US5036794A
Expired / Lapsed
US
⏱️ 0.0 years remaining
CVD apparatus
Assignee: Semiconductor Energy Laboratory Co Ltd
•
Filing: 1990-03-23
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Granted: 1991-08-06
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Expires: 2010-03-23
Abstract
Abstract A CVD apparatus in which a reaction chamber includes a pair of electrodes which define a plasma generating space therebetween. A metallic enclosure surrounds the plasma generating space thereby preventing plasma which has been produced within the space from escaping. The enclosure can be utilized to support one or more substrates to be coated.
Inventors
- 👤 Shunpei Yamazaki
- 👤 Mamoru Tashiro
- 👤 Minoru Miyazaki
- 👤 Mitsunori Sakama
- 👤 Takeshi Fukada
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 06:50
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/20; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3411; C; C23; C23C; C23C16/00; C23C16/44; C23C16/458; C23C16/4582; C23C16/4587; C23C16/54; H10P14/24
Claims Analysis
Total Claims: 5
Claim 1
Independent Claim
127 words
A CVD apparatus comprising: a reaction chamber including a plasma generating space; a pair of electrodes located in said reaction chamber and defining said plasma generating space therebetween; a vacuum pump for evacuating said reaction chamber; a grounded metallic enclosure totally surrounding said plasma generating space between said electrodes; a voltage source for supplying said pair of electrodes with voltages in substantial opposite phase; a substrate holder for supporting a substrate where the surface to be coated of the substrate is supported substantially in parallel to the electric field established between said pair of electrode by the voltage source; and wherein said metallic enclosure prevents plasma gas produced within said plasma generating space by a discharge induced between said electrodes from escaping from said plasma generating space.
Claim 2
Dependent Claim
127 words
A CVD apparatus comprising: a reaction chamber including a plasma generating space; a pair of electrodes located in said reaction chamber and defining said plasma generating space therebetween; a vacuum pump for evacuating said reaction chamber; a grounded metallic enclosure totally surrounding said plasma generating space between said electrodes; a voltage source for supplying said pair of electrodes with voltages in substantial opposite phase; a substrate holder for supporting a substrate where the surface to be coated of the substrate is supported substantially in parallel to the electric field established between said pair of electrode by the voltage source; and wherein said metallic enclosure prevents plasma gas produced within said plasma generating space by a discharge induced between said electrodes from escaping from said plasma generating space.
Claim 3
Dependent Claim
16 words
The apparatus of claim 1 wherein said enclosure supports at least one substrate to be coated.
Claim 4
Dependent Claim
25 words
The apparatus of claim 1 wherein said enclosure is formed with an open top and an open bottom, near which said electrodes are placed respectively.
Claim 5
Dependent Claim
17 words
The apparatus of claim 1 wherein said enclosure is made of Al, Cr, Ni, or stainless steel.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1994-08-05 | 1995-02-04 | 1995-08-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1998-08-05 | 1999-02-04 | 1999-08-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2002-08-05 | 2003-02-04 | 2003-08-06 | $7700.00 | Window Closed / Lapsed |