Patent US4525429A successfully refreshed from Google Patents.
← Back to Patent Explorer
US4525429A Expired / Lapsed US ⏱️ 0.0 years remaining

Porous semiconductor dopant carriers

Assignee: Stemcor Corp
•
Filing: 1983-06-08
•
Granted: 1985-06-25
•
Expires: 2003-06-08
📄 Original PDF 🌐 Google Patents 🔄 Sync Now

Abstract

Abstract New porous semiconductor dopant carriers are disclosed together with a method for the diffusion doping of semiconductors by the vapor phase transport of an n or p type dopant, such as phosphorus, arsenic, antimony, boron, gallium, aluminum, zinc, silicon, tellurium, tin and cadmium to the semiconductor host substrate; wherein the dopant source comprises a dopant containing porous, inert, rigid dimensionally stable and thermal shock resistant carrier comprised of SiC, elemental silicon or mixtures thereof.

Inventors

  • 👤 Gregory A. Kaiser
  • 👤 Gabriel P. DeMunda
  • 👤 Richard E. Tressler

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-10-27 11:43
CPC Classifications
C; C30; C30B; C30B31/00; C30B31/06; C30B31/16; C30B31/165; H; H10; H10P; H10P10/00; H10P32/00; H10P32/10; H10P32/19; Y; Y10; Y10S; Y10S252/00; Y10S252/95; Y10S252/951; Y10T; Y10T428/00; Y10T428/12; Y10T428/12014; Y10T428/12153

Claims Analysis

Total Claims: 5
Claim 1
Independent Claim 95 words
A dopant source for the vapor phase transport of dopant at elevated temperatures in the form of a sintered carrier member having a wafer configuration comprising at least 90 percent of silicon carbide, said sintered member being a solid, porous structure having a porosity of at least about 20 percent with an average pore size in the range from about 5 microns to about 250 microns, the pores thereof being impregnated with a dopant containing an element selected from the group consisting of phosphorus, arsenic, antimony, boron, gallium, aluminum, zinc, silicon, tellurium, tin and cadmium.
Claim 2
Dependent Claim 95 words
A dopant source for the vapor phase transport of dopant at elevated temperatures in the form of a sintered carrier member having a wafer configuration comprising at least 90 percent of silicon carbide, said sintered member being a solid, porous structure having a porosity of at least about 20 percent with an average pore size in the range from about 5 microns to about 250 microns, the pores thereof being impregnated with a dopant containing an element selected from the group consisting of phosphorus, arsenic, antimony, boron, gallium, aluminum, zinc, silicon, tellurium, tin and cadmium.
Claim 3
Dependent Claim 15 words
The dopant source of claim 1 wherein said sintered carrier member also comprises elemental silicon.
Claim 4
Dependent Claim 16 words
The dopant source of claim 1 wherein said dopant is selected from phosphorus, arsenic and boron.
Claim 5
Dependent Claim 15 words
The dopant source of claim 1 wherein said dopant is MgO.As 2 O 5 .

References Cited (Backward Citations)

JPS454134Y1 Cited
US3640806A Cited
US3951587A Cited
US4028149A Cited
US4292264A Cited
US4277320A Cited
US4381233A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1988-06-24 1988-12-24 1989-06-25 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1992-06-24 1992-12-24 1993-06-25 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1996-06-24 1996-12-24 1997-06-25 $7700.00 Window Closed / Lapsed

Assigned Categories & Tags

No categories assigned to this patent yet.

Assign Category Tag