Patent US4654858A successfully refreshed from Google Patents.
Patent US5036794A successfully refreshed from Google Patents.
US5036794A
Expired / Lapsed
US
⏱️ 0.0 years remaining
CVD apparatus
Assignee: Semiconductor Energy Laboratory Co Ltd
•
Filing: 1990-03-23
•
Granted: 1991-08-06
•
Expires: 2010-03-23
Abstract
Abstract A CVD apparatus in which a reaction chamber includes a pair of electrodes which define a plasma generating space therebetween. A metallic enclosure surrounds the plasma generating space thereby preventing plasma which has been produced within the space from escaping. The enclosure can be utilized to support one or more substrates to be coated.
Inventors
- 👤 Shunpei Yamazaki
- 👤 Mamoru Tashiro
- 👤 Minoru Miyazaki
- 👤 Mitsunori Sakama
- 👤 Takeshi Fukada
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 07:02
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/20; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3411; C; C23; C23C; C23C16/00; C23C16/44; C23C16/458; C23C16/4582; C23C16/4587; C23C16/54; H10P14/24
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
127 words
A CVD apparatus comprising: a reaction chamber including a plasma generating space; a pair of electrodes located in said reaction chamber and defining said plasma generating space therebetween; a vacuum pump for evacuating said reaction chamber; a grounded metallic enclosure totally surrounding said plasma generating space between said electrodes; a voltage source for supplying said pair of electrodes with voltages in substantial opposite phase; a substrate holder for supporting a substrate where the surface to be coated of the substrate is supported substantially in parallel to the electric field established between said pair of electrode by the voltage source; and wherein said metallic enclosure prevents plasma gas produced within said plasma generating space by a discharge induced between said electrodes from escaping from said plasma generating space.
Claim 2
Dependent Claim
127 words
A CVD apparatus comprising: a reaction chamber including a plasma generating space; a pair of electrodes located in said reaction chamber and defining said plasma generating space therebetween; a vacuum pump for evacuating said reaction chamber; a grounded metallic enclosure totally surrounding said plasma generating space between said electrodes; a voltage source for supplying said pair of electrodes with voltages in substantial opposite phase; a substrate holder for supporting a substrate where the surface to be coated of the substrate is supported substantially in parallel to the electric field established between said pair of electrode by the voltage source; and wherein said metallic enclosure prevents plasma gas produced within said plasma generating space by a discharge induced between said electrodes from escaping from said plasma generating space.
Claim 3
Dependent Claim
16 words
The apparatus of claim 1 wherein said enclosure supports at least one substrate to be coated.
Claim 4
Dependent Claim
25 words
The apparatus of claim 1 wherein said enclosure is formed with an open top and an open bottom, near which said electrodes are placed respectively.
Claim 5
Dependent Claim
17 words
The apparatus of claim 1 wherein said enclosure is made of Al, Cr, Ni, or stainless steel.
References Cited (Backward Citations)
US3682699A
Cited
US4033287A
Cited
US4287851A
Cited
US4582720A
Cited
US4424096A
Cited
US4633809A
Cited
US4593644A
Cited
JPS60224215A
Cited
US4576830A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-08-05 | 1995-02-04 | 1995-08-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-08-05 | 1999-02-04 | 1999-08-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-08-05 | 2003-02-04 | 2003-08-06 | $7700.00 | Window Closed / Lapsed |