US4108666A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Monofunctional monomer-containing photosensitive composition for photoresist
Assignee: Resonac Corp
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Filing: 1976-03-11
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Granted: 1978-08-22
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Expires: 1996-03-11
Abstract
Abstract A photosensitive composition for a photoresist, which comprises (A) a compound having the following general formula: ##STR1## wherein Z is a cyclic dibasic acid anhydride moiety, R 1 is an alkylene group having 1 to 3 carbon atoms, R 2 is hydrogen or methyl, and R 3 is hydrogen, methyl, ethyl or -CH 2 X in which X is chlorine or bromine, (B) a photopolymerization sensitizer, (C) a polymer being capable of giving a film-forming property, (D) a chain transfer agent and (E) a thermal polymerization inhibitor; and a laminated photosensitive element which has a substantially dry photosensitive layer of the photosensitive composition. The composition and element are capable of giving a minute resist pattern which is excellent as an etching resist or metal plating resist and can be readily removed after etching or metal plating.
Inventors
- 👤 Nobuyuki Hayashi
- 👤 Asao Isobe
- 👤 Katsushige Tsukada
- 👤 Toshiaki Ishimaru
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 16:42
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/027
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
103 words
A photosensitive composition for a photoresist which comprises (A) a compound having the following general formula: ##STR10## wherein Z is a cyclic dibasic acid anhydride moiety, R 1 is an alkylene group having 1 to 3 carbon atoms, R 2 is hydrogen or methyl, and R 3 is hydrogen, methyl, ethyl or --CH 2 X in which X is chlorine or bromine, (B) a photopolymerization sensitizer, (C) a polymer capable of giving a film-forming property, (D) a chain transfer agent having a chain transfer constant of more than 10 liters/mole.sec. to polymethyl methacrylate radical at 60° C and (E) a thermal polymerization inhibitor.
Claim 2
Dependent Claim
103 words
A photosensitive composition for a photoresist which comprises (A) a compound having the following general formula: ##STR10## wherein Z is a cyclic dibasic acid anhydride moiety, R 1 is an alkylene group having 1 to 3 carbon atoms, R 2 is hydrogen or methyl, and R 3 is hydrogen, methyl, ethyl or --CH 2 X in which X is chlorine or bromine, (B) a photopolymerization sensitizer, (C) a polymer capable of giving a film-forming property, (D) a chain transfer agent having a chain transfer constant of more than 10 liters/mole.sec. to polymethyl methacrylate radical at 60° C and (E) a thermal polymerization inhibitor.
Claim 3
Dependent Claim
62 words
The photosensitive composition of claim 1, wherein the ingredients (A), (B), (C), (D) and (E) are in the range of 10% to 60% by weight, 1% to 10% by weight, 20% to 80% by weight, 0.1% to 5% by weight and 0.1% to 5% by weight, respectively, based on of the total amount of the ingredients (A), (B), (C), (D) and (E).
Claim 4
Dependent Claim
62 words
The photosensitive composition of claim 1, wherein the ingredients (A), (B), (C), (D) and (E) are in the range of 15% to 50% by weight, 1.5% to 5.0% by weight, 40% to 80% by weight, 1.0% to 4.0% by weight and 0.1% to 2.0% by weight, respectively, based on of the total amount of the ingredients (A), (B), (C), (D) and (E).
Claim 5
Dependent Claim
54 words
The photosensitive composition of claim 1, wherein the compound having the general formula (I) is one in which Z is a cyclic dibasic acid anhydride moiety selected from the group consisting of the cyclic dibasic acid anhydride moieties of succinic anhydride, phthalic anhydride, hexahydrophthalic anhydride, tetrahydrophthalic anhydride, 3,6-endomethylene-1,2,3,6-tetrahydrophthalic anhydride and 4- or 5-methyl-3,6-endomethylene-1,2,3,6-tetrahydrophthalic anhydride.
Claim 6
Dependent Claim
24 words
The photosensitive composition of claim 1, wherein the compound having the general formula (I) is one in which R 3 is --CH 2 X.
Claim 7
Dependent Claim
25 words
The photosensitive composition of claim 1, wherein the chain transfer agent is selected from the group consisting of carbon tetrabromide, hexabromoethane, tetrabromoethylene, pentabromoethane and bromo-trichloromethane.
Claim 8
Dependent Claim
28 words
The photosensitive composition of claim 1, wherein the chain transfer agent is selected from the group consisting of lauryl mercaptan, α-thioglycerol, octyl thioglycolate, diphenyl disulfide and thiuram disulfide.
Claim 9
Dependent Claim
98 words
A laminated photosensitive element for a photoresist which comprises a flexible support and a substantially dry photosensitive layer thereon comprising (A) a compound having the following general formula: ##STR11## wherein Z is a cyclic dibasic acid anhydride moiety, R 1 is an alkylene group having 1 to 3 carbon atoms, R 2 is hydrogen or methyl, and R 3 is hydrogen, methyl, ethyl or --CH 2 X in which X is chlorine or bromine, (B) a photopolymerization sensitizer, (C) a polymer capable of giving a film-forming property, (D) a chain transfer agent and (E) a thermal polymerization inhibitor.
Claim 10
Dependent Claim
98 words
A laminated photosensitive element for a photoresist which comprises a flexible support and a substantially dry photosensitive layer thereon comprising (A) a compound having the following general formula: ##STR11## wherein Z is a cyclic dibasic acid anhydride moiety, R 1 is an alkylene group having 1 to 3 carbon atoms, R 2 is hydrogen or methyl, and R 3 is hydrogen, methyl, ethyl or --CH 2 X in which X is chlorine or bromine, (B) a photopolymerization sensitizer, (C) a polymer capable of giving a film-forming property, (D) a chain transfer agent and (E) a thermal polymerization inhibitor.
Claim 11
Dependent Claim
16 words
The laminated photosensitive element of claim 8, wherein the flexible support is a polyethylene terephthalate film.
Claim 12
Dependent Claim
17 words
The laminated photosensitive element of claim 8, wherein on the photosensitive layer is provided a protective film.
Claim 13
Dependent Claim
15 words
The laminated photosensitive element of claim 10, wherein the protective film is a polyethylene film.
Claim 14
Dependent Claim
19 words
The laminated photosensitive element of claim 8, wherein the photosensitive layer has a thickness of 10 to 100 μ.
Claim 15
Dependent Claim
52 words
The photosensitive composition of claim 1, wherein the photopolymerization sensitizer (B) is selected from the group consisting of 2-ethylanthraquinone; 2-tert-butylanthraquinone; benzoin and its alkyl ether derivatives; benzophenone; Michler's ketone; benzil and diacetyl; and the thermal polymerization inhibitor (E) is selected from the group consisting of hydroquinone; hydroquinone monomethyl ether; p-methoxyphenol and 2,2-methylenebis(4-methyl-6-tert-butylphenol).
Claim 16
Dependent Claim
34 words
The photosensitive composition of claim 13, wherein the chain transfer agent is selected from the group consisting of carbon tetrabromide, hexabromoethane; tetrabromethylene; pentabromoethane; bromo-trichloromethane; lauryl mercaptan; α-thioglycerol; octyl thioglycolate, diphenyl disulfide and thiuram disulfide.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1981-08-21 | 1982-02-20 | 1982-08-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1985-08-21 | 1986-02-20 | 1986-08-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1989-08-21 | 1990-02-20 | 1990-08-22 | $7700.00 | Window Closed / Lapsed |