US4460436A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Deposition of polymer films by means of ion beams
Assignee: International Business Machines Corp
•
Filing: 1983-09-06
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Granted: 1984-07-17
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Expires: 2003-09-06
Abstract
Abstract A patterned polymer film is deposited on a substrate by pattern-wise exposing a monomer vapor to a beam of ions and dry developing by etching with oxygen plasma.
Inventors
- 👤 Hiroyuki Hiraoka
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 21:28
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/69; H10P14/692; H10P14/6921; H10P14/6922; G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0755; G03F7/16; G03F7/167; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/6338
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
64 words
A process for depositing a patterned polymer film on a substrate, said process being characterized by the steps of: (1) confining a monomer vapor in a closed chamber containing said substrate; (2) pattern-wise exposing said monomer vapor to a beam of ions to cause deposition of a polymer film on said substrate, and (3) dry developing by etching said polymer film with oxygen plasma.
Claim 2
Dependent Claim
64 words
A process for depositing a patterned polymer film on a substrate, said process being characterized by the steps of: (1) confining a monomer vapor in a closed chamber containing said substrate; (2) pattern-wise exposing said monomer vapor to a beam of ions to cause deposition of a polymer film on said substrate, and (3) dry developing by etching said polymer film with oxygen plasma.
Claim 3
Dependent Claim
24 words
A process as claimed in claim 1 wherein the exposing to ions and the etching with oxygen plasma take place in the same chamber.
Claim 4
Dependent Claim
14 words
A process as claimed in claim 1 wherein the monomer is an organosilicon compound.
Claim 5
Dependent Claim
15 words
A process as claimed in claim 1 wherein the monomer is a phenyl vinyl compound.
Claim 6
Dependent Claim
16 words
A process as claimed in claim 1 wherein the ion beam is a beam of protons.
Claim 7
Dependent Claim
14 words
A process as claimed in claim 1 wherein the substrate is a silicon wafer.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1987-07-17 | 1988-01-16 | 1988-07-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1991-07-17 | 1992-01-16 | 1992-07-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1995-07-17 | 1996-01-16 | 1996-07-17 | $7700.00 | Window Closed / Lapsed |