992-01-28
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Expires: 2010-10-19
Abstract
Abstract A method for patterning electroless plated metal on a polymer substrate. In a first embodiment a substrate is first coated with a polymer suitable for complexing a seed metal which can initiate electroless plating. The polymer is then mixed with a seed metal such as palladium, selectively irradiated to form the desired conductor pattern, and then etched so that the desired pattern remains. The substrate is subsequently placed in an electroless plating bath to form a metal pattern. In a second embodiment, before applying the seed metal a substrate immersed in a polymer solution suitable for complexing a seed metal can be selectively irradiated to selectively deposit polymer on the substrate, followed by applying a seed metal to form a polymer-seed metal mixture and an electroless plating bath. In addition, an alkaline chemical may be added to an acidic polymer to prevent the polymer from etching metal on the substrate.
Inventors
- 👤 Tom J. Hirsch
- 👤 Charles W. C. Lin
- 👤 Ian Y. K. Yee
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 14:39
CPC Classifications
C; C23; C23C; C23C18/00; C23C18/16; C23C18/1601; C23C18/1603; C23C18/1607; C23C18/1608; C23C18/1612; C23C18/18; C23C18/20; C23C18/2006; C23C18/2026; C23C18/204; C23C18/2046; C23C18/2073; C23C18/208; C23C18/2086; C23C18/28; C23C18/30; C23C18/31; C23C18/32; C23C18/38; C23C18/42; H; H05; H05K; H05K3/00; H05K3/10; H05K3/18; H05K3/181; H05K3/182; H05K3/185; H05K2203/00; H05K2203/10; H05K2203/107
Claims Analysis
Total Claims: 47
Claim 1
Independent Claim
171 words
A process for the selective deposition of a conductor on a substrate comprising the following steps in the sequence set forth: (a) coating the substrate with a layer of a polymer-seed metal mixture, wherein the polymer is complexed with the seed metal by mixing the polymer and seed metal ions in solution and the seed metal is a metal which can initiate electroless plating, () drying the polymer-seed metal mixture, (c) selectively irradiating the polymer-seed metal mixture in a predetermined pattern, (d) applying a chemical etch to the polymer-seed metal mixture so that the irradiated portions of the polymer-seed metal mixture etch at a slower rate than the non-irradiated portions of the polymer-seed metal mixture, (e) removing the chemical etch and the etched polymer-seed metal mixture from the substrate wherein the polymer-seed metal mixture remaining on the substrate corresponds to the predetermined pattern, and (f) placing the polymer-seed metal mixture remaining on the substrate in an electroless plating bath so that the desired conductor pattern is formed in the predetermined pattern.
Claim 2
Dependent Claim
171 words
A process for the selective deposition of a conductor on a substrate comprising the following steps in the sequence set forth: (a) coating the substrate with a layer of a polymer-seed metal mixture, wherein the polymer is complexed with the seed metal by mixing the polymer and seed metal ions in solution and the seed metal is a metal which can initiate electroless plating, () drying the polymer-seed metal mixture, (c) selectively irradiating the polymer-seed metal mixture in a predetermined pattern, (d) applying a chemical etch to the polymer-seed metal mixture so that the irradiated portions of the polymer-seed metal mixture etch at a slower rate than the non-irradiated portions of the polymer-seed metal mixture, (e) removing the chemical etch and the etched polymer-seed metal mixture from the substrate wherein the polymer-seed metal mixture remaining on the substrate corresponds to the predetermined pattern, and (f) placing the polymer-seed metal mixture remaining on the substrate in an electroless plating bath so that the desired conductor pattern is formed in the predetermined pattern.
Claim 3
Dependent Claim
15 words
The process in claim 2 wherein prior to step (a) the substrate surface is cleaned.
Claim 4
Dependent Claim
19 words
The process in claim 1 wherein the polymer is selected from the group consisting of poly(acrylic acid) and polyacrylamid.
Claim 5
Dependent Claim
24 words
The process in claim 1 wherein the seed metal is selected from the group consisting of palladium, platinum, gold, rhodium, and any mixture thereof.
Claim 6
Dependent Claim
14 words
The process in claim 1 wherein the source of irradiation is a laser beam.
Claim 7
Dependent Claim
18 words
The process in claim 1 wherein the etchant is selected from the group consisting of KOH and NaOH.
Claim 8
Dependent Claim
26 words
The process in claim 1 wherein the electroless plating bath is used to plate a metal selected from the group consisting of copper, nickel, and gold.
Claim 9
Dependent Claim
204 words
A process for the selective deposition of a conductor on a substrate comprising the following steps in the sequence set forth: (a) coating the substrate with a mixture of a polymer and a seed metal, wherein the polymer is complexed with the seed metal by mixing the polymer and seed metal ions in solution and the seed metal is a metal which can initiate electroless plating selected from the group consisting of palladium, platinum, gold, rhodium, and any mixture thereof to form a layer of polymer-seed metal mixture. (b) drying the polymer-seed metal mixture, (c) selectively irradiating the polymer-seed metal mixture in a predetermined pattern, (d) applying a chemical etch to a polymer-seed metal mixture so that the irradiated portions of the polymer-seed metal mixture etch at a slower rate than the non-irradiated portions of the polymer-seed metal mixture, (e) removing the chemical etch and the etched polymer-seed metal mixture from the substrate wherein the polymer-seed metal mixture remaining on the substrate corresponds to the predetermined pattern, and (f) placing the polymer-seed metal mixture remaining on the substrate in an electroless plating bath from the group consisting of copper, nickel and gold so that the desired conductor pattern is formed in the predetermined pattern.
Claim 10
Dependent Claim
204 words
A process for the selective deposition of a conductor on a substrate comprising the following steps in the sequence set forth: (a) coating the substrate with a mixture of a polymer and a seed metal, wherein the polymer is complexed with the seed metal by mixing the polymer and seed metal ions in solution and the seed metal is a metal which can initiate electroless plating selected from the group consisting of palladium, platinum, gold, rhodium, and any mixture thereof to form a layer of polymer-seed metal mixture. (b) drying the polymer-seed metal mixture, (c) selectively irradiating the polymer-seed metal mixture in a predetermined pattern, (d) applying a chemical etch to a polymer-seed metal mixture so that the irradiated portions of the polymer-seed metal mixture etch at a slower rate than the non-irradiated portions of the polymer-seed metal mixture, (e) removing the chemical etch and the etched polymer-seed metal mixture from the substrate wherein the polymer-seed metal mixture remaining on the substrate corresponds to the predetermined pattern, and (f) placing the polymer-seed metal mixture remaining on the substrate in an electroless plating bath from the group consisting of copper, nickel and gold so that the desired conductor pattern is formed in the predetermined pattern.
Claim 11
Dependent Claim
15 words
The process in claim 8 wherein prior to step (a) the substrate surface is cleaned.
Claim 12
Dependent Claim
19 words
The process in claim 8 wherein the polymer is selected from the group consisting of poly(acrylic acid) and polyarcylamid.
Claim 13
Dependent Claim
14 words
The process in claim 8 wherein the source of irradiation is a laser beam.
Claim 14
Dependent Claim
18 words
The process in claim 8 wherein the etchant is selected from the group consisting of KOH and NaOH.
Claim 15
Dependent Claim
185 words
A process for the selective deposition of a conductor on a substrate comprising the following steps in the sequence set forth: (a) coating the substrate with a layer of a polymer which can complex with a seed metal, wherein the seed metal is a metal which can initiate electroless plating, (b) contacting the layer of polymer with a solution containing seed metal ions to form a polymer-seed metal mixture wherein the polymer is complexed with the seed metal, (c) drying the polymer-seed metal mixture, (d) selectively irradiating the polymer-seed metal mixture in a predetermined pattern, (e) applying a chemical etch to the polymer-seed metal mixture so that the irradiated portions of the polymer-seed metal mixture etch at a slower rate than the non-irradiated portions of the polymer-seed metal mixture, (f) removing the chemical etch and the etched polymer-seed metal mixture from the substrate wherein the polymer-seed metal mixture remaining on the substrate corresponds to the predetermined pattern, and (g) placing the polymer-seed metal mixture remaining on the substrate in an electroless plating both so that the desired conductor pattern is formed in the predetermined pattern.
Claim 16
Dependent Claim
185 words
A process for the selective deposition of a conductor on a substrate comprising the following steps in the sequence set forth: (a) coating the substrate with a layer of a polymer which can complex with a seed metal, wherein the seed metal is a metal which can initiate electroless plating, (b) contacting the layer of polymer with a solution containing seed metal ions to form a polymer-seed metal mixture wherein the polymer is complexed with the seed metal, (c) drying the polymer-seed metal mixture, (d) selectively irradiating the polymer-seed metal mixture in a predetermined pattern, (e) applying a chemical etch to the polymer-seed metal mixture so that the irradiated portions of the polymer-seed metal mixture etch at a slower rate than the non-irradiated portions of the polymer-seed metal mixture, (f) removing the chemical etch and the etched polymer-seed metal mixture from the substrate wherein the polymer-seed metal mixture remaining on the substrate corresponds to the predetermined pattern, and (g) placing the polymer-seed metal mixture remaining on the substrate in an electroless plating both so that the desired conductor pattern is formed in the predetermined pattern.
Claim 17
Dependent Claim
15 words
The process in claim 13 wherein prior to step (a) the substrate surface is cleaned.
Claim 18
Dependent Claim
19 words
The process in claim 13 wherein the polymer is selected from the group consisting of poly(acrylic acid) and polyarcylamid.
Claim 19
Dependent Claim
24 words
The process in claim 13 wherein the seed metal is selected from the group consisting of palladium, platinum, gold, rhodium, and any mixture thereof.
Claim 20
Dependent Claim
14 words
The process in claim 13 wherein the source of irradiation is a laser beam.
Claim 21
Dependent Claim
18 words
The process in claim 13 wherein the etchant is selected from the group consisting of KOH and NaOH.
Claim 22
Dependent Claim
26 words
The process in claim 13 wherein the electroless plating bath is used to plate a metal selected from the group consisting of copper, nickel, and gold.
Claim 23
Dependent Claim
207 words
A process for the selective deposition of a conductor on a substrate comprising the following steps in the sequence set forth: (a) coating the substrate with a layer of a polymer which can complex with a seed metal, wherein the seed metal is a metal which can initiate electroless plating, (b) contacting the layer of polymer with a solution containing seed metal ions selected from the group consisting of palladium, platinum, gold, rhodium, and any mixture thereof to form a polymer-seed metal mixture wherein the polymer is complexed with the seed metal, (c) drying the polymer-seed metal mixture, (d) selectively irradiating the polymer-seed metal mixture in a predetermined pattern, (e) applying a chemical etch to the polymer-seed metal mixture so that the irradiated portions of the polymer-seed metal mixture etch at a slower rate than the non-irradiated portions of the polymer-seed metal mixture. (f) removing the chemical etch and etched polymer-seed metal mixture from the substrate wherein the polymer-seed metal mixture remaining on the substrate corresponds to the predetermined pattern, and (g) placing the polymer-seed metal mixture remaining on the substrate in an electroless plating bath from the group consisting of copper, nickel and gold so that the desired conductor pattern is formed in the predetermined pattern.
Claim 24
Dependent Claim
207 words
A process for the selective deposition of a conductor on a substrate comprising the following steps in the sequence set forth: (a) coating the substrate with a layer of a polymer which can complex with a seed metal, wherein the seed metal is a metal which can initiate electroless plating, (b) contacting the layer of polymer with a solution containing seed metal ions selected from the group consisting of palladium, platinum, gold, rhodium, and any mixture thereof to form a polymer-seed metal mixture wherein the polymer is complexed with the seed metal, (c) drying the polymer-seed metal mixture, (d) selectively irradiating the polymer-seed metal mixture in a predetermined pattern, (e) applying a chemical etch to the polymer-seed metal mixture so that the irradiated portions of the polymer-seed metal mixture etch at a slower rate than the non-irradiated portions of the polymer-seed metal mixture. (f) removing the chemical etch and etched polymer-seed metal mixture from the substrate wherein the polymer-seed metal mixture remaining on the substrate corresponds to the predetermined pattern, and (g) placing the polymer-seed metal mixture remaining on the substrate in an electroless plating bath from the group consisting of copper, nickel and gold so that the desired conductor pattern is formed in the predetermined pattern.
Claim 25
Dependent Claim
15 words
The process in claim 20 wherein prior to step (a) the substrate surface is cleaned.
Claim 26
Dependent Claim
19 words
The process in claim 20 wherein the polymer is selected from the group consisting of poly(acrylic acid) and polyacrylamid.
Claim 27
Dependent Claim
14 words
The process in claim 20 wherein the source of irradiation is a laser beam.
Claim 28
Dependent Claim
18 words
The process in claim 20 wherein the etchant is selected from the group consisting of KOH and NaOH.
Claim 29
Dependent Claim
145 words
A process for the selective deposition of a conductor on a substrate comprising the following steps in the sequence set forth: (a) immersing the substrate in a solution of a polymer which can complex with a seed metal, wherein the seed metal is a metal which can initiate electroless plating, (b) selectively irradiating the immersed substrate in a predetermined pattern so that the polymer is selectively deposited on the substrate where localized heating occurs corresponding to the predetermined pattern, (c) removing the non-deposited polymer solution from the substrate, (d) contacting the deposited polymer with a solution containing seed metal ions to form a deposited polymer-seed mixture wherein the deposited polymer is complexed with the seed metal, and (e) placing the deposited polymer-seed metal mixture remaining on the substrate in an electroless plating bath so that the desired conductor pattern is formed in the predetermined pattern.
Claim 30
Dependent Claim
145 words
A process for the selective deposition of a conductor on a substrate comprising the following steps in the sequence set forth: (a) immersing the substrate in a solution of a polymer which can complex with a seed metal, wherein the seed metal is a metal which can initiate electroless plating, (b) selectively irradiating the immersed substrate in a predetermined pattern so that the polymer is selectively deposited on the substrate where localized heating occurs corresponding to the predetermined pattern, (c) removing the non-deposited polymer solution from the substrate, (d) contacting the deposited polymer with a solution containing seed metal ions to form a deposited polymer-seed mixture wherein the deposited polymer is complexed with the seed metal, and (e) placing the deposited polymer-seed metal mixture remaining on the substrate in an electroless plating bath so that the desired conductor pattern is formed in the predetermined pattern.
Claim 31
Dependent Claim
15 words
The process in claim 25 wherein prior to step (a) the substrate surface is cleaned.
Claim 32
Dependent Claim
19 words
The process in claim 25 wherein the polymer is selected from the group consisting of poly(acrylic acid) and polyacrylamid.
Claim 33
Dependent Claim
24 words
The process in claim 25 wherein the seed metal is selected from the group consisting of palladium, platinum, gold, rhodium, and any mixture thereof.
Claim 34
Dependent Claim
14 words
The process in claim 25 wherein the source of irradiation is a laser beam.
Claim 35
Dependent Claim
26 words
The process in claim 25 wherein the electroless plating both is used to plate a metal selected from the group consisting of copper, nickel, and gold.
Claim 36
Dependent Claim
169 words
A process for the selective deposition of a conductor on a substrate comprising the following steps in the sequence set forth: (a) immersing the substrate in a solution of a polymer which can complex with a seed metal, wherein the seed metal is a metal which can initiate electroless plating, (b) selectively irradiating the immersed substrate in a predetermined pattern so that the polymer is selectively deposited on the substrate where localized heating occurs corresponding to the predetermined pattern, (c) removing the non-deposited polymer solution from the substrate, (d) contacting the deposited polymer with a solution containing seed metal ions selected from the group consisting of palladium, platinum, gold, rhodium, and any mixture thereof to form a deposited polymer-seed metal mixture wherein the deposited polymer is complexed with the seed metal, and (e) placing the deposited polymer-seed metal mixture remaining on the substrate in an electroless plating bath from the group consisting of copper, nickel, and gold so that the desired conductor pattern is formed in the predetermined pattern.
Claim 37
Dependent Claim
169 words
A process for the selective deposition of a conductor on a substrate comprising the following steps in the sequence set forth: (a) immersing the substrate in a solution of a polymer which can complex with a seed metal, wherein the seed metal is a metal which can initiate electroless plating, (b) selectively irradiating the immersed substrate in a predetermined pattern so that the polymer is selectively deposited on the substrate where localized heating occurs corresponding to the predetermined pattern, (c) removing the non-deposited polymer solution from the substrate, (d) contacting the deposited polymer with a solution containing seed metal ions selected from the group consisting of palladium, platinum, gold, rhodium, and any mixture thereof to form a deposited polymer-seed metal mixture wherein the deposited polymer is complexed with the seed metal, and (e) placing the deposited polymer-seed metal mixture remaining on the substrate in an electroless plating bath from the group consisting of copper, nickel, and gold so that the desired conductor pattern is formed in the predetermined pattern.
Claim 38
Dependent Claim
15 words
The process in claim 31 wherein prior to step (a) the substrate surface is cleaned.
Claim 39
Dependent Claim
19 words
The process in claim 31 wherein the polymer is selected from the group consisting of poly(acrylic acid) and polyarcylamid.
Claim 40
Dependent Claim
14 words
The process in claim 31 wherein the source of irradiation is a laser beam.
Claim 41
Dependent Claim
49 words
The process of claims 1, 8, 13, 20, 25, or 31, wherein a metal is present on the substrate, and further comprising adding an alkaline chemical to a polymer solution to increase the PH of the polymer, thereby reducing the ability of the polymer to assist in metal etching.
Claim 42
Dependent Claim
22 words
The process of claim 35, wherein the alkaline chemical is added to the polymer prior to contacting the substrate with the polymer.
Claim 43
Dependent Claim
20 words
The process of claim 35, wherein the alkaline chemical raises the PH of the polymer solution to at least 4.
Claim 44
Dependent Claim
13 words
The process of claim 35, wherein the metal on the substrate is copper.
Claim 45
Dependent Claim
11 words
The process of claim 35, wherein the polymer is poly(acrylic acid).
Claim 46
Dependent Claim
12 words
The process of claim 35, wherein the alkaline chemical is ammonium hydroxide.
Claim 47
Dependent Claim
52 words
The process of claim 35, wherein a plurality of metals on the substrate comprise chrome on a polyimide dielectric, copper on the chrome, nickel on the copper, and gold on the nickel, and these metals adhere well to the substrate after the polymer is removed from the nonirradiated regions of the substrate.
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