Novel ortho-quinone diazide photoresist sensitizers

Claim 2

A compound which absorbs light in the range of about 400 to about 500 nanometers wavelength, of the formula ##STR18## wherein R is an organic radical.

Claim 3

A compound of the formula ##STR19## wherein R is a member of the group consisting of --ACOOX, --ASO 3 X, --ACONYX and --ASO 2 NYX wherein A is arylene, X is an aliphatic or aryl group and Y is hydrogen, alkyl or aryl.

Claim 4

A compound of the formula ##STR19## wherein R is a member of the group consisting of --ACOOX, --ASO 3 X, --ACONYX and --ASO 2 NYX wherein A is arylene, X is an aliphatic or aryl group and Y is hydrogen, alkyl or aryl.

Claim 5

The compound according to claim 1 wherein R is a residue of a polymer having a pendant --NH 2 group.

Claim 6

A compound of the formula ##STR20##

Claim 7

A compound of the formula ##STR20##

Claim 8

A compound of the formula ##STR21##

Claim 9

A compound of the formula ##STR21##

Claim 10

A photoresist composition comprising a mixture of an alkali soluble resin and a sensitizer compound which absorbs light in the range of about 400 to about 500 nanometers wavelength, of the formula ##STR22## wherein R is an organic radical.

Claim 11

A photoresist composition comprising a mixture of an alkali soluble resin and a sensitizer compound which absorbs light in the range of about 400 to about 500 nanometers wavelength, of the formula ##STR22## wherein R is an organic radical.

Claim 12

A photoresist composition according to claim 6 wherein the sensitizer compound comprises from about 5 to 50 percent by weight of said mixture.

Claim 13

In a method of recording information whereby a light sensitive material layer is exposed to an information-carrying light beam whereby the light sensitive material becomes more soluble in a developer solvent when impinged upon by light and the light sensitive material is developed with the developer solvent so as to remove the solubilized portion, the improvement which comprises employing as said light sensitive material a mixture of (a) a light sensitizer which absorbs light in the range of about 400 to 500 nanometers wavelength, having the formula ##STR23## wherein R is an organic radical and (b) an alkali soluble resin.

Claim 14

In a method of recording information whereby a light sensitive material layer is exposed to an information-carrying light beam whereby the light sensitive material becomes more soluble in a developer solvent when impinged upon by light and the light sensitive material is developed with the developer solvent so as to remove the solubilized portion, the improvement which comprises employing as said light sensitive material a mixture of (a) a light sensitizer which absorbs light in the range of about 400 to 500 nanometers wavelength, having the formula ##STR23## wherein R is an organic radical and (b) an alkali soluble resin.

Claim 15

A method according to claim 8 wherein said alkali sensitive resin is selected from the group consisting of novolaks, cellulose derivatives and homopolymers and copolymers of vinyl acetate.

Claim 16

A method according to claim 9 wherein said resin is a novolak resin.

Claim 17

A method according to claim 8 wherein said mixture contains from 5 to 50 percent by weight of said light sensitizer.

Claim 18

A compound of the formula ##STR24## wherein R is an organic radical selected from the group consisting of alkyl, alkoxy, aliphatic ether, alicyclic, o, m, or p-substituted phenyl, o, m, or p-substituted naphthyl, o, m, or p-substituted anthryl, an aliphatic moiety having N, S, or O in its ring, an aromatic moiety having N, S, or O in its ring, a polymeric residue of a polymer having a pendant --NH 2 group, and a moiety of the formula --ACOOX, --ASO 3 X, --ACONYX or --ASO 2 NYX where A is arylene, X is an aliphatic or aryl radical and Y is hydrogen, alkyl or aryl.

Claim 19

A compound of the formula ##STR24## wherein R is an organic radical selected from the group consisting of alkyl, alkoxy, aliphatic ether, alicyclic, o, m, or p-substituted phenyl, o, m, or p-substituted naphthyl, o, m, or p-substituted anthryl, an aliphatic moiety having N, S, or O in its ring, an aromatic moiety having N, S, or O in its ring, a polymeric residue of a polymer having a pendant --NH 2 group, and a moiety of the formula --ACOOX, --ASO 3 X, --ACONYX or --ASO 2 NYX where A is arylene, X is an aliphatic or aryl radical and Y is hydrogen, alkyl or aryl.