Claims Analysis
Total Claims: 20
Claim 1
Independent Claim
31 words
A metal insulating semiconductor device comprising: a semiconductor substrate formed from a compound of III-V semiconductor material, and an insulating layer formed from an elemental pniotide material on said semiconductor substrate.
Claim 2
Dependent Claim
31 words
A metal insulating semiconductor device comprising: a semiconductor substrate formed from a compound of III-V semiconductor material, and an insulating layer formed from an elemental pniotide material on said semiconductor substrate.
Claim 3
Dependent Claim
42 words
A metal insulating semiconductor device comprising: a semiconductor substrate formed from a compound of III-V semiconductor material, and an insulated layer formed from a polypniotide or said semiconductor substrate, said polypniotide being a compound formed from an alkali metal and a pniotide.
Claim 4
Dependent Claim
42 words
A metal insulating semiconductor device comprising: a semiconductor substrate formed from a compound of III-V semiconductor material, and an insulated layer formed from a polypniotide or said semiconductor substrate, said polypniotide being a compound formed from an alkali metal and a pniotide.
Claim 5
Dependent Claim
41 words
A metal insulating semiconductor device as claimed in claims 1 or 2 further including: a layer of silicon nitride on said insulating layer for providing both a second insulating layer and for increasing the breakdown voltage of said first insulating layer.
Claim 6
Dependent Claim
26 words
A metal insulating semiconductor device comprising: a substrate formed from a semiconductor material, and an insulating layer formed from an elemental pniotide material on said substrate.
Claim 7
Dependent Claim
26 words
A metal insulating semiconductor device comprising: a substrate formed from a semiconductor material, and an insulating layer formed from an elemental pniotide material on said substrate.
Claim 8
Dependent Claim
38 words
A metal insulating semiconductor device comprising: a substrate formed from a semiconductor material, and an insulating layer formed from a polypniotide on said semiconductor substrate said polypniotide being a compound formed from an alkali metal and a pniotide.
Claim 9
Dependent Claim
38 words
A metal insulating semiconductor device comprising: a substrate formed from a semiconductor material, and an insulating layer formed from a polypniotide on said semiconductor substrate said polypniotide being a compound formed from an alkali metal and a pniotide.
Claim 10
Dependent Claim
13 words
The device as claimed in claim 4 wherein said elemental pniotide is phosphorus.
Claim 11
Dependent Claim
30 words
The device as claimed in claim 5 wherein said polypniotide is MP x , where M is an alkali metal and M is in the range of 15 to infinity.
Claim 12
Dependent Claim
11 words
The device of claim 1 wherein said layer is elemental phosphorus.
Claim 13
Dependent Claim
11 words
The device of claim 2 wherein said polypniotide is a polyphosphide.
Claim 14
Dependent Claim
25 words
That which is claimed in claim 9 wherein said polyphosphide has the formula MP x , where x is equal to or greater than 15.
Claim 15
Dependent Claim
13 words
That which is claimed in claim 10 wherein x is equal to 15.
Claim 16
Dependent Claim
13 words
That which is claimed in claim 10 wherein M is an alkali metal.
Claim 17
Dependent Claim
13 words
That which is claimed in claim 12 wherein x is equal to 15.
Claim 18
Dependent Claim
14 words
That which is claimed in claim 12 wherein x very much greater than 15.
Claim 19
Dependent Claim
13 words
That which is claimed in claim 11 where M is an alkali metal.
Claim 20
Dependent Claim
14 words
That which is claimed in claim 9 wherein said polyphosphide is KP 15 .