US4968582A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Photoresists resistant to oxygen plasmas
Assignee: University of North Carolina at Charlotte
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Filing: 1988-06-28
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Granted: 1990-11-06
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Expires: 2008-06-28
Abstract
Abstract The invention is a modified organic photoresist which is resistant to etching in oxygen-containing plasmas and therefore particularly useful for masking and etching organic polymer materials in VLSI and advanced packaging applications. The invention comprises adding a phosphorous-containing compound to a conventional photoresist. The phosphorous-containing compound is of a type and in an amount effective to substantially prevent etching of the modified photoresist in an oxygen-containing plasma without substantially adversely affecting the photosensitivity of the photoresist or the elasticity or the adhesion of the etch resistant film formed during oxygen-containing plasma exposure to an underlying material to be patterned and etched.
Inventors
- 👤 Farid M. Tranjan
- 👤 Thomas D. DuBois
- 👤 Rudolf G. Frieser
- 👤 Stephen M. Bobbio
- 👤 Susan K. S. Jones
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 22:25
CPC Classifications
G; G03; G03C; G03C1/00; G03C1/005; G03C1/06; G03F; G03F7/00; G03F7/004; G03F7/022; G03F7/0226; G03F7/26; G03F7/36; Y; Y10; Y10S; Y10S430/00; Y10S430/136
Claims Analysis
Total Claims: 26
Claim 1
Independent Claim
89 words
A method of forming a modified photoresist composition which is resistant to etching in oxygen-containing reactive ion etching plasmas, the method comprising admixing an organic photoresist with a phosphorus-containing compound of a type and in an amount effective to substantially prevent etching of the composition in an oxygen-containing reactive ion etching plasma without substantially adversely affecting the photosensitivity of the organic photoresist or the elasticity of adhesion of the etch resistant film formed during oxygen-containing reactive ion etching plasma exposure to an underlying material to be patterned and etched.
Claim 2
Independent Claim
89 words
A method of forming a modified photoresist composition which is resistant to etching in oxygen-containing reactive ion etching plasmas, the method comprising admixing an organic photoresist with a phosphorus-containing compound of a type and in an amount effective to substantially prevent etching of the composition in an oxygen-containing reactive ion etching plasma without substantially adversely affecting the photosensitivity of the organic photoresist or the elasticity of adhesion of the etch resistant film formed during oxygen-containing reactive ion etching plasma exposure to an underlying material to be patterned and etched.
Claim 3
Dependent Claim
30 words
A method according to claim 1 further comprising applying the modified photoresist composition to a layer of organic insulating material which is to be patterned using the modified photoresist composition.
Claim 4
Dependent Claim
19 words
A method according to claim 1 wherein the step of applying the photoresist composition comprises a spin-on application technique.
Claim 5
Dependent Claim
25 words
A method according to claim 1 further comprising heating the photoresist composition for a time and at a temperature sufficient to cure the photoresist composition.
Claim 6
Independent Claim
128 words
A method of forming a modified photoresist composition which is resistant to etching in oxygen-containing reactive ion etching plasmas, the method comprising: applying a layer of an organic photoresist upon a layer of material which is to be patterned by being etched in an oxygen-containing reactive ion etching plasma; and applying a phosphorus-containing compound to the layer of organic photoresist, and wherein the phosphorus containing compound is of a type and in an amount effective to substantially prevent etching of the organic photoresist in an oxygen-containing reactive ion etching plasma without substantially adversely affecting the photosensitivity of the organic photoresist or the elasticity or the adhesion of the etch resistant film formed by oxygen-containing reactive ion etching plasma exposure to the underlying material to be patterned and etched.
Claim 7
Independent Claim
128 words
A method of forming a modified photoresist composition which is resistant to etching in oxygen-containing reactive ion etching plasmas, the method comprising: applying a layer of an organic photoresist upon a layer of material which is to be patterned by being etched in an oxygen-containing reactive ion etching plasma; and applying a phosphorus-containing compound to the layer of organic photoresist, and wherein the phosphorus containing compound is of a type and in an amount effective to substantially prevent etching of the organic photoresist in an oxygen-containing reactive ion etching plasma without substantially adversely affecting the photosensitivity of the organic photoresist or the elasticity or the adhesion of the etch resistant film formed by oxygen-containing reactive ion etching plasma exposure to the underlying material to be patterned and etched.
Claim 8
Dependent Claim
30 words
A method according to claim 5 wherein the step of applying the phosphorus-containing compound is selected from the group consisting of: spin-on application, vapor deposition, immersion, or vapor reflux techniques.
Claim 9
Dependent Claim
88 words
A modified photoresist composition which is resistant to etching in oxygen-containing reactive ion etching plasmas, the composition comprising a mixture of: (a) an organic photoresist; and (b) a phosphorus-containing compound of a type and in an amount effective to substantially prevent etching of said composition in an oxygen-containing reactive ion etching plasma without substantially adversely affecting the photosensitivity of said organic photoresist or the elasticity or adhesion of said composition to an underlying material to be patterned and etched during exposure to an oxygen-containing reactive ion etching plasma.
Claim 10
Dependent Claim
88 words
A modified photoresist composition which is resistant to etching in oxygen-containing reactive ion etching plasmas, the composition comprising a mixture of: (a) an organic photoresist; and (b) a phosphorus-containing compound of a type and in an amount effective to substantially prevent etching of said composition in an oxygen-containing reactive ion etching plasma without substantially adversely affecting the photosensitivity of said organic photoresist or the elasticity or adhesion of said composition to an underlying material to be patterned and etched during exposure to an oxygen-containing reactive ion etching plasma.
Claim 11
Dependent Claim
16 words
A photoresist composition according to claim 7 wherein said organic photoresist is a positive acting photoresist.
Claim 12
Dependent Claim
16 words
A photoresist composition according to claim 7 wherein said organic photoresist is a negative acting photoresist.
Claim 13
Dependent Claim
50 words
A photoresist composition according to claim 7 wherein said phosphorous-containing compound is present in an amount of between about 2 percent by weight phosphorous based on the total weight of solids in said mixture and an amount that forms a saturated solution of said phosphorous-containing compound in said organic photoresist.
Claim 14
Dependent Claim
28 words
A photoresist composition according to claim 7 wherein said phosphorous-containing compound is selected from the group consisting of phosphonitrilic chloride trimers and phosphonitrilic chloride tetramers and mixtures thereof.
Claim 15
Dependent Claim
14 words
A photoresist composition according to claim 7 wherein said phosphorous-containing compound comprises a phosphate.
Claim 16
Dependent Claim
15 words
A photoresist composition according to claim 7 wherein said phosphorous-containing organic compound comprises trimethyl phosphate.
Claim 17
Dependent Claim
15 words
A photoresist composition according to claim 7 wherein said phosphorous-containing compound comprises triphenyl phosphine oxide.
Claim 18
Dependent Claim
33 words
A photoresist composition according to claim 7 wherein said phosphorous-containing compound is selected from the group consisting of tetramethyl phosphate, triphenyl phosphate, triphenyl phosphine oxide, phosphorous pentachloride, trishydroxymethyl phosphine oxide, and phosphorous oxychloride.
Claim 19
Dependent Claim
18 words
A photoresist composition according to claim 1 wherein said organic photoresist comprises a novolac resin and a photosensitizer.
Claim 20
Dependent Claim
22 words
A photoresist composition according to claim 7 wherein said organic photoresist comprises a condensation polymer of phenol and formaldehyde and a photosensitizer.
Claim 21
Dependent Claim
73 words
A modified photoresist composition for being applied to a layer of material to be etched in a reactive ion etching plasma, and that is resistant to etching in oxygen-containing reactive ion etching plasmas when cured, said modified photoresist comprising a solution of nonvolatile photoresist-forming organic compounds in an organic solvent system wherein the nonvolatile compounds are curable into a solid photoresist, said nonvolatile compounds comprising at least about 2 percent by weight phosphorus.
Claim 22
Dependent Claim
73 words
A modified photoresist composition for being applied to a layer of material to be etched in a reactive ion etching plasma, and that is resistant to etching in oxygen-containing reactive ion etching plasmas when cured, said modified photoresist comprising a solution of nonvolatile photoresist-forming organic compounds in an organic solvent system wherein the nonvolatile compounds are curable into a solid photoresist, said nonvolatile compounds comprising at least about 2 percent by weight phosphorus.
Claim 23
Dependent Claim
86 words
A modified photoresist composition for being applied to a layer of organic material to be etched, and that is resistant to etching in oxygen-containing reactive ion etching plasmas when cured, said modified photoresist comprising a solution of a nonvolac resin, photosensitizers, and a phosphorus-containing compound in a solvent, and wherein said phosphorus-containing compound is present in an amount such that phosphorus is present in an amount of about 10 percent by weight of the total weight of said nonvolac resin said photosensitizers, and said phosphorus-containing composition.
Claim 24
Dependent Claim
86 words
A modified photoresist composition for being applied to a layer of organic material to be etched, and that is resistant to etching in oxygen-containing reactive ion etching plasmas when cured, said modified photoresist comprising a solution of a nonvolac resin, photosensitizers, and a phosphorus-containing compound in a solvent, and wherein said phosphorus-containing compound is present in an amount such that phosphorus is present in an amount of about 10 percent by weight of the total weight of said nonvolac resin said photosensitizers, and said phosphorus-containing composition.
Claim 25
Dependent Claim
28 words
A modified photoresist composition according to claim 19 wherein said phosphorus-containing compound is selected from the group consisting of phosphonitrilic chloride trimer, phosphonitrilic chloride tetramer, and mixtures thereof.
Claim 26
Dependent Claim
15 words
A modified photoresist composition according to claim 19 wherein said phosphorus-containing compound comprises trimethyl phosphate.
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