US4752590A
Expired / Lapsed
US
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Method of producing SOI devices
Assignee: AT&T Inc
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Filing: 1986-08-20
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Granted: 1988-06-21
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Expires: 2006-08-20
Abstract
Abstract Disclosed are methods that result in substantial improvement of silicon-on-insulator (SOI) device manufacture. We have discovered that carbon can be advantageously used as a wetting agent in the melting-recrystallization (MR) method of producing SOI wafers. We have also found that contacting the wafer (typically subsequent to the formation thereon of a poly-Si layer on a SiO 2 layer but prior to the completion of formation of a SiO 2 cap layer on the poly-Si layer) with an atmosphere that comprises a wetting agent-containing molecular species (e.g., CH 4 , NH 3 ), with the wafer at an appropriate elevated (e.g., 500°-900° C.) temperature, can reliably result in recrystallized Si films of high quality. Furthermore, we have discovered the existence of a previously unknown parameter regime (low thermal gradient across the resolidification front, typically no more than about 4° C./mm) for the MR process that can result in a highly perfect (χmin of 3%, subboundary spacing of about 50 μm, misalignment across subboundaries of the order of 0.1°) resolidified Si layer. Devices can be fabricated directly in this layer, or the layer can be used as seed substrate for the growth of a "thick" epitaxial Si layer of the type useful for the fabrication of high voltage semiconductor devices.
Inventors
- 👤 Arthur C. Adams
- 👤 Loren N. Pfeiffer
- 👤 Kenneth W. West
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-27 16:57
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/20; H10P14/24; C; C30; C30B; C30B13/00; C30B29/00; C30B29/02; C30B29/06; H10P14/29; H10P14/2901; H10P14/2902; H10P14/2905; H10P14/32; H10P14/3202; H10P14/3238; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3411; H10P14/3451; H10P14/3452; H10P14/3458; H10P14/3466; H10P14/38; H10P14/3802; H10P14/3806; H10P95/00; H10P95/90
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
145 words
A method of manufacturing an electronic device comprising providing a single crystal Si substrate having a major surface and forming a multilayer structure thereon by a process comprising (a) forming a first SiO 2 layer on the major surface of the Si substrate; (b) forming a Si layer on the first SiO 2 layer; (c) forming a SiO 2 cap layer on the Si layer; (d) melting at least a portion of the Si layer, and permitting resolidification of the melted portion of the Si layer, the resolidified layer being substantially monocrystalline; and the method further comprises completing manufacturing the electronic device; characterized in that the method further comprises causing an amount of carbon, effective to insure wetting of at least one of the first SiO 2 layer and the SiO 2 cap layer by the molten Si, to be present in the multilayer structure.
Claim 2
Independent Claim
145 words
A method of manufacturing an electronic device comprising providing a single crystal Si substrate having a major surface and forming a multilayer structure thereon by a process comprising (a) forming a first SiO 2 layer on the major surface of the Si substrate; (b) forming a Si layer on the first SiO 2 layer; (c) forming a SiO 2 cap layer on the Si layer; (d) melting at least a portion of the Si layer, and permitting resolidification of the melted portion of the Si layer, the resolidified layer being substantially monocrystalline; and the method further comprises completing manufacturing the electronic device; characterized in that the method further comprises causing an amount of carbon, effective to insure wetting of at least one of the first SiO 2 layer and the SiO 2 cap layer by the molten Si, to be present in the multilayer structure.
Claim 3
Independent Claim
185 words
A method of manufacturing an electronic device comprising providing a single crystal Si substrate having a major surface and forming a multi-layer structure thereon by a process comprising (a) forming a first SiO 2 layer on the major surface of the Si substrate; (b) forming a Si layer on the first SiO 2 layer; (c) forming a SiO 2 cap layer on the Si layer; (d) melting at least a portion of the Si layer, and permitting resolidification of the melted layer, the resolidified Si layer being substantially monocrystalline; and the method further comprises completing manufacturing the electronic device; characterized in that the method further comprises introducing an amount of wetting agent that is effective to insure wetting of at least one of the first SiO 2 layer and the SiO 2 cap layer by the molten Si into the multilayer structure by a procedure that comprises contacting, prior to the completion of step (c), the multilayer structure with an atmosphere that comprises a wetting agent-containing molecular species while the multilayer structure is at a temperature that causes pyrolysis of the wetting agent-containing molecular species.
Claim 4
Independent Claim
185 words
A method of manufacturing an electronic device comprising providing a single crystal Si substrate having a major surface and forming a multi-layer structure thereon by a process comprising (a) forming a first SiO 2 layer on the major surface of the Si substrate; (b) forming a Si layer on the first SiO 2 layer; (c) forming a SiO 2 cap layer on the Si layer; (d) melting at least a portion of the Si layer, and permitting resolidification of the melted layer, the resolidified Si layer being substantially monocrystalline; and the method further comprises completing manufacturing the electronic device; characterized in that the method further comprises introducing an amount of wetting agent that is effective to insure wetting of at least one of the first SiO 2 layer and the SiO 2 cap layer by the molten Si into the multilayer structure by a procedure that comprises contacting, prior to the completion of step (c), the multilayer structure with an atmosphere that comprises a wetting agent-containing molecular species while the multilayer structure is at a temperature that causes pyrolysis of the wetting agent-containing molecular species.
Claim 5
Dependent Claim
40 words
The method of claim 2, wherein the wetting agent-containing molecular species is chosen from the group consisting of CH 4 , C 2 H 2 , C 2 H 4 , C 2 H 6 , and NH 3 .
Claim 6
Dependent Claim
24 words
The method of claim 2, wherein the surface of the Si layer is contacted with the atmosphere that comprises the wetting agent-containing molecular species.
Claim 7
Dependent Claim
32 words
The method of claim 2, wherein the atmosphere is caused to contact the multi-layer structure during formation of the SiO 2 cap layer, with the atmosphere further comprising a Si-containing molecular species.
Claim 8
Independent Claim
164 words
A method of manufacturing an electronic device comprising providing a single crystal substrate having a major surface and forming a multilayer structure thereon by a process comprising (a) forming a first SiO 2 layer on the major surface of the SiO 2 substrate; (b) forming a Si layer on the first SiO 2 layer; (c) forming a SiO 2 cap layer on the Si layer; (d) melting a portion of the Si layer, causing the melted portion to move across at least a part of the Si film, and permitting resolidification of the melted portion of the layer, the resolidified Si layer being substantially monocrystalline, associated with the melted portion being a resolidification front and a thermal gradient across the resolidification front, and the method further comprises completing manufacturing the electronic device; characterized inm that the thermal gradient across the resolidification front, normal to the resolidification front and in the plane of the Si film, is caused to be at most about 4° C./mm.
Claim 9
Independent Claim
164 words
A method of manufacturing an electronic device comprising providing a single crystal substrate having a major surface and forming a multilayer structure thereon by a process comprising (a) forming a first SiO 2 layer on the major surface of the SiO 2 substrate; (b) forming a Si layer on the first SiO 2 layer; (c) forming a SiO 2 cap layer on the Si layer; (d) melting a portion of the Si layer, causing the melted portion to move across at least a part of the Si film, and permitting resolidification of the melted portion of the layer, the resolidified Si layer being substantially monocrystalline, associated with the melted portion being a resolidification front and a thermal gradient across the resolidification front, and the method further comprises completing manufacturing the electronic device; characterized inm that the thermal gradient across the resolidification front, normal to the resolidification front and in the plane of the Si film, is caused to be at most about 4° C./mm.
Claim 10
Dependent Claim
70 words
The method of claim 6, wherein step (d) comprises providing first means for uniformly heating the Si substrate, heating the Si substrate with the first means to a base temperature in the range from about 100° C.-25° C. below the melting temperature of Si, and providing second means for non-uniformly heating the Si substrate and the multilayer structure thereon such that the melted portion of the Si layer is strip-like.
Claim 11
Dependent Claim
85 words
The method of claim 6, comprising introducing an amount of wetting agent that is effective to insure wetting of at least one of the first SiO 2 layer and the SiO 2 cap layer by the molten Si into the multilayer structure by a procedure that comprises contacting, prior to the completion of step (c), the multilayer structure with an atmosphere that comprises a wetting agent-containing molecular species while the multilayer structure is at a temperature that causes pyrolysis of the wetting agent-containing molecular species.
Claim 12
Dependent Claim
40 words
Method of claim 6, comprising providing seeding means for contacting the single crystal Si substrate material with the molten Si such that the crystal orientation of the resolidified Si layer is determined by the crystal orientation of the Si substrate.
Claim 13
Dependent Claim
57 words
Method of claim 6, further comprising removing the SiO 2 cap layer from at least part of the resolidified Si layer, and depositing Si onto the resolidified Si layer such that the deposited Si is epitaxial with the resolidified Si layer, forming a "thick" Si layer, with the semiconductor device being formed in the thick Si layer.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-06-21 | 1991-12-21 | 1992-06-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-06-21 | 1995-12-21 | 1996-06-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-06-21 | 1999-12-21 | 2000-06-21 | $7700.00 | Window Closed / Lapsed |