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Apparatus for compensating corrosion effects in integrated semiconductor circuits

Assignee: Siemens AG
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Filing: 1982-08-23
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Granted: 1986-04-15
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Expires: 2002-08-23
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Abstract

Abstract Apparatus for compensating corrosion effects due to highly mobile positive ions in insulating oxides of integrated semiconductor circuits, including a ring being disposed on the surface of a semiconductor circuit and being connected to a negative voltage, the ring being formed of a material resistant to corrosion due to positive ions during the operation of semiconductor circuits.

Inventors

  • 👤 Jurgen R. Goetz

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 04:31
CPC Classifications
H; H10; H10W; H10W42/00

Claims Analysis

Total Claims: 8
Claim 1
Independent Claim 80 words
Apparatus for compensating corrosion effects due to highly mobile positive ions in insulating oxides of integrated semiconductor circuits, comprising a semiconductor circuit formed of an insulating oxide layer, and a ring being disposed on the surface of said insulating oxide layer forming said semiconductor circuit and being connected to a negative voltage, said ring being formed of a material which resists corrosion by preventing the formation of positive ions in said insulating oxide layer during the operation of semiconductor circuits.
Claim 2
Dependent Claim 80 words
Apparatus for compensating corrosion effects due to highly mobile positive ions in insulating oxides of integrated semiconductor circuits, comprising a semiconductor circuit formed of an insulating oxide layer, and a ring being disposed on the surface of said insulating oxide layer forming said semiconductor circuit and being connected to a negative voltage, said ring being formed of a material which resists corrosion by preventing the formation of positive ions in said insulating oxide layer during the operation of semiconductor circuits.
Claim 3
Dependent Claim 12 words
Apparatus according to claim 1, wherein said ring is formed of polysilicon.
Claim 4
Dependent Claim 13 words
Apparatus according to claim 1, wherein said ring is formed of a silicide.
Claim 5
Dependent Claim 26 words
Apparatus according to claim 3, wherein said ring is formed of a silicide selected from the group consisting of tantalum silicide, molybdenum silicide and tungsten silicide.
Claim 6
Dependent Claim 20 words
Apparatus according to claim 1, including terminal pads for said ring, said terminal pads being disposed within the semiconductor circuit.
Claim 7
Dependent Claim 33 words
Apparatus according to claim 5, including conductor runs being extended across given locations on said ring and being connected to said terminal pads, said ring having interruptions formed therein at said given locations.
Claim 8
Dependent Claim 34 words
Apparatus according to claim 5 or 6, wherein said ring is formed of polysilicon, and including at least one conducting connection being connected from said ring to at least one of said terminal pads.

References Cited (Backward Citations)

US3573571A Cited
US3611071A Cited
US3602782A Cited
US3811076A Cited
US3961358A Cited
US4219827A Cited
US4063274A Cited
US4122483A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1989-04-14 1989-10-14 1990-04-15 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1993-04-14 1993-10-14 1994-04-15 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1997-04-14 1997-10-14 1998-04-15 $7700.00 Window Closed / Lapsed

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