Patent US4638762A successfully refreshed from Google Patents.
US4638762A
Expired / Lapsed
US
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Chemical vapor deposition method and apparatus
Assignee: AERICAN TELEPHONE AND TELEGRAPH COMPANY A CORP OF NEW YORK
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Filing: 1985-08-30
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Granted: 1987-01-27
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Expires: 2005-08-30
Abstract
Abstract A chemical vapor deposition apparatus particularly useful for forming uniformly thick epitaxial layers of III-V semiconductor compounds on a plurality of substrates comprises a susceptor for supporting the substrates contained within a housing, gas inlet and outlet ports including a plurality of gas inlet ports spaced around the periphery of the housing and wherein the susceptor is provided with a plurality of helical flights extending from top to bottom which control the gas flow pattern.
Inventors
- 👤 Myung K. Kim
- 👤 Montri Viriyayuthakorn
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 22:01
CPC Classifications
C; C30; C30B; C30B25/00; C30B25/02; C30B25/12; C23; C23C; C23C16/00; C23C16/44; C23C16/458; C23C16/4582; C23C16/4587; C23C16/4588; C30B25/14
Claims Analysis
Total Claims: 7
Claim 1
Independent Claim
87 words
A chemical vapor deposition apparatus comprises a susceptor confined within a housing to form a deposition chamber, a plurality of gas inlet orifices for the entry of gases into the chamber, a gas outlet orifice to expel gases from the chamber, means for heating the susceptor and means for rotating the susceptor, wherein the susceptor includes means for supporting a plurality of substrates around the susceptor and a plurality of helical baffles extending from a top region of the susceptor to a bottom region of the susceptor.
Claim 2
Dependent Claim
87 words
A chemical vapor deposition apparatus comprises a susceptor confined within a housing to form a deposition chamber, a plurality of gas inlet orifices for the entry of gases into the chamber, a gas outlet orifice to expel gases from the chamber, means for heating the susceptor and means for rotating the susceptor, wherein the susceptor includes means for supporting a plurality of substrates around the susceptor and a plurality of helical baffles extending from a top region of the susceptor to a bottom region of the susceptor.
Claim 3
Dependent Claim
29 words
The apparatus recited in claim 1, including a plurality of spaced gas inlet means through the periphery of the housing and a main gas inlet port above the susceptor.
Claim 4
Dependent Claim
19 words
The apparatus recited in claim 1, wherein the susceptor is graphite and the heating means is an RF coil.
Claim 5
Dependent Claim
23 words
The apparatus recited in claim 2, including means for controlling the gas flow rates to achieve a uniform gas composition over each substrate.
Claim 6
Dependent Claim
28 words
The apparatus recited in claim 2, wherein the helical baffles on the susceptor extend from above the highest substrate support means to below the lowest substrate support means.
Claim 7
Dependent Claim
15 words
The apparatus recited in claim 1, wherein the susceptor is cylindrical or conical in shape.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1990-01-26 | 1990-07-28 | 1991-01-27 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1994-01-26 | 1994-07-28 | 1995-01-27 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1998-01-26 | 1998-07-28 | 1999-01-27 | $7700.00 | Window Closed / Lapsed |