US5070034A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Process for producing a semiconductor memory device
Assignee: Canon Inc
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Filing: 1990-09-28
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Granted: 1991-12-03
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Expires: 2010-09-28
Abstract
Abstract A semiconductor memory device is provided with memory cells each having a capacitor for accumulating an electric charge and a transistor for charging and discharging the capacitor. The memory device comprises a substrate, an insulator layer formed thereon and a monocrystalline semiconductor layer formed thereon. The capacitor is composed of said monocrystalline semiconductor layer, the insulator layer and the substrate while the transistor is formed in the monocrystalline semiconductor layer.
Inventors
- 👤 Tamotsu Satoh
- 👤 Takao Yonehara
- 👤 Yoshio Nakamura
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 18:50
CPC Classifications
H; H10; H10B; H10B12/00; H10B12/01; H10B12/02; H10B12/05; H10B12/30; H10D; H10D84/00; H10D84/01; H10D84/02; H10D84/03; H10D84/038; H10D86/00; H10D86/201; H10D88/00; H10D88/01; H10P; H10P14/00; H10P14/20; H10P14/24; H10P14/27; H10P14/271; H10P14/29; H10P14/2901; H10P14/2902; H10P14/2905; H10P14/2921; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3411
Claims Analysis
Total Claims: 4
Claim 1
Independent Claim
143 words
A process for producing a semiconductor memory device provided with memory cells, each said memory cell having a capacitor for accumulating an electric charge and a transistor for charging and discharging said capacitor, said capacitor comprising a substrate, an insulator layer disposed on said substrate and a monocrystalline semiconductor layer on said insulator layer, said method comprising the steps of: (a) forming, on said insulator layer provided on said substrate, an amorphous nucleation surface with a different material of a nucleation density sufficiently larger than that of the material constituting said insulator layer and of a size sufficiently small as to allow the growth of only one nucleus; (b) growing a single crystal from the single nucleus of a semiconductor material grown on said amorphous nucleation surface to form a monocrystalline semiconductor layer; and (c) forming said transistor in said monocrystalline semiconductor layer.
Claim 2
Dependent Claim
143 words
A process for producing a semiconductor memory device provided with memory cells, each said memory cell having a capacitor for accumulating an electric charge and a transistor for charging and discharging said capacitor, said capacitor comprising a substrate, an insulator layer disposed on said substrate and a monocrystalline semiconductor layer on said insulator layer, said method comprising the steps of: (a) forming, on said insulator layer provided on said substrate, an amorphous nucleation surface with a different material of a nucleation density sufficiently larger than that of the material constituting said insulator layer and of a size sufficiently small as to allow the growth of only one nucleus; (b) growing a single crystal from the single nucleus of a semiconductor material grown on said amorphous nucleation surface to form a monocrystalline semiconductor layer; and (c) forming said transistor in said monocrystalline semiconductor layer.
Claim 3
Dependent Claim
27 words
A process for producing a semiconductor memory device according to claim 1, wherein said insulator layer is formed sufficiently thick except in an area constituting said capacitor.
Claim 4
Dependent Claim
28 words
The process for producing a semiconductor memory device according to claim 1, wherein said transistor has a gate electrode on a gate insulator on said monocrystalline semiconductor layer.
References Cited (Backward Citations)
US3620833A
Cited
US4131496A
Cited
US4174422A
Cited
US4279688A
Cited
US4727047A
Cited
US4479847A
Cited
US4549926A
Cited
US4670088A
Cited
JPS5928327A
Cited
JPS59184518A
Cited
JPS6248701A
Cited
EP0244081A1
Cited
JPS63239928A
Cited
JPS63239932A
Cited
JPS63239929A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-12-02 | 1995-06-03 | 1995-12-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-12-02 | 1999-06-03 | 1999-12-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-12-02 | 2003-06-03 | 2003-12-03 | $7700.00 | Window Closed / Lapsed |