US4522911A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Deep ultra-violet lithographic resists with diazohomotetramic acid compounds
Assignee: International Business Machines Corp
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Filing: 1983-06-28
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Granted: 1985-06-11
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Expires: 2003-06-28
Abstract
Abstract A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.
Inventors
- 👤 Nicholas J. Clecak
- 👤 Dennis R. McKean
- 👤 Robert D. Miller
- 👤 Terry C. Tompkins
- 👤 Carlton G. Willson
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 15:57
CPC Classifications
C; C07; C07D; C07D213/00; C07D213/02; C07D213/04; C07D213/60; C07D213/72; C07D213/76; C07D213/77; G; G03; G03F; G03F7/00; G03F7/004; G03F7/016; G03F7/0163
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
86 words
A lithographic resist composition for use with ultra-violet light of less than 300 nm wavelength, said composition comprising an acidic resin and in admixture therewith as a deep ultra-violet sensitizer a sufficient quantity of a diazohomotetramic acid compound having the formula ##STR3## wherein R 1 is hydrogen or an alkyl group and R 2 is an arylalkyl group, an aryl group, or a bifunctional group linking two of the rings together, whereby upon exposure to deep ultra-violet radiation, the composition becomes more soluble in alkaline developer.
Claim 2
Dependent Claim
86 words
A lithographic resist composition for use with ultra-violet light of less than 300 nm wavelength, said composition comprising an acidic resin and in admixture therewith as a deep ultra-violet sensitizer a sufficient quantity of a diazohomotetramic acid compound having the formula ##STR3## wherein R 1 is hydrogen or an alkyl group and R 2 is an arylalkyl group, an aryl group, or a bifunctional group linking two of the rings together, whereby upon exposure to deep ultra-violet radiation, the composition becomes more soluble in alkaline developer.
Claim 3
Dependent Claim
14 words
A lithographic resist composition as claimed in claim 1 wherein the sensitizer is ##STR4##
Claim 4
Dependent Claim
14 words
A lithographic resist composition as claimed in claim 1 wherein the sensitizer is ##STR5##
Claim 5
Dependent Claim
14 words
A lithographic resist composition as claimed in claim 1 wherein the resin is novolak.
Claim 6
Dependent Claim
15 words
A lithographic resist composition as claimed in claim 1 wherein the resin is p-cresol novolac.
Claim 7
Dependent Claim
14 words
A lithographic resist composition as claimed in claim 1 wherein the resin is p-hydroxystyrene.
Claim 8
Dependent Claim
19 words
A lithographic resist composition as claimed in claim 1 wherein the resin is methacrylic acid or a copolymer thereof.
References Cited (Backward Citations)
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Cited
US4207107A
Cited
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Cited
US4284706A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1988-06-10 | 1988-12-10 | 1989-06-11 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1992-06-10 | 1992-12-10 | 1993-06-11 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1996-06-10 | 1996-12-10 | 1997-06-11 | $7700.00 | Window Closed / Lapsed |