Patent US4698316A successfully refreshed from Google Patents.
US4698316A
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US
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Method of depositing uniformly thick selective epitaxial silicon
Assignee: Intersil Corp
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Filing: 1985-11-29
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Granted: 1987-10-06
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Expires: 2005-11-29
Abstract
Abstract A method for depositing monocrystalline silicon at a uniform rate onto a plurality of unequally sized monocrystalline nucleation sites comprises initially providing a substrate having an apertured oxide mask on a major surface thereof. The oxide mask includes a plurality of apertures each of which exposes a nucleation site on the substrate surface. The substrate is then exposed to a mixture of dichlorosilane and hydrogen chloride at 850° C. and a pressure less than approximately 50 torr, for a predetermined time. This yields a monocrystalline silicon island extending from each nucleation site. Each of the islands has a substantially flat profile across the major surface thereof and all islands are equal in thickness.
Inventors
- 👤 John F. Corboy, Jr.
- 👤 Robert H. Pagliaro, Jr.
- 👤 Lubomir L. Jastrzebski
- 👤 Ramazan Soydan
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-02 21:36
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/20; H10P14/29; H10P14/2901; H10P14/2902; H10P14/2905; H10P14/24; H10P14/27; H10P14/34; H10P14/3402; H10P14/3404; H10P14/3411; H10W; H10W10/00; H10W10/01; H10W10/011; H10W10/018; H10W10/10
Claims Analysis
Total Claims: 6
Claim 1
Independent Claim
111 words
A method for depositing monocrystalline silicon, at a uniform rate, onto a plurality of unequally sized monocrystalline nucleation sites comprising: providing a substrate having an apertured oxide mask on a major surface thereof, the oxide mask including a plurality of apertures therethrough, each aperture exposing a nucleation site on the substrate surface; and exposing the substrate to a mixture of dichlorosilane and hydrogen chloride at 850° C. and at a pressure less than approximately 50 torr, for a predetermined time, so as to yield a monocrystalline silicon island extending from each nucleation site, all islands being equal in thickness and each having a substantially flat profile across the major surface thereof.
Claim 2
Independent Claim
111 words
A method for depositing monocrystalline silicon, at a uniform rate, onto a plurality of unequally sized monocrystalline nucleation sites comprising: providing a substrate having an apertured oxide mask on a major surface thereof, the oxide mask including a plurality of apertures therethrough, each aperture exposing a nucleation site on the substrate surface; and exposing the substrate to a mixture of dichlorosilane and hydrogen chloride at 850° C. and at a pressure less than approximately 50 torr, for a predetermined time, so as to yield a monocrystalline silicon island extending from each nucleation site, all islands being equal in thickness and each having a substantially flat profile across the major surface thereof.
Claim 3
Dependent Claim
19 words
A method in accordance with claim 1, wherein the hydrogen chloride:dichlorosilane partial pressure ratio is less than approximately 2:1.
Claim 4
Dependent Claim
19 words
A method in accordance with claim 1 further comprising: including hydrogen in the mixture of dichlorosilane and hydrogen chloride.
Claim 5
Dependent Claim
43 words
A method in accordance with claim 3 comprising: providing dichlorosilane at a flow rate of approximately 0.4 l/min; providing hydrogen chloride at a flow rate between approximately 0.4 l/min and 0.9 l/min; and providing hydrogen at a flow rate of approximately 50 l/min.
Claim 6
Dependent Claim
13 words
A method in accordance with claim 1 wherein the substrate is monocrystalline silicon.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-10-05 | 1991-04-06 | 1991-10-06 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-10-05 | 1995-04-06 | 1995-10-06 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-10-05 | 1999-04-06 | 1999-10-06 | $7700.00 | Window Closed / Lapsed |