Resistant transistor

Claim 2

A bipolar transistor comprising: a body of semiconductor material except in selected portions, said body having a first major surface; an isolating structure, comprising electrical insulating material, extending into said body from said major surface and forming both a closed path in said major surface and a wall in said body around an isolated region of said semiconductor material which isolated region intersects said first major surface; a substrate layer of said semiconductor material in said body which substrate layer is of a first conductivity type and of a first conductivity, said substrate layer being located farther in said body relative to said first major surface than said isolating structure extends, as aforesaid; a barrier layer of said semiconductor material in said body which barrier layer is of said first conductivity type and of a second conductivity greater than said first conductivity, said barrier layer located adjacent to said substrate layer with said isolating structure extending into said barrier layer but short of penetration therethrough so that a portion of said barrier layer is a part of said isolated region; and a collector region of said semiconductor material in said body of a second conductivity type except in a selected portion and located in said isolated region between said barrier layer and said first major surface but intersecting said first major surface, said selected portion which is excepted from said collector region including a base region of said first conductivity type except in selected regions including an emitter region, said emitter region being of said second conductivity type.

Claim 3

The apparatus of claim 1 wherein said barrier layer is of a thickness which is equal to or greater than that width taken by a depletion layer at least in part occurring therein if said bipolar transistor has voltage applied between said substrate layer and said collector region outside said base region of values at which said bipolar resistor is intended to operate.

Claim 4

The apparatus of claim 1 wherein there is further provided a buried layer of said semiconductor material in said body which buried layer is of said second conductivity type and of a third conductivity, said buried layer being located in said isolated region between said barrier layer and said collector region.

Claim 5

A bipolar transistor comprising: a body of semiconductor material except in selected portions, said body having a first major surface; an isolating structure, comprising electrical insulating material, extending into said body from said major surface and forming both a closed path in said major surface and a wall in said body around an isolated region of said semiconductor material which isolated region intersects said first major surface; a substrate layer of said semiconductor material in said body which substrate layer is of a first conductivity type and of a first conductivity with said isolating structure extending into said substrate layer but short of penetrating therethrough so that a portion of said substrate layer is a part of said isolated region; a buffer layer of said semiconductor material in said body which buffer is of said first conductivity type and of a second conductivity less than said first conductivity, said buffer layer located adjacent to said substrate layer so that said buffer layer is a part of said isolated region; and a collector region of said semiconductor material in said body of a second conductivity type except in a selected portion and located in said isolated region between said buffer layer and said first major surface but intersecting said first major surface, said selected portion which is excepted from said collector region including a base region of said first conductivity type except in selected regions including an emitter region, said emitter region being of said second conductivity type.

Claim 6

A bipolar transistor comprising: a body of semiconductor material except in selected portions, said body having a first major surface; an isolating structure, comprising electrical insulating material, extending into said body from said major surface and forming both a closed path in said major surface and a wall in said body around an isolated region of said semiconductor material which isolated region intersects said first major surface; a substrate layer of said semiconductor material in said body which substrate layer is of a first conductivity type and of a first conductivity with said isolating structure extending into said substrate layer but short of penetrating therethrough so that a portion of said substrate layer is a part of said isolated region; a buffer layer of said semiconductor material in said body which buffer is of said first conductivity type and of a second conductivity less than said first conductivity, said buffer layer located adjacent to said substrate layer so that said buffer layer is a part of said isolated region; and a collector region of said semiconductor material in said body of a second conductivity type except in a selected portion and located in said isolated region between said buffer layer and said first major surface but intersecting said first major surface, said selected portion which is excepted from said collector region including a base region of said first conductivity type except in selected regions including an emitter region, said emitter region being of said second conductivity type.

Claim 7

The apparatus of claim 4 wherein said buffer layer is of a thickness which is equal to or less than that width taken by a depletion layer at least in part occurring therein if said bipolar transistor has voltage applied between said substrate layer and said collector region outside said base region of values at which said bipolar transistor is intended to operate.

Claim 8

The apparatus of claim 4 wherein there is further provided a buried layer of said semiconductor material in said body which buried layer is of a second conductivity type and of a third conductivity, said buried layer being located in said isolated region between said buffer layer and said collector region.

Claim 9

A bipolar transistor comprising: a body of semiconductor material except in selected portions, said body having a first major surface; an isolating structure, comprising electrical insulating material, extending into said body from said major surface and forming both a closed path in said major surface and a wall in said body around an isolated region of said semiconductor material which isolated region intersects said first major surface; a substrate layer of said semiconductor material in said body which substrate layer is of a first conductivity type and therein at least includes a first strata which is of a first conductivity with said isolating structure extending into said first strata but short of penetrating therethrough so that a portion of said substrate layer is a part of said isolated region; a collector region of said semiconductor material in said body of a second conductivity type except in a selected portion and located in said isolated region between said substrate layer and said first major surface but intersecting said first major surface, said selected portion which is excepted from said collector region including a base region of said first conductivity type except in selected regions including an emitter region, said base region being of a second conductivity that is less than said first conductivity in that portion thereof directly between said emitter region and said substrate layer, said emitter region being of said second conductivity type; and a second strata included in said substrate layer opposite said first strata from said collector region which has a third conductivity less than said first conductivity.

Claim 10

A bipolar transistor comprising: a body of semiconductor material except in selected portions, said body having a first major surface; an isolating structure, comprising electrical insulating material, extending into said body from said major surface and forming both a closed path in said major surface and a wall in said body around an isolated region of said semiconductor material which isolated region intersects said first major surface; a substrate layer of said semiconductor material in said body which substrate layer is of a first conductivity type and therein at least includes a first strata which is of a first conductivity with said isolating structure extending into said first strata but short of penetrating therethrough so that a portion of said substrate layer is a part of said isolated region; a collector region of said semiconductor material in said body of a second conductivity type except in a selected portion and located in said isolated region between said substrate layer and said first major surface but intersecting said first major surface, said selected portion which is excepted from said collector region including a base region of said first conductivity type except in selected regions including an emitter region, said base region being of a second conductivity that is less than said first conductivity in that portion thereof directly between said emitter region and said substrate layer, said emitter region being of said second conductivity type; and a second strata included in said substrate layer opposite said first strata from said collector region which has a third conductivity less than said first conductivity.

Claim 11

The apparatus of claim 7 wherein said first strata is of a thickness which is equal to or greater than that width taken by a depletion layer at least in part occurring therein if said bipolar transistor has voltage applied between said substrate layer and said collector region outside said base region of values at which said bipolar transistor is intended to operate.

Claim 12

The apparatus of claim 7 wherein there is further provided a buried layer of said semiconductor material in said body which buried layer is of said second conductivity type and of a fourth conductivity, said buried layer being located in said isolated region between said first strata and said collector region.

Claim 13

A bipolar transistor comprising: a body of semiconductor material except in selected portions, said body having a first major surface; an isolating structure, comprising electrical insulating material, extending into said body from said major surface and forming both a closed path in said major surface and a wall in said body around an isolated region of said semiconductor material which isolated region intersects said first major surface; a substrate layer of said semiconductor material in said body which substrate layer is of a first conductivity type and therein at least includes a first strata which is of a first conductivity with said isolating structure extending into said first strata but short of penetrating therethrough so that a portion of said substrate layer is a part of said isolated region; a collector region of said semiconductor material in said body of a second conductivity type except in a selected portion and located in said isolated region between said substrate layer and said first major surface but intersecting said first major surface, said selected portion which is excepted from said collector region including a base region of said first conductivity type except in selected regions including an emitter region, said base region being of a second conductivity that is less than said first conductivity in that portion thereof directly between said emitter region and said substrate layer, said emitter region being of said second conductivity type; and a second strata in said substrate layer on that side of said first strata that said collector region is on which has a third conductivity less than said first conductivity and which is entirely in said isolated region.

Claim 14

A bipolar transistor comprising: a body of semiconductor material except in selected portions, said body having a first major surface; an isolating structure, comprising electrical insulating material, extending into said body from said major surface and forming both a closed path in said major surface and a wall in said body around an isolated region of said semiconductor material which isolated region intersects said first major surface; a substrate layer of said semiconductor material in said body which substrate layer is of a first conductivity type and therein at least includes a first strata which is of a first conductivity with said isolating structure extending into said first strata but short of penetrating therethrough so that a portion of said substrate layer is a part of said isolated region; a collector region of said semiconductor material in said body of a second conductivity type except in a selected portion and located in said isolated region between said substrate layer and said first major surface but intersecting said first major surface, said selected portion which is excepted from said collector region including a base region of said first conductivity type except in selected regions including an emitter region, said base region being of a second conductivity that is less than said first conductivity in that portion thereof directly between said emitter region and said substrate layer, said emitter region being of said second conductivity type; and a second strata in said substrate layer on that side of said first strata that said collector region is on which has a third conductivity less than said first conductivity and which is entirely in said isolated region.

Claim 15

The apparatus of claim 10 wherein said second strata is of a thickness which is equal to or less than that width taken by a depletion layer at least in part occurring therein if said bipolar transistor has voltage applied between said substrate layer and said collector region outside said base region of values at which said bipolar transistor is intended to operate.

Claim 16

The apparatus of claim 10 wherein there is further provided a buried layer of said semiconductor material in said body, which buried layer is of a second conductivity type and of a fourth conductivity, said buried layer being located in said isolated region between said second strata and said collector region.

Claim 17

The apparatus of claim 10 wherein there is further provided a buried layer of said semiconductor material in said body which buried layer is of said second conductivity type and of a third conductivity, said buried layer being located in said isolated region between said substrate layer and said function control layer.