US4033287A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Radial flow reactor including glow discharge limiting shield
Assignee: AT&T Inc
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Filing: 1976-01-22
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Granted: 1977-07-05
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Expires: 1996-01-22
Abstract
Abstract An improved radio frequency (rf) powered radial flow cylindrical reactor utilizes a gas shield which substantially limits the glow plasma discharge reaction to a section of the reactor over the semiconductor substrates which are to be coated. The gas shield permits the use of higher rf input power which contributes to the formation of protective films that have desirable physical and electrical characteristics.
Inventors
- 👤 Frank Bernard Alexander, Jr.
- 👤 Cesar Deduyo Capio
- 👤 Victor Emerald Hauser, Jr.
- 👤 Hyman Joseph Levinstein
- 👤 Cyril Joseph Mogab
- 👤 Ashok Kumar Sinha
- 👤 Richard Siegfried Wagner
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 12:16
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/50; C23C16/505; C23C16/509; C23C16/5096
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
144 words
Coating apparatus comprising: an evacuable chamber; a member located in said chamber having a support region adapted to support at least one object and a central region which defines an aperture therethrough; means for facilitating a radio frequency discharge within the chamber adjacent the object to form a flow discharge plasma from reactant gases introduced into the chamber; exhaust means in communication with the centrally disposed aperture in the member; and coating gas-vapor feed means located adjacent the support region of the member such that gas-vapor feed is induced to flow across the support region of the member in a radial flow and out through the exhaust means, the coating gas-vapor feed means being adapted to substantially inhibit any glow plasma discharge reaction from occurring until reactant gases introduced into he apparatus through the coating gas-vapor means reach the support region of the member.
Claim 2
Dependent Claim
144 words
Coating apparatus comprising: an evacuable chamber; a member located in said chamber having a support region adapted to support at least one object and a central region which defines an aperture therethrough; means for facilitating a radio frequency discharge within the chamber adjacent the object to form a flow discharge plasma from reactant gases introduced into the chamber; exhaust means in communication with the centrally disposed aperture in the member; and coating gas-vapor feed means located adjacent the support region of the member such that gas-vapor feed is induced to flow across the support region of the member in a radial flow and out through the exhaust means, the coating gas-vapor feed means being adapted to substantially inhibit any glow plasma discharge reaction from occurring until reactant gases introduced into he apparatus through the coating gas-vapor means reach the support region of the member.
Claim 3
Dependent Claim
136 words
Apparatus for coating a substrate comprising: an evacuable chamber; a member located in said chamber having a top region which is adapted to hold the substrate and a central region defining an aperture therethrough; means for generating a radio frequency discharge within the chamber adjacent the substrate to form a glow discharge plasma from reactant gases introduced into said chamber; means for establishing a radial flow from an outer portion of the member which is adapted to hold the substrate toward and out of the aperture of the reactant gases suitable for forming the plasma and coating on the substrate; means in communication with the aperture for exhausting the gases; and means for substantially confining said plasma glow discharge to a zone which encompasses the top region of the member and extends substantially vertically upward therefrom.
Claim 4
Dependent Claim
136 words
Apparatus for coating a substrate comprising: an evacuable chamber; a member located in said chamber having a top region which is adapted to hold the substrate and a central region defining an aperture therethrough; means for generating a radio frequency discharge within the chamber adjacent the substrate to form a glow discharge plasma from reactant gases introduced into said chamber; means for establishing a radial flow from an outer portion of the member which is adapted to hold the substrate toward and out of the aperture of the reactant gases suitable for forming the plasma and coating on the substrate; means in communication with the aperture for exhausting the gases; and means for substantially confining said plasma glow discharge to a zone which encompasses the top region of the member and extends substantially vertically upward therefrom.
Claim 5
Dependent Claim
21 words
The apparatus of claim 2 further comprising heating means contained within the chamber for heating the substrate to a preselected temperature.
Claim 6
Dependent Claim
20 words
The apparatus of claim 2 wherein the means for generating a glow discharge includes substantially parallel electrodes within the chamber.
Claim 7
Dependent Claim
16 words
The apparatus of claim 4 wherein the chamber is electrically coupled to one of the electrodes.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1980-07-04 | 1981-01-03 | 1981-07-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1984-07-04 | 1985-01-03 | 1985-07-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1988-07-04 | 1989-01-03 | 1989-07-05 | $7700.00 | Window Closed / Lapsed |