US4601969A
Expired / Lapsed
US
⏱️ 0.0 years remaining
High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution
Assignee: International Business Machines Corp
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Filing: 1985-03-28
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Granted: 1986-07-22
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Expires: 2005-03-28
Abstract
Abstract A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.
Inventors
- 👤 Nicholas J. Clecak
- 👤 Barbara D. Grant
- 👤 Robert D. Miller
- 👤 Terry C. Tompkins
- 👤 Carlton G. Willson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 12:05
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/016; G03F7/0163
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
103 words
A lithographic resist composition for use with ultraviolet light of less than 313 nm wavelength, said composition comprising a sufficient quantity of a weakly acidic resin and admixed therewith a sufficient quantity of a sensitizer which is an alpha phosphoryl substituted diazo carbonyl compound having the formula ##STR2## where each of R 1 , R 2 and R 3 independently is alkyl or aryl, and n is 0, 1 or 2 the sufficient quantity amounts of the resin and the sensitizer enable ultra-violet exposed portions of the composition to become sufficiently soluble in an alkaline developer to permit formation of a resist image.
Claim 2
Dependent Claim
103 words
A lithographic resist composition for use with ultraviolet light of less than 313 nm wavelength, said composition comprising a sufficient quantity of a weakly acidic resin and admixed therewith a sufficient quantity of a sensitizer which is an alpha phosphoryl substituted diazo carbonyl compound having the formula ##STR2## where each of R 1 , R 2 and R 3 independently is alkyl or aryl, and n is 0, 1 or 2 the sufficient quantity amounts of the resin and the sensitizer enable ultra-violet exposed portions of the composition to become sufficiently soluble in an alkaline developer to permit formation of a resist image.
Claim 3
Dependent Claim
15 words
A composition as claimed in claim 1 wherein the sensitizer is a (Diazophenacyl)-diphenyl phosphine oxide.
Claim 4
Dependent Claim
15 words
A composition as claimed in claim 1 wherein the sensitizer is a (Diazo-p-tert-butylphenacyl)-diphenyl phosphine oxide.
Claim 5
Dependent Claim
15 words
A composition as claimed in claim 1 wherein the sensitizer is a (Diazo-p-methoxyphenacyl)-diphenyl phosphine oxide.
Claim 6
Dependent Claim
15 words
A composition as claimed in claim 1 wherein the sensitizer is a (Diazo-p-phenylphenacyl)-diphenyl phosphine oxide.
Claim 7
Dependent Claim
14 words
A composition as claimed in claim 1 wherein the sensitizer is a (Diazophenacyl)-dimethyl phosphonate.
Claim 8
Dependent Claim
14 words
A composition as claimed in claim 1 wherein the resin is a novolac resin.
Claim 9
Dependent Claim
13 words
A composition as claimed in claim 1 wherein the resin is p-cresol novolac.
Claim 10
Dependent Claim
12 words
A composition as claimed in claim 1 wherein the resin is poly(p-hydroxystyrene).
Claim 11
Dependent Claim
20 words
A composition as claimed in claim 1 wherein the resin is a copolymer of methacrylic acid with an ester thereof.
References Cited (Backward Citations)
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US3668197A
Cited
US4207107A
Cited
US4339522A
Cited
US4458005A
Cited
US4522911A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-07-21 | 1990-01-20 | 1990-07-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-07-21 | 1994-01-20 | 1994-07-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-07-21 | 1998-01-20 | 1998-07-22 | $7700.00 | Window Closed / Lapsed |