US4741989A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Positive photoresist aqueous developer solution containing quaternary ammonium hydroxide with aliphatic ketone or cyclic ether alone or with amine as development modifier
Assignee: Sumitomo Chemical Co Ltd
•
Filing: 1986-05-28
•
Granted: 1988-05-03
•
Expires: 2006-05-28
Abstract
Abstract A developer for positive photoresists which can improve the sensitivity and resolution of the resist is disclosed. The developer comprises an aqueous solution of a quaternary ammonium hydroxide represented by the formula (I): <IMAGE> (I) wherein R1, R2, R3, and R4 are each an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5 carbon atoms, and at least one development modifier selected from the group consisting of water-soluble aliphatic ketones, cyclic ethers, and tertiary amines, and optionally, at least one another development modifier selected from the group consisting of water-soluble primary amines and secondary amines.
Inventors
- 👤 Kenji Niwa
- 👤 Ichiro Ichikawa
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 21:10
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/30; G03F7/32; G03F7/322
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
97 words
A developer for positive photoresists consisting essentially of a 2 to 5 wt % aqueous solution of a quaternary ammonium hydroxide represented by the formula (I): ##STR4## wherein R 1 , R 2 , R 3 , and R 4 are each an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5 carbon atoms, and at least one development modifier selected from the group consisting of water-soluble aliphatic ketones and water-soluble cyclic ethers, said development modifier being added to the developer in an amount of 10 to 200 ppm (w/w).
Claim 2
Dependent Claim
97 words
A developer for positive photoresists consisting essentially of a 2 to 5 wt % aqueous solution of a quaternary ammonium hydroxide represented by the formula (I): ##STR4## wherein R 1 , R 2 , R 3 , and R 4 are each an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5 carbon atoms, and at least one development modifier selected from the group consisting of water-soluble aliphatic ketones and water-soluble cyclic ethers, said development modifier being added to the developer in an amount of 10 to 200 ppm (w/w).
Claim 3
Dependent Claim
138 words
A developer for positive photoresists consisting essentially of a 2 to 5 wt % aqueous solution of a quaternary ammonium hydroxide represented by the formula (I): ##STR5## wherein R 1 , R 2 , R 3 , and R 4 are each an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5 carbon atoms, at least one first development modifier selected from the group consisting of water-soluble aliphatic ketones and water soluble cyclic ethers, and at least one second development modifier selected from the group consisting of water-soluble primary amines and water-soluble secondary amines, said first development modifier being added to the developer in an amount of 10 to 200 ppm (w/w) and said second development modifier being added to the developer in an amount of 10 to 200 ppm (w/w).
Claim 4
Dependent Claim
138 words
A developer for positive photoresists consisting essentially of a 2 to 5 wt % aqueous solution of a quaternary ammonium hydroxide represented by the formula (I): ##STR5## wherein R 1 , R 2 , R 3 , and R 4 are each an alkyl group having 1 to 4 carbon atoms or a hydroxyalkyl group having 1 to 5 carbon atoms, at least one first development modifier selected from the group consisting of water-soluble aliphatic ketones and water soluble cyclic ethers, and at least one second development modifier selected from the group consisting of water-soluble primary amines and water-soluble secondary amines, said first development modifier being added to the developer in an amount of 10 to 200 ppm (w/w) and said second development modifier being added to the developer in an amount of 10 to 200 ppm (w/w).
Claim 5
Dependent Claim
36 words
A developer for positive photoresists as recited in claim 1, wherein the water-soluble aliphatic ketones are aliphatic ketones having 3 to 8 carbon atoms and the water-soluble cyclic ethers are 3- to 6-membered alicyclic ethers and.
Claim 6
Dependent Claim
65 words
A developer for positive photoresists as recited in claim 2, wherein the water-soluble aliphatic ketones are aliphatic ketones having 3 to 8 carbon atoms and the cyclic ethers are 3- to 6-membered alicyclic ethers and; and the water-soluble primary amines are aliphatic primary amines having 1 to 2 carbon atoms, and the water-soluble secondary amines are aliphatic secondary amines having 2 to 5 carbon atoms.
Claim 7
Dependent Claim
33 words
A developer for positive photoresists as recited in claim 1, wherein the aqueous solution of quaternary ammonium hydroxide represented by the formula (I) is an aqueous solution of tetramethylammonium hydroxide or trimethylethanolammonium hydroxide.
Claim 8
Dependent Claim
33 words
A developer for positive photoresists as recited in claim 2, wherein the aqueous solution of quaternary ammonium hydroxide represented by the formula (I) is an aqueous solution of tetramethylammonium hydroxide or trimethylethanolammonium hydroxide.
Claim 9
Dependent Claim
22 words
A developer for positive photorests as recited in claim 5, wherein the development modifier is acetone, methyl isobutyl ketone, tetrahydrofuran or dioxane.
Claim 10
Dependent Claim
33 words
A developer for positive photoresists as recited in claim 6, wherein the first development modifier is acetone, methyl isobutyl ketone, tetrahydrofuran or dioxane; and the second development modifier is monoethylamine dimethylamine, or piperazine.
References Cited (Backward Citations)
US3902906A
Cited
US4191573A
Cited
US4239661A
Cited
US4141733A
Cited
US4411981A
Cited
US4555469A
Cited
EP0062733A1
Cited
JPS5857128A
Cited
JPS5882243A
Cited
US4536465A
Cited
JPS58150949A
Cited
JPS5962850A
Cited
JPS59219743A
Cited
JPS59220732A
Cited
US4464461A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-05-03 | 1991-11-02 | 1992-05-03 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-05-03 | 1995-11-02 | 1996-05-03 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-05-03 | 1999-11-02 | 2000-05-03 | $7700.00 | Window Closed / Lapsed |