US4702990A
Expired / Lapsed
US
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Photosensitive resin composition and process for forming photo-resist pattern using the same
Assignee: NTT Inc
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Filing: 1985-05-10
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Granted: 1987-10-27
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Expires: 2005-05-10
Abstract
Abstract The present invention provides a photosensitive resin composition used to form a top resist layer of a multilayer resist system, the composition comprising a photosensitive polyphenylsilsesquioxane represented by the following general formula (I) of: <IMAGE> (I) wherein X is selected from the group consisting of acryloyloxymethyl, methacryloyloxymethyl, and cinnamoyloxymethyl; and l, m and n are zero or positive integers but l and m do not take the value of zero simultaneously; and a bisazide compound added to act as a cross-linking agent. The photosensitive resin composition has high sensitivity to UV light and excellent resistance to reactive ion etching under oxygen gas (O2 RIE).
Inventors
- 👤 Akinobu Tanaka
- 👤 Masao Morita
- 👤 Saburo Imamura
- 👤 Toshiaki Tamamura
- 👤 Osamu Kogure
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 21:18
CPC Classifications
C; C08; C08L; C08L33/00; C08L33/04; C08L33/06; C08L33/08; G; G03; G03F; G03F7/00; G03F7/004; G03F7/09; G03F7/094; C08L83/00; C08L83/04
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
131 words
A photosensitive resin composition having a high sensitivity to ultra violet rays, a high resolution power, excellent oxygen reactive ion etching properties adapted for use for forming a pattern in a double layer resist system as a resist layer comprising: (a) a substituted polyphenylsilsesquioxane represented by the following formula ##STR5## wherein X is acryloyloxymethyl, or methacryloyloxymethyl, and 1, m and n are zero or positive integers provided that 1 and m cannot both be zero; and wherein a substitution ratio by the substituent ##STR6## of said substituted polyphenylsilsesquioxane ranges between 10 to 50%, and (b) a bisazide compound selected from the group consisting of 2,6-di(4-azidobenzal)cyclohexanone, and 2,6-di(4-azidobenzal)4-methylcycloohexanone wherein said bisazide compound is present in an amount of from 0.5 to 30 wt % based on the weight of said substituted polyphenylsilsesquioxane.
Claim 2
Dependent Claim
131 words
A photosensitive resin composition having a high sensitivity to ultra violet rays, a high resolution power, excellent oxygen reactive ion etching properties adapted for use for forming a pattern in a double layer resist system as a resist layer comprising: (a) a substituted polyphenylsilsesquioxane represented by the following formula ##STR5## wherein X is acryloyloxymethyl, or methacryloyloxymethyl, and 1, m and n are zero or positive integers provided that 1 and m cannot both be zero; and wherein a substitution ratio by the substituent ##STR6## of said substituted polyphenylsilsesquioxane ranges between 10 to 50%, and (b) a bisazide compound selected from the group consisting of 2,6-di(4-azidobenzal)cyclohexanone, and 2,6-di(4-azidobenzal)4-methylcycloohexanone wherein said bisazide compound is present in an amount of from 0.5 to 30 wt % based on the weight of said substituted polyphenylsilsesquioxane.
Claim 3
Dependent Claim
38 words
The photosensitive resin composition according to claim 1, wherein aid substituted polyphenylsilsesquioxane is methacryloyloxymethyl polyphenylsilsesquioxane wherein said substitution ratio is 45% and said bisazide compound is 2,6-di(4-azidobenzal) 4-methylcyclohexanone and is present in an amount of 5 wt %.
Claim 4
Dependent Claim
36 words
The photosensitive resin composition according to claim 1, wherein said substituted polyphenylsilsesquioxane is methacryloyloxymethyl polyphenylsilsesquioxane having said substitution ratio of 43% and said bisazide compound is 2,6-di(4-azidobenzal)4-methylcyclohexanone and is present in an amount of 5wt %.
Claim 5
Dependent Claim
40 words
The photosensitive resin composition according to claim 1, further comprising a sensitizer selected from the group consisting of aromatic carbonyl compounds, benzoin compounds, pigment redox compounds, azo-compounds, sulfur-containing compounds, organic peroxides, aromatic nitro-compounds, quinone compounds, anthrone compounds and acenaphthene compounds.
Claim 6
Dependent Claim
22 words
The photosensitive resin composition according to claim 1, further comprising a sensitizer selected from the group consisting of Michler's ketone and 1-nitropyrene.
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| 3.5 Years (Year 4) | 1990-10-26 | 1991-04-27 | 1991-10-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-10-26 | 1995-04-27 | 1995-10-27 | $3760.00 | Window Closed / Lapsed |
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