Patent US4737437A successfully refreshed from Google Patents.
US4737437A
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Light sensitive diazo compound, composition and method of making the composition
Assignee: EAST SHORE CHEMICAL Co A CORP OF MICHIGAN
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Filing: 1986-03-27
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Granted: 1988-04-12
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Expires: 2006-03-27
Abstract
Abstract The specification discloses photosensitizers comprising esters of 1-oxo-2-diazo-naphthalene sulfonic acid and 4-benzyl-1,2,3-trihydroxybenzene, photo resists based thereon and methods for making the necessary intermediates and final products.
Inventors
- 👤 Erwin S. Gutsell, Jr.
- 👤 Louis C. Cohen
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 14:57
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
22 words
A photosensitizer comprising: a mixed ester of mono, di and tri-esters of 4-benzyl-1,2,3-trihydroxybenzene and 1-oxo-2-diazo-naphthalene-x-sulfonic acid, where "x" is 4 or 5.
Claim 2
Dependent Claim
22 words
A photosensitizer comprising: a mixed ester of mono, di and tri-esters of 4-benzyl-1,2,3-trihydroxybenzene and 1-oxo-2-diazo-naphthalene-x-sulfonic acid, where "x" is 4 or 5.
Claim 3
Dependent Claim
35 words
A photoresist solution comprising: a solvent solution of a matrix resin and a photoeffective amount of a mixed ester of mono-, di- and tri-esters of 4-benzyl-1,2,3-trihydroxybenzene and 1-oxo-2-diazo-naphthalene-x-sulfonic acid, where "x" is 4 or 5.
Claim 4
Dependent Claim
35 words
A photoresist solution comprising: a solvent solution of a matrix resin and a photoeffective amount of a mixed ester of mono-, di- and tri-esters of 4-benzyl-1,2,3-trihydroxybenzene and 1-oxo-2-diazo-naphthalene-x-sulfonic acid, where "x" is 4 or 5.
Claim 5
Dependent Claim
16 words
The photo resist solution of claim 2 in which said matrix resin is a novolak resin.
Claim 6
Independent Claim
41 words
A method for sensitizing a photo resist solution comprising a resin matrix comprising dissolving into the resist solution a photoeffective amount of a mixed ester of mono-, di- and tri-esters of 4-benzyl-1,2,3-trihydroxybenzene and 1-oxo-2-diazo-naphthalene-x-sulfonic acid, where "x" is 4 or 5.
Claim 7
Independent Claim
41 words
A method for sensitizing a photo resist solution comprising a resin matrix comprising dissolving into the resist solution a photoeffective amount of a mixed ester of mono-, di- and tri-esters of 4-benzyl-1,2,3-trihydroxybenzene and 1-oxo-2-diazo-naphthalene-x-sulfonic acid, where "x" is 4 or 5.
Claim 8
Dependent Claim
35 words
A dry photo resist matrix comprising: an admixture of matrix resin and a photoeffective amount of a mixed ester of mono-, di- and tri-esters of 4-benzyl-1,2,3-trihydroxybenzene and 1-oxo-2-diazo-naphthalene-x-sulfonic acid, where "x" is 4 or 5.
Claim 9
Dependent Claim
35 words
A dry photo resist matrix comprising: an admixture of matrix resin and a photoeffective amount of a mixed ester of mono-, di- and tri-esters of 4-benzyl-1,2,3-trihydroxybenzene and 1-oxo-2-diazo-naphthalene-x-sulfonic acid, where "x" is 4 or 5.
Claim 10
Dependent Claim
17 words
The dry photo resist matrix of claim 5 in which said matrix resin is a novolak resin.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1991-04-12 | 1991-10-12 | 1992-04-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1995-04-12 | 1995-10-12 | 1996-04-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1999-04-12 | 1999-10-12 | 2000-04-12 | $7700.00 | Window Closed / Lapsed |