US5073518A
Expired / Lapsed
US
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Process to mechanically and plastically deform solid ductile metal to fill contacts of conductive channels with ductile metal and process for dry polishing excess metal from a semiconductor wafer
Assignee: Micron Technology Inc
•
Filing: 1991-06-20
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Granted: 1991-12-17
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Expires: 2011-06-20
Abstract
Abstract A method of forming a conductive via plug or an interconnect line, or both, of solid ductile metal within an integrated circuit using plastic deformation of the solid metal, and a dry polishing method of removing excess metal from a metal layer atop an underlying layer on a semiconductor substrate wafer. The process begins with a wafer having a dielectric layer, the upper surface of which has been planarized. If both conductive via plugs and interconnect lines are both required within the circuit, a first masking step defines the interconnect lines. A first etch creates channels in the interconnect line locations. A second masking step defines the vias. A second etch creates the vias which pass through the dielectric layer to conductive regions below where contact is to be made. A layer of solid ductile metal is then deposited on top of the dielectric layer. Using a disk or pad which is held in contact with the ductile metal layer, metal of the ductile layer is mechanically worked to plastically deformed more deeply into the channels and vias. The wafer is then dry polished with a solid material having a hardness which is less than both the hardness of the metal and the hardness of the underlying layer to provide remaining metal from the metal layer which is only in conductive interconnect lines or vias.
Inventors
- 👤 Trung Doan
- 👤 Mark E. Tuttle
- 👤 Tyler A. Lowrey
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 17:43
CPC Classifications
H; H10; H10W; H10W20/00; H10W20/01; H10W20/071; H10W20/081; H10W20/084; H10P; H10P52/00; H10P52/40; H10P52/403; H10W20/031; H10W20/056; H10W20/059; H10W20/062; Y; Y10; Y10S; Y10S438/00; Y10S438/959
Claims Analysis
Total Claims: 56
Claim 1
Independent Claim
120 words
A method of forming a conductive path of ductile metal within an exposed, planarized dielectric layer of an integrated circuit comprising the following sequential steps: masking the dielectric layer with a photoresist mask in order to define a geometry of a conductive path; etching the dielectric layer in order to create a depression within the dielectric layer; removing the photoresist mask; depositing a ductile metal to provide a ductile, solid, unitary integral mass metal layer on top of the dielectric layer, the solid metal layer incompletely filling the depression; and plastically deforming the solid metal layer through an input of mechanical energy in order to ductilely force the ductile metal from the ductile metal layer more completely into the depression.
Claim 2
Independent Claim
120 words
A method of forming a conductive path of ductile metal within an exposed, planarized dielectric layer of an integrated circuit comprising the following sequential steps: masking the dielectric layer with a photoresist mask in order to define a geometry of a conductive path; etching the dielectric layer in order to create a depression within the dielectric layer; removing the photoresist mask; depositing a ductile metal to provide a ductile, solid, unitary integral mass metal layer on top of the dielectric layer, the solid metal layer incompletely filling the depression; and plastically deforming the solid metal layer through an input of mechanical energy in order to ductilely force the ductile metal from the ductile metal layer more completely into the depression.
Claim 3
Dependent Claim
32 words
The method of forming a conductive path of ductile metal of claim 1 wherein the step of plastically deforming is accomplished with a rotating disk maintained in contact with the metal layer.
Claim 4
Dependent Claim
22 words
The method of forming a conductive path of ductile metal of claim 2 comprising rotating the disk in a reciprocatingly bidirectional manner.
Claim 5
Dependent Claim
20 words
The method of forming a conductive path of ductile metal of claim 2 wherein the disk is made of metal.
Claim 6
Dependent Claim
23 words
The method of forming a conductive path of ductile metal of claim 2 wherein the disk is made of a polymer plastic material.
Claim 7
Dependent Claim
33 words
The method of forming a conductive path of ductile metal of claim 1 wherein the step of plastically deforming is accomplished with a non-rotating vibrating pad maintained in contact with said metal layer.
Claim 8
Dependent Claim
27 words
The method of forming a conductive path of ductile metal of claim 1 further comprising annealing the plastically deformed metal within the depression to cause recrystallization thereof.
Claim 9
Dependent Claim
33 words
The method of forming a conductive path of ductile metal of claim 7 wherein the annealing includes impinging laser energy onto the metal within the depression for sufficient duration to melt the metal.
Claim 10
Dependent Claim
34 words
The method of forming a conductive path of ductile metal of claim 8 the laser energy is impinged onto the metal in a raster array for about 25 nanoseconds per 3 square millimeter areas.
Claim 11
Dependent Claim
47 words
The method of forming a conductive path of ductile metal of claim 1 wherein the step of plastically deforming is accomplished with a rotating disk maintained in contact with the metal layer, and further comprising annealing the plastically deformed metal within the depression to cause recrystallization thereof.
Claim 12
Dependent Claim
66 words
The method of forming a conductive path of ductile metal of claim 1 wherein the step of plastically deforming is accomplished with a rotating disk maintained in contact with the metal layer, and further comprising annealing the plastically deformed metal within the depression to cause recrystallization thereof, the annealing including impinging laser energy onto the metal within the depression for sufficient duration to melt the metal.
Claim 13
Independent Claim
201 words
A method of forming an interconnect line within an exposed planarized dielectric layer of an integrated circuit, the interconnect lie communicating with a conductive plug within a via that contacts a conductive layer below said dielectric layer, the method comprising the following sequential steps; masking the dielectric layer with a first photoresist mask in order to define a geometry of an interconnect line; subjecting the dielectric layer to a first etch in order to create an interconnect line channel in the dielectric layer; removing the first photoresist mask; masking the dielectric layer with a second photoresist mask in order to define a geometry of a via, the via being at least partially coincident with the interconnect line channel; subjecting the dielectric layer to a second etch in order to create a via channel which extends through the dielectric layer to a conductive layer; depositing a ductile metal to provide a ductile, solid, unitary integral mass metal layer on top of the dielectric layer, the solid metal layer incompletely filling the depression; plastically deforming the solid metal layer through an input of mechanical energy in order to ductilely force the ductile metal from the ductile metal layer more completely into the depression.
Claim 14
Independent Claim
201 words
A method of forming an interconnect line within an exposed planarized dielectric layer of an integrated circuit, the interconnect lie communicating with a conductive plug within a via that contacts a conductive layer below said dielectric layer, the method comprising the following sequential steps; masking the dielectric layer with a first photoresist mask in order to define a geometry of an interconnect line; subjecting the dielectric layer to a first etch in order to create an interconnect line channel in the dielectric layer; removing the first photoresist mask; masking the dielectric layer with a second photoresist mask in order to define a geometry of a via, the via being at least partially coincident with the interconnect line channel; subjecting the dielectric layer to a second etch in order to create a via channel which extends through the dielectric layer to a conductive layer; depositing a ductile metal to provide a ductile, solid, unitary integral mass metal layer on top of the dielectric layer, the solid metal layer incompletely filling the depression; plastically deforming the solid metal layer through an input of mechanical energy in order to ductilely force the ductile metal from the ductile metal layer more completely into the depression.
Claim 15
Dependent Claim
32 words
The method of forming a conductive path of ductile metal of claim 12 wherein the step of plastically deforming is accomplished with a rotating disk maintained in contact with the metal layer.
Claim 16
Dependent Claim
33 words
The method of forming a conductive path of ductile metal of claim 12 wherein the step of plastically deforming is accomplished with a non-rotating vibrating pad maintained in contact with said metal layer.
Claim 17
Dependent Claim
27 words
The method of forming a conductive path of ductile metal of claim 12 further comprising annealing the plastically deformed metal within the depression to cause recrystallization thereof.
Claim 18
Independent Claim
110 words
A method of forming a conductive path of ductile metal within an exposed, planarized dielectric layer of an integrated circuit comprising the following sequential steps: masking the dielectric layer with a photoresist mask in order to define a geometry of a conductive path; etching the dielectric layer in order to create a depression within the dielectric layer; removing the photoresist mask; sputter depositing a ductile metal to provide a solid ductile metal layer on top of the dielectric layer; and plastically deforming the solid metal layer through an input of mechanical energy in order to ductilely force the ductile metal from the ductile metal layer more completely into the depression.
Claim 19
Independent Claim
110 words
A method of forming a conductive path of ductile metal within an exposed, planarized dielectric layer of an integrated circuit comprising the following sequential steps: masking the dielectric layer with a photoresist mask in order to define a geometry of a conductive path; etching the dielectric layer in order to create a depression within the dielectric layer; removing the photoresist mask; sputter depositing a ductile metal to provide a solid ductile metal layer on top of the dielectric layer; and plastically deforming the solid metal layer through an input of mechanical energy in order to ductilely force the ductile metal from the ductile metal layer more completely into the depression.
Claim 20
Dependent Claim
32 words
The method of forming a conductive path of ductile metal of claim 16 wherein the step of plastically deforming is accomplished with a rotating disk maintained in contact with the metal layer.
Claim 21
Dependent Claim
33 words
The method of forming a conductive path of ductile metal of claim 16 wherein the step of plastically deforming is accomplished with a non-rotating vibrating pad maintained in contact with said metal layer.
Claim 22
Dependent Claim
27 words
The method of forming a conductive path of ductile metal of claim 16 further comprising annealing the plastically deformed metal within the depression to cause recrystallization thereof.
Claim 23
Dependent Claim
33 words
The method of forming a conductive path of ductile metal of claim 19 wherein the annealing includes impinging laser energy onto the metal within the depression for sufficient duration to melt the metal.
Claim 24
Independent Claim
111 words
A method of forming a conductive path of ductile metal within an exposed, planarized dielectric layer of an integrated circuit comprising the following sequential steps: masking the dielectric layer with a photoresist mask in order to define a geometry of a conductive path; etching the dielectric layer in order to create a depression within the dielectric layer; removing the photoresist mask; chemical vapor depositing a ductile metal to provide a solid ductile metal layer on top of the dielectric layer; and plastically deforming the solid metal layer through an input of mechanical energy in order to ductilely force the ductile metal from the ductile metal layer more completely into the depression.
Claim 25
Independent Claim
111 words
A method of forming a conductive path of ductile metal within an exposed, planarized dielectric layer of an integrated circuit comprising the following sequential steps: masking the dielectric layer with a photoresist mask in order to define a geometry of a conductive path; etching the dielectric layer in order to create a depression within the dielectric layer; removing the photoresist mask; chemical vapor depositing a ductile metal to provide a solid ductile metal layer on top of the dielectric layer; and plastically deforming the solid metal layer through an input of mechanical energy in order to ductilely force the ductile metal from the ductile metal layer more completely into the depression.
Claim 26
Dependent Claim
32 words
The method of forming a conductive path of ductile metal of claim 21 wherein the step of plastically deforming is accomplished with a rotating disk maintained in contact with the metal layer.
Claim 27
Dependent Claim
33 words
The method of forming a conductive path of ductile metal of claim 21 wherein the step of plastically deforming is accomplished with a non-rotating vibrating pad maintained in contact with said metal layer.
Claim 28
Dependent Claim
27 words
The method of forming a conductive path of ductile metal of claim 21 further comprising annealing the plastically deformed metal within the depression to cause recrystallization thereof.
Claim 29
Dependent Claim
33 words
The method of forming a conductive path of ductile metal of claim 24 wherein the annealing includes impinging laser energy onto the metal within the depression for sufficient duration to melt the metal.
Claim 30
Independent Claim
189 words
A method of forming a conductive path of ductile metal within an exposed, planarized dielectric layer on a semiconductor wafer containing an integrated circuit, the dielectric layer having a defined hardness, the method comprising the following sequential steps: masking the dielectric layer with a photoresist mask in order to define a geometry of a conductive path; etching the dielectric layer in order to create a depression within the dielectric layer; removing the photoresist mask; depositing a solid ductile metal layer on top of the dielectric layer and within the depression, the solid metal of the solid metal layer having a defined hardness, the solid metal layer incompletely filling the depression; plastically deforming the solid the metal layer through the input of mechanical energy in order to ductilely force solid metal from the solid ductile metal layer more completely into the depression; and dry polishing without any slurry the solid metal layer with a solid material having a hardness which is less than both the hardness of the metal and the hardness of the dielectric layer to provide remaining metal from the metal layer which is only within the depression.
Claim 31
Independent Claim
189 words
A method of forming a conductive path of ductile metal within an exposed, planarized dielectric layer on a semiconductor wafer containing an integrated circuit, the dielectric layer having a defined hardness, the method comprising the following sequential steps: masking the dielectric layer with a photoresist mask in order to define a geometry of a conductive path; etching the dielectric layer in order to create a depression within the dielectric layer; removing the photoresist mask; depositing a solid ductile metal layer on top of the dielectric layer and within the depression, the solid metal of the solid metal layer having a defined hardness, the solid metal layer incompletely filling the depression; plastically deforming the solid the metal layer through the input of mechanical energy in order to ductilely force solid metal from the solid ductile metal layer more completely into the depression; and dry polishing without any slurry the solid metal layer with a solid material having a hardness which is less than both the hardness of the metal and the hardness of the dielectric layer to provide remaining metal from the metal layer which is only within the depression.
Claim 32
Dependent Claim
30 words
The method of forming a conductive path of ductile metal of claim 26 wherein the dry polishing is accomplished by rotating a disk which is contacted with the metal layer.
Claim 33
Dependent Claim
30 words
The method of forming a conductive path of ductile metal of claim 26 wherein the dry polishing is accomplished by vibrating a pad which is contacted with the metal layer.
Claim 34
Dependent Claim
32 words
The method of forming a conductive path of ductile metal of claim 26 wherein the step of plastically deforming is accomplished with a rotating disk maintained in contact with the metal layer.
Claim 35
Dependent Claim
33 words
The method of forming a conductive path of ductile metal of claim 26 wherein the step of plastically deforming is accomplished with a non-rotating vibrating pad maintained in contact with said metal layer.
Claim 36
Dependent Claim
28 words
The method of forming a conductive path of ductile metal of claim 26 further comprising annealing the plastically deformed remaining metal within the depression to cause recrystallization thereof.
Claim 37
Dependent Claim
33 words
The method of forming a conductive path of ductile metal of claim 31 wherein the annealing includes impinging laser energy onto the metal within the depression for sufficient duration to melt the metal.
Claim 38
Independent Claim
280 words
A method of forming an interconnect line within an exposed planarized dielectric layer on a semiconductor wafer containing an integrated circuit, the dielectric layer having a defined hardness, the interconnect line communicating with a conductive plug within a via that contacts a conductive layer below the dielectric layer, the method comprising the following sequential steps: masking the dielectric layer with a first photoresist mask in order to define a geometry of an interconnect line; subjecting the dielectric layer to a first etch in order to create an interconnect line channel in the dielectric layer; removing the first photoresist mask; masking the dielectric layer with a second photoresist mask in order to define a geometry of a via, the via being at least partially coincident with the interconnect line channel; subjecting the dielectric layer to a second etch in order to create a via channel which extends through the dielectric layer to a conductive layer on the wafer; depositing a solid ductile metal layer on top of the dielectric layer, the solid metal of the solid metal layer having a defined hardness, the solid metal layer incompletely filling the via channel; plastically deforming the solid metal layer through the input of mechanical energy in order to ductilely force solid metal from the solid ductile metal layer more completely into the via channel and into the interconnect line channel; and dry polishing without any slurry the solid metal layer with a solid material having a hardness which is less than both the hardness of the metal and the hardness of the dielectric layer to provide remaining metal from the metal layer which is only within the via and the interconnect line channel.
Claim 39
Independent Claim
280 words
A method of forming an interconnect line within an exposed planarized dielectric layer on a semiconductor wafer containing an integrated circuit, the dielectric layer having a defined hardness, the interconnect line communicating with a conductive plug within a via that contacts a conductive layer below the dielectric layer, the method comprising the following sequential steps: masking the dielectric layer with a first photoresist mask in order to define a geometry of an interconnect line; subjecting the dielectric layer to a first etch in order to create an interconnect line channel in the dielectric layer; removing the first photoresist mask; masking the dielectric layer with a second photoresist mask in order to define a geometry of a via, the via being at least partially coincident with the interconnect line channel; subjecting the dielectric layer to a second etch in order to create a via channel which extends through the dielectric layer to a conductive layer on the wafer; depositing a solid ductile metal layer on top of the dielectric layer, the solid metal of the solid metal layer having a defined hardness, the solid metal layer incompletely filling the via channel; plastically deforming the solid metal layer through the input of mechanical energy in order to ductilely force solid metal from the solid ductile metal layer more completely into the via channel and into the interconnect line channel; and dry polishing without any slurry the solid metal layer with a solid material having a hardness which is less than both the hardness of the metal and the hardness of the dielectric layer to provide remaining metal from the metal layer which is only within the via and the interconnect line channel.
Claim 40
Dependent Claim
30 words
The method of forming a conductive path of ductile metal of claim 33 wherein the dry polishing is accomplished by rotating a disk which is contacted with the metal layer.
Claim 41
Dependent Claim
30 words
The method of forming a conductive path of ductile metal of claim 33 wherein the dry polishing is accomplished by vibrating a pad which is contacted with the metal layer.
Claim 42
Dependent Claim
32 words
The method of forming a conductive path of ductile metal of claim 33 wherein the step of plastically deforming is accomplished with a rotating disk maintained in contact with the metal layer.
Claim 43
Dependent Claim
33 words
The method of forming a conductive path of ductile metal of claim 33 wherein the step of plastically deforming is accomplished with a non-rotating vibrating pad maintained in contact with said metal layer.
Claim 44
Dependent Claim
28 words
The method of forming a conductive path of ductile metal of claim 33 further comprising annealing the plastically deformed remaining metal within the depression to cause recrystallization thereof.
Claim 45
Dependent Claim
33 words
The method of forming a conductive path of ductile metal of claim 38 wherein the annealing includes impinging laser energy onto the metal within the depression for sufficient duration to melt the metal.
Claim 46
Independent Claim
103 words
A method of removing excess metal from a metal layer atop an underlying layer on a semiconductor substrate wafer, the metal layer having been applied to fill conductive interconnect lines or vias formed within the underlying layer, the metal and underlying layer having defined hardnesses, the method comprising: dry polishing the metal layer without any slurry, the dry polishing being conducted only with a solid material having a hardness which is less than both the hardness of the metal and the hardness of the underlying layer to provide remaining metal from the metal layer which is only in conductive interconnect lines or vias.
Claim 47
Independent Claim
103 words
A method of removing excess metal from a metal layer atop an underlying layer on a semiconductor substrate wafer, the metal layer having been applied to fill conductive interconnect lines or vias formed within the underlying layer, the metal and underlying layer having defined hardnesses, the method comprising: dry polishing the metal layer without any slurry, the dry polishing being conducted only with a solid material having a hardness which is less than both the hardness of the metal and the hardness of the underlying layer to provide remaining metal from the metal layer which is only in conductive interconnect lines or vias.
Claim 48
Dependent Claim
39 words
The method of removing excess metal from a metal layer atop an underlying layer on a semiconductor substrate wafer of claim 40 wherein the dry polishing is accomplished by rotating a disk which is contacted with the metal layer.
Claim 49
Dependent Claim
32 words
The method of removing excess metal from a metal layer atop an underlying layer on a semiconductor substrate wafer of claim 41 wherein the disk is made of a polymer plastic material.
Claim 50
Dependent Claim
29 words
The method of removing excess metal from a metal layer atop an underlying layer on a semiconductor substrate wafer of claim 41 wherein the disk is made of rubber.
Claim 51
Dependent Claim
39 words
The method of removing excess metal from a metal layer atop an underlying layer on a semiconductor substrate wafer of claim 41 wherein the disk is made of a material selected from the group consisting of polyethylene and Teflon™.
Claim 52
Dependent Claim
32 words
The method of removing excess metal from a metal layer atop an underlying layer on a semiconductor substrate wafer of claim 41 further comprising rotating the disk in a reciprocatingly bidirectional manner.
Claim 53
Dependent Claim
39 words
The method of removing excess metal from a metal layer atop an underlying layer on a semiconductor substrate wafer of claim 40 wherein the dry polishing is accomplished by vibrating a pad which is contacted with the metal layer.
Claim 54
Dependent Claim
32 words
The method of removing excess metal from a metal layer atop an underlying layer on a semiconductor substrate wafer of claim 46 wherein the pad is made of a polymer plastic material.
Claim 55
Dependent Claim
29 words
The method of removing excess metal from a metal layer atop an underlying layer on a semiconductor substrate wafer of claim 46 wherein the pad is made of rubber.
Claim 56
Dependent Claim
39 words
The method of removing excess metal from a metal layer atop an underlying layer on a semiconductor substrate wafer of claim 46 wherein the pad is made of a material selected from the group consisting of polyethylene and Teflon™.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-12-16 | 1995-06-17 | 1995-12-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-12-16 | 1999-06-17 | 1999-12-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-12-16 | 2003-06-17 | 2003-12-17 | $7700.00 | Window Closed / Lapsed |