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US5017453A Expired / Lapsed US ⏱️ 0.0 years remaining

A silicone resist materials containing a polysiloxane and a photo-sensitive agent

Assignee: Toshiba Corp
•
Filing: 1989-01-31
•
Granted: 1991-05-21
•
Expires: 2009-01-31
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Abstract

Abstract The polysilanes and polysiloxanes of the present invention are polymers that contain silicon in the principal chain, and contain in the side chains alkaline soluble groups such as phenol-based hydroxy group and carboxyl group. One silicone resist material of the present invention comprises the polysilane or the polysiloxane in the above. Another silicone resist material of the present invention contains the above polysilane or polysiloxane, and an appropriate photosensitive agent. Still another silicone resist material of the present invention does not contain the above photosensitive agent, and in its stead, it contains a group that possesses photosensitive to ultraviolet rays or the like, via a siloxane bonding in the principal chain. As a substance with such photosensitivity, one may mention, for example, o-nitrogenzylsilyl groups that presents alkaline solubility when it is irradiated by ultraviolet rays. Accordingly, the silicone resist materials of the present invention, especially the second and third silicone resist materials, are alkaline developable, and also possess a superior resistance to oxygen plasma. Therefore, they can be used as a top layer film in the two-layered resist system, making it possible to form very fine resist patterns, fast and with a minimum number of processing steps.

Inventors

  • 👤 Yasunobu Onishi
  • 👤 Shuji Hayase
  • 👤 Rumiko Horiguchi
  • 👤 Akiko Hirao

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-31 11:36
CPC Classifications
C; C08; C08L; C08L83/00; C08L83/16; C08G; C08G77/00; C08G77/04; C08G77/14; C08G77/22; C08G77/26; C08G77/48; C08G77/60; C08L83/10; G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0754; G03F7/0757

Claims Analysis

Total Claims: 10
Claim 1
Independent Claim 133 words
A silicone resist material comprising an admixture of a polysiloxane that contains a structure shown by the formula ##STR57## as an indispensable structure, wherein a substituent group R 10 represents an alkyl group, vinyl group, allyl group, aryl group or substituted aryl group, or siloxy group or substituted siloxy group. at at least one of substituent groups other than the hydroxyl groups among the substituent groups R 11 to R 15 is a hydroxyl group, the remaining groups R 11 to R 15 may be identical or may be different, and each of them represents a hydrogen atom, halogen atom, alkyl group or substituted alkyl group, carboxyl group, alkylcarbonyl group, alkoxycarbonyl group, alkoxy group, acyloxy group, allyl group, aryl group or substituted aryl group and an effective photosensitive amount of a photosensitive agent.
Claim 2
Dependent Claim 133 words
A silicone resist material comprising an admixture of a polysiloxane that contains a structure shown by the formula ##STR57## as an indispensable structure, wherein a substituent group R 10 represents an alkyl group, vinyl group, allyl group, aryl group or substituted aryl group, or siloxy group or substituted siloxy group. at at least one of substituent groups other than the hydroxyl groups among the substituent groups R 11 to R 15 is a hydroxyl group, the remaining groups R 11 to R 15 may be identical or may be different, and each of them represents a hydrogen atom, halogen atom, alkyl group or substituted alkyl group, carboxyl group, alkylcarbonyl group, alkoxycarbonyl group, alkoxy group, acyloxy group, allyl group, aryl group or substituted aryl group and an effective photosensitive amount of a photosensitive agent.
Claim 3
Dependent Claim 44 words
The silicone resist material of claim 21, wherein said alkyl group with 1 to 10 carbon atoms is a methyl group, ethyl group, n-propyl group, isopropyl group, n-butyl group, sec-butyl group, t-butyl group, n-pentyl group, n-hexyl group, n-octyl group, n-nonyl group, or n-decanyl group.
Claim 4
Dependent Claim 29 words
The silicone resist material of claim 1, wherein said substituted aryl group is a phenyl group, o-hydroxyphenyl group, p-hydroxyphenyl group, o-methylphenyl group, p-methylphenyl group, β-naphthyl group, or p-chlorophenyl group.
Claim 5
Dependent Claim 45 words
The silicon resist material of claim 1, wherein said substituent group R 10 is a methyl group, phenyl group, or p-hydroxyphenyl group, R 13 is a hydroxyl group, and R 11 , R 12 , R 14 , and R 15 are all hydrogen atoms.
Claim 6
Dependent Claim 49 words
The silicon resist material of claim 1, wherein said substituent group R 10 is a phenyl group, R 11 and R 12 are hydrogen atoms, and R 13 , R 14 , and R 15 are mutually different and are either of hydrogen atom, methyl group, and p-hydroxyphenyl group.
Claim 7
Dependent Claim 21 words
The silicone resist material of claim 1, wherein said photosensitive agent is an azido compound, naphtho-quinonediazidosulfonic acid ester, or diazonium salt.
Claim 8
Dependent Claim 36 words
The silicon resist material of claim 1, wherein the compounding ratio of said polysiloxane and photosensitive agent is 5 to 100 parts by weight of the photosensitive agent to 100 parts by weight of the polysiloxane.
Claim 9
Dependent Claim 13 words
The silicon resist material of claim 1, further comprising an alkaline soluble resin.
Claim 10
Dependent Claim 22 words
The silicone resist material of claim 1, wherein said photosensitive agent possesses a structural unit that is shown by the formula: ##STR58##

References Cited (Backward Citations)

US3869292A Cited
US4510227A Cited
US4507384A Cited
US4564576A Cited
US4678737A Cited
US4624909A Cited
US4702990A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1994-05-20 1994-11-19 1995-05-21 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1998-05-20 1998-11-19 1999-05-21 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2002-05-20 2002-11-19 2003-05-21 $7700.00 Window Closed / Lapsed

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