Patent US2688246A successfully refreshed from Google Patents.
EP0147596A2
Expired / Lapsed
EP
⏱️ 0.0 years remaining
A positive lithographic resist composition
Assignee: International Business Machines Corp
•
Filing: 1984-11-14
•
Granted: —
•
Expires: 2004-11-14
Abstract
Abstract A positive lithographic resist compositions comprises a phenol resin and a sensitizer having the structure wherein n is an integer from 1 to 5, each of R and R' is and D is -CH 2 -CH 2 -,
Inventors
- 👤 James Economy
- 👤 Dennis Richard Mckean
- 👤 Robert Dennis Miller
- 👤 Carlton Grant Willson
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-11-03 06:03
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/022
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
37 words
A positive lithographic resist composition comprising a phenolic resin and a sensitizer, characterised by the sensitizer having the structure wherein n is an integer from 1 to 5, each of R and R' is and D is
Claim 2
Dependent Claim
37 words
A positive lithographic resist composition comprising a phenolic resin and a sensitizer, characterised by the sensitizer having the structure wherein n is an integer from 1 to 5, each of R and R' is and D is
Claim 3
Dependent Claim
13 words
A composition as claimed in claim 1, wherein R and R' are different.
Claim 4
Dependent Claim
16 words
. 3. A composition as claimed in claim 1 or claim 2, wherein n is 2.
Claim 5
Dependent Claim
14 words
A composition as claimed in claim 1 or claim 2, wherein n is 3.
Claim 6
Dependent Claim
16 words
A composition as claimed in any preceding claim, wherein the sensitizer comprises a mixture of compounds.
References Cited (Backward Citations)
No citation records indexed.
USPTO Annuity & Maintenance Windows
Maintenance schedule is calculated for granted US utility patents.