Patent US4980264A successfully refreshed from Google Patents.
US4980264A
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Photoresist compositions of controlled dissolution rate in alkaline developers
Assignee: International Business Machines Corp
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Filing: 1985-12-17
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Granted: 1990-12-25
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Expires: 2005-12-17
Abstract
Abstract A photoresist composition is disclosed which is a mixture of a photoactive compound and an alkali soluble resin binder comprises of an unsaturated dicarboxylic acid esterified polymeric material, such as a phenolic resin containing a plurality of acid esterifiable groups esterified with an unsaturated dicarboxylic acid anhydride having the formula ##STR1## wherein R 1 and R 2 are independently selected from hydrogen and alkyl groups containing 1 to 3 carbon atoms, R 3 and R 4 are alkylene groups containing 1 to 3 carbon atoms and x and y are either 0 or 1.
Inventors
- 👤 Kaolin N. Chiong
- 👤 Bea-Jane L. Yang
- 👤 Jer-Ming Yang
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-08 19:02
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/023; G03F7/0233; G03F7/008; G03F7/012; G03F7/0125
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
50 words
A photoresist composition comprised of an admixture of a photoactive compound and an alkali soluble resin binder which is comprised of an unsaturated dicarboxylic acid esterified polymeric material, wherein the photoactive compound is present in a concentration from about 2 to about 25 percent by weight of the resin binder.
Claim 2
Dependent Claim
50 words
A photoresist composition comprised of an admixture of a photoactive compound and an alkali soluble resin binder which is comprised of an unsaturated dicarboxylic acid esterified polymeric material, wherein the photoactive compound is present in a concentration from about 2 to about 25 percent by weight of the resin binder.
Claim 3
Dependent Claim
65 words
The photoresist composition of claim 1 wherein the polymeric material is esterified with an unsaturated dicarboxylic acid anhydride having the formula ##STR8## wherein R 1 and R 2 are independently selected from hydrogen and alkyl groups containing 1 to 3 carbon atoms, R 3 and R 4 are alkylene groups containing 1 to 3 carbon atoms and x and y are either 0 to 1.
Claim 4
Dependent Claim
30 words
The photoresist composition of claim 1 wherein the polymeric material is a hydroxy group containing resin selected from the group consisting of a novolak-type cresol formaldehyde resins and (poly p-hydroxystyrene).
Claim 5
Dependent Claim
13 words
The photoresist composition of claim 1 wherein the composition has positive working functionality.
Claim 6
Dependent Claim
20 words
The photoresist composition of claim 4 wherein the photoactive compound is a 4- or 5-substituted naphthoquinone (1,2) diazide-sulfonic acid ester.
Claim 7
Dependent Claim
32 words
The photoresist composition of claim 4 wherein the diazonaphthoquinone sulfonic acid ester is selected from the group consisting of 5-substituted napthoquinone-1,2-diazide sulfonic acid esters of 2,3,4-trihydroxy benzophenone and 4,8-bis(hydroxymethyl)tricyclo[5.2.1.0 2 ,6 ]decane.
Claim 8
Dependent Claim
13 words
The photoresist composition of claim 1 wherein the composition has negative working functionality.
Claim 9
Dependent Claim
15 words
The photoresist composition of claim 6 wherein the photo active compound is an aryl azide.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1993-12-24 | 1994-06-25 | 1994-12-25 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1997-12-24 | 1998-06-25 | 1998-12-25 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2001-12-24 | 2002-06-25 | 2002-12-25 | $7700.00 | Window Closed / Lapsed |