US4629548A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Planar penning magnetron sputtering device
Assignee: Novellus Systems Inc
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Filing: 1985-04-03
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Granted: 1986-12-16
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Expires: 2005-04-03
Abstract
Abstract An improved magnetron sputter source particularly suitable for magnetic materials is provided in the forming of an unfolded Penning discharge source. The two cathodes are in the form of an inner cathode roughly coplanar with an outer cathode ring. An anode radially between the cathodes is raised above the cathode surfaces so as to block line of sight from the inner cathode surface to the outer. A magnetic flux vector is imposed which passed from one cathode surface to the other. Raising the anode surface about one-fourth inch above the cathode surfaces allows raising the applied voltage so that a source of 5 kilowatts or greater is possible. Raising the anode also spreads the distribution of discharge more uniformly over the target surface and permits low pressure operation thereby facilitating good adhesion and uniform coverage of the substrate.
Inventors
- 👤 John C. Helmer
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-05 21:10
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3411; H01J37/3414; H01J37/3426; H01J37/3402; H01J37/3405; H01J37/3408; H01J37/345; H01J37/3458
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
114 words
A magnetron sputter coating source comprising: a first cathode means supporting a first sputter target having a first outer sputter surface; a second cathode means supporting a second sputter target having a second outer sputter surface concentric with said first outer sputter surface; an anode formed as a ring concentric with said first outer sputter surface and located radially between said first outer sputter surface and said second outer sputter surface, said ring defining a circularly tangential outer plane, said circularly tangential outer plane being further outward than any point on said first or said second outer sputter surfaces; and means for imposing a magnetic field on said first and said second sputter targets.
Claim 2
Dependent Claim
114 words
A magnetron sputter coating source comprising: a first cathode means supporting a first sputter target having a first outer sputter surface; a second cathode means supporting a second sputter target having a second outer sputter surface concentric with said first outer sputter surface; an anode formed as a ring concentric with said first outer sputter surface and located radially between said first outer sputter surface and said second outer sputter surface, said ring defining a circularly tangential outer plane, said circularly tangential outer plane being further outward than any point on said first or said second outer sputter surfaces; and means for imposing a magnetic field on said first and said second sputter targets.
Claim 3
Dependent Claim
24 words
A magnetron sputter coating source as in claim 1 wherein said first outer sputter surface and said second outer sputter surface are generally coplanar.
Claim 4
Dependent Claim
32 words
A magnetron sputter coating source as in claim 2 wherein an outermost locus of points of said anode is at least one-eighth inch above any point on either of said sputter surfaces.
Claim 5
Dependent Claim
112 words
A magnetron sputter coating source comprising: a first cathode means supporting a disk-shaped first sputtering target having a first planar outer sputtering surface; an anode shaped as a cylindrical shell positioned concentrically with said first sputtering target, one end of said cylindrical shell projecting outwardly of the plane of said first planar outer sputtering surface; a second cathode means supporting a ring-shaped second sputtering target having a second planar outer sputtering surface, said second planar outer sputtering surface being generally coplanar with said first planar outer sputtering surface, said second planar outer sputtering surface being concentric with said first planar outer sputtering surface; an electromagnet coil; and a yoke of magnetic material.
Claim 6
Dependent Claim
112 words
A magnetron sputter coating source comprising: a first cathode means supporting a disk-shaped first sputtering target having a first planar outer sputtering surface; an anode shaped as a cylindrical shell positioned concentrically with said first sputtering target, one end of said cylindrical shell projecting outwardly of the plane of said first planar outer sputtering surface; a second cathode means supporting a ring-shaped second sputtering target having a second planar outer sputtering surface, said second planar outer sputtering surface being generally coplanar with said first planar outer sputtering surface, said second planar outer sputtering surface being concentric with said first planar outer sputtering surface; an electromagnet coil; and a yoke of magnetic material.
Claim 7
Dependent Claim
125 words
A magnetron sputter coating source comprising: a first cathode means supporting a first sputter target having a first outer sputter surface; a second cathode means supporting a second sputter target having a second outer sputter surface concentric with said first outer sputter surface; an anode formed as a ring concentric with said first outer sputter surface and said second outer sputter surface and located radially between said first outer sputter surface and said second outer sputter surface, said anode formed so that any line of sight between any point on said first outer sputter surface and any point on said second outer sputter surface is blocked by said anode; and means for imposing a magnetic field on said first and said second outer sputter surfaces.
Claim 8
Dependent Claim
125 words
A magnetron sputter coating source comprising: a first cathode means supporting a first sputter target having a first outer sputter surface; a second cathode means supporting a second sputter target having a second outer sputter surface concentric with said first outer sputter surface; an anode formed as a ring concentric with said first outer sputter surface and said second outer sputter surface and located radially between said first outer sputter surface and said second outer sputter surface, said anode formed so that any line of sight between any point on said first outer sputter surface and any point on said second outer sputter surface is blocked by said anode; and means for imposing a magnetic field on said first and said second outer sputter surfaces.
Claim 9
Dependent Claim
36 words
A magnetron sputter source as in claim 5 where said means for imposing a magnetic field is a means for imposing a magnetic flux vector from either one of said outer sputter surfaces to the other.
References Cited (Backward Citations)
US2146025A
Cited
US3117065A
Cited
US3353054A
Cited
US3447072A
Cited
US3412310A
Cited
US3566185A
Cited
US3898496A
Cited
US4282083A
Cited
US4324631A
Cited
US4448653A
Cited
US4344019A
Cited
US4401546A
Cited
US4576700A
Cited
US4412907A
Cited
US4391697A
Cited
US4431505A
Cited
US4414087A
Cited
US4500409A
Cited
US4564435A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1989-12-15 | 1990-06-16 | 1990-12-16 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1993-12-15 | 1994-06-16 | 1994-12-16 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1997-12-15 | 1998-06-16 | 1998-12-16 | $7700.00 | Window Closed / Lapsed |