Process for producing single crystalline semiconductor island on insulator

Claim 2

A process of producing a single crystalline semiconductor island on an insulator, comprising the steps of: forming a semiconductor island of a nonmonocrystalline semiconductor, having upper and side surfaces, on an insulator; forming an energy-absorbing cap layer which coats at least said upper and side surfaces of said semiconductor island, said energy-absorbing cap layer being capable of absorbing radiant energy and generating heat enough to melt said semiconductor island; and irradiating said energy-absorbing cap layer with an energy beam of radiant energy sufficient to melt and transform said coated nonmonocrystalline semiconductor into a single crystalline semiconductor by the heat generated in said energy-absorbing cap layer.

Claim 3

A process according to claim 1, further comprising the step of forming an anti-reflective layer over said energy-absorbing cap layer.

Claim 4

A process according to claim 1, further comprising the step of forming a separating layer between said semiconductor island and said energy-absorbing cap layer.

Claim 5

A process according to claim 1, further comprising the step of forming a wetting layer under said semiconductor island and also under said energy-absorbing cap layer.

Claim 6

A process according to claim 1, wherein said nonmonocrystalline semiconductor is polycrystalline silicon, said energy-absorbing cap layer is polycrystalline silicon, and said energy beam is an argon ion laser beam.

Claim 7

A process for producing single crystalline semiconductor islands on an insulator, comprising the steps of: (a) forming an insulator layer on a substrate; (b) forming a first wetting layer on said insulator layer; (c) forming a semiconductor island of a nonmonocrystalline semiconductor on said wetting layer; (d) coating said semiconductor island with a separating layer; (e) forming a second wetting layer on said separating layer; (f) forming an energy-absorbing layer on said second wetting layer; (g) forming a shape-stabilizing layer on said energy-absorbing layer; (h) forming an antireflecting layer on said shape-stabilizing layer; (i) irradiating said substrate and layers formed thereon with a laser beam, thereby generating heat in said energy-absorbing layer sufficient to melt and transform said nonmonocrystalline semiconductor of said semiconductor island into a single crystalline semiconductor by said generated heat; and (j) removing all layers formed on said semiconductor island.

Claim 8

A process for producing single crystalline semiconductor islands on an insulator, comprising the steps of: (a) forming an insulator layer on a substrate; (b) forming a first wetting layer on said insulator layer; (c) forming a semiconductor island of a nonmonocrystalline semiconductor on said wetting layer; (d) coating said semiconductor island with a separating layer; (e) forming a second wetting layer on said separating layer; (f) forming an energy-absorbing layer on said second wetting layer; (g) forming a shape-stabilizing layer on said energy-absorbing layer; (h) forming an antireflecting layer on said shape-stabilizing layer; (i) irradiating said substrate and layers formed thereon with a laser beam, thereby generating heat in said energy-absorbing layer sufficient to melt and transform said nonmonocrystalline semiconductor of said semiconductor island into a single crystalline semiconductor by said generated heat; and (j) removing all layers formed on said semiconductor island.