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US4883740A
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Radiation-sensitive mixture for photosensitive coating materials
Assignee: BASF SE
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Filing: 1988-06-30
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Granted: 1989-11-28
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Expires: 2008-06-30
Abstract
Abstract A radiation-sensitive mixture consists of a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions, and of an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains both one or more acid-cleavable groups and a group which forms a strong acid under the action of radiation. The radiation-sensitive mixture is suitable for use in photosensitive coating materials for the production of relief patterns and relief images.
Inventors
- 👤 Reinhold Schwalm
- 👤 Andreas Boettcher
- 👤 Horst Binder
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 22:53
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/075; G03F7/0755; G03F7/0045; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/106; Y10S430/111; Y10S430/114; Y10S430/115; Y10S430/122
Claims Analysis
Total Claims: 19
Claim 1
Independent Claim
70 words
A radiation-sensitive mixture containing (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups, wherein the organic compound (b) additionally contains one or more onium salt groups which form a strong acid under the action of radiation.
Claim 2
Dependent Claim
70 words
A radiation-sensitive mixture containing (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups, wherein the organic compound (b) additionally contains one or more onium salt groups which form a strong acid under the action of radiation.
Claim 3
Dependent Claim
17 words
A radiation-sensitive mixture as defined in claim 1, wherein the polymeric binder (a) is a phenolic resin.
Claim 4
Dependent Claim
15 words
A radiation-sensitive mixture as defined in claim 2, wherein the phenolic resin is a novolak.
Claim 5
Dependent Claim
21 words
A radiation-sensitive mixture as defined in claim 2, wherein the phenolic resin is poly-(p-hydroxymethylstyrene) or a copolymer of p-hydroxystyrene or p-hydroxymethylstyrene.
Claim 6
Dependent Claim
19 words
A radiation-sensitive mixture as defined in claim 1, wherein the polymer binder (a) is a methyl methacrylate/methacrylate acid copolymer.
Claim 7
Dependent Claim
20 words
A radiation-sensitive mixture as sefined in claim 1, wherein the organic compound (b) contains one or more tert-butyl carbonate groups.
Claim 8
Dependent Claim
20 words
A radiation-sensitive mixture as defined in claim 1, wherein the organic compound (b) contains one or more silyl ether groups.
Claim 9
Dependent Claim
115 words
A radiation-sensitive mixture as defined in claim 1, which contains, as the organic compound (b), one or more compounds of the formula (I) ##STR10## where R 1 , R 2 and R 3 are identical or different and are aliphatic and/or aromatic radicals which may contain hetero atoms, or two of the radicals R 1 to R 3 are bonded to one another to form a ring, with the proviso that one or more of the radicals R 1 to R 3 contain one or more acid-cleavable groups, and one of the radicals R 1 to R 3 may be bonded to one or more further sulfonium salt radicals, and X.sup.⊖ is a non-nucleophilic counter-ion.
Claim 10
Dependent Claim
26 words
A radiation-sensitive mixture as defined in claim 1, wherein the organic compound (b) is a dimethyl-4-tertbutoxycarbonyloxyphenylsulfonium salt with hexafluoroarsenate, hexafluoroantimonate, hexafluorophosphate or tetrafluoborate as a counter-ion.
Claim 11
Dependent Claim
26 words
A radiation-sensitive mixture as claimed in claim 1, wherein the organic compound (b) is a phenylbis-(4-tert-butoxycarbonyloxphenyl)-sulfonium salt with hexafluoroarsenate, hexafluoroantimonate, hexafluorophosphate or tetrafluoborate as a counter-ion.
Claim 12
Dependent Claim
26 words
A radiation-sensitive mixture as defined in claim 1, wherein the organic compound (b) is a tris-(4-tert-butoxycarbonyloxyphenyl)-sulfonium salt with hexafluoroarsenate, hexafluoroantimonate, hexafluorophosphate or tetrafluoborate as a counter-ion.
Claim 13
Dependent Claim
25 words
A radiation-sensitive mixture as defined in claim 1, wherein the compound (b) is a 1-naphthyl-4-trimethyl-silyloxytetramethylene-sulfonium salt with hexafluoroarsenate, hexafluoroantimonate, hexafluorophosphate or tetrafluoborate as a counter-ion.
Claim 14
Dependent Claim
33 words
A radiation-sensitive mixture as defined in claim 1, which contains from 25 to 95% by weight of the polymeric binder (a) and from 5 to 75% by weight of the organic compound (b).
Claim 15
Dependent Claim
24 words
A radiation-sensitive mixture as defined in claim 1, which additionally contains a sensitizer which absorbs radiation and transfers it to the organic compound (b).
Claim 16
Dependent Claim
15 words
A radiation-sensitive mixture as claimed in claim 14, wherein the sensitizer is perylene or pyrene.
Claim 17
Dependent Claim
123 words
A process for the production of a relief pattern or relief image which comprises: exposing a radiation-sensitive recording layer imagewise to sufficient radiation to increase the solubility of the exposed parts in aqueous alkaline solvents, said recording layer consisting essentially of (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups, wherein the organic compound (b) additionally contains one or more onium salt groups which form a strong acid under the action of radiation, and thereafter applying an alkaline developer to the exposed layer to selectively remove the exposed parts.
Claim 18
Dependent Claim
123 words
A process for the production of a relief pattern or relief image which comprises: exposing a radiation-sensitive recording layer imagewise to sufficient radiation to increase the solubility of the exposed parts in aqueous alkaline solvents, said recording layer consisting essentially of (a) a polymeric binder which is insoluble in water but soluble in aqueous alkaline solutions and (b) an organic compound whose solubility in an aqueous alkaline developer is increased by the action of an acid and which contains one or more acid-cleavable groups, wherein the organic compound (b) additionally contains one or more onium salt groups which form a strong acid under the action of radiation, and thereafter applying an alkaline developer to the exposed layer to selectively remove the exposed parts.
Claim 19
Dependent Claim
23 words
A process for the production of a relief pattern as defined in claim 16, wherein exposure is followed by heating to 60°-120° C.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1992-11-27 | 1993-05-29 | 1993-11-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1996-11-27 | 1997-05-29 | 1997-11-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2000-11-27 | 2001-05-29 | 2001-11-28 | $7700.00 | Window Closed / Lapsed |