US4407713A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Cylindrical magnetron sputtering cathode and apparatus
Assignee: JACKSON TUBE SERVICE Inc
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Filing: 1981-08-06
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Granted: 1983-10-04
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Expires: 2001-08-06
Abstract
Abstract The cylindrical magnetron sputtering cathode (10) of the present invention essentially comprises a tubular target (20) having a face (20a) of material to be sputtered, and a magnet assembly (45) disposed behind the back face of said tubular target for generating magnetic fields having flux lines which form arch portions (50,51) over the sputtering face. This magnet assembly (45) more specifically consists of a plurality of equiangularly spaced axially extending radially magnetized magnets arranged in such a manner as to form over the sputtering face (20a) a plurality of equiangularly spaced axially extending straight arch portions (50) connected to each other by arcuate arch end-portions (51), whereby defining at least one closed-loop arch (52) over said sputtering face. This magnetron sputtering cathode further comprises closure means for delimitating in combination with the back face of said tubular target a cylindrical tight chamber enclosing the magnet assembly, as well as means for axially circulating a liquid coolant within said tight chamber, whereby ensuring a proper cooling of said cathode by enabling said liquid coolant to freely flow along the longitudinal spaces (49) delimitated between adjacent magnets of said assembly.
Inventors
- 👤 Bogdan Zega
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 12:51
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402; H01J37/3405
Claims Analysis
Total Claims: 13
Claim 1
Independent Claim
118 words
An improved cylindrical magnetron cathodic sputtering apparatus for coating a substrate with a material from a tubular target within an evacuated sealed enclosure, in which magnetic fields enhance the sputtering of the tubular target, said target having a sputtering face of the material to be sputtered and a back face opposed to the sputtering face, wherein the improvement comprises: a magnet assembly that is radially magnetized, disposed behind the back face of the tubular target, having a plurality of equiangularly spaced, axially extending magnets and designed to generate a magnetic flux of straight arch portions connected to arcuate end portions which combine to project at least one intense, closed-loop plasma over the sputtering face of the tubular target.
Claim 2
Dependent Claim
118 words
An improved cylindrical magnetron cathodic sputtering apparatus for coating a substrate with a material from a tubular target within an evacuated sealed enclosure, in which magnetic fields enhance the sputtering of the tubular target, said target having a sputtering face of the material to be sputtered and a back face opposed to the sputtering face, wherein the improvement comprises: a magnet assembly that is radially magnetized, disposed behind the back face of the tubular target, having a plurality of equiangularly spaced, axially extending magnets and designed to generate a magnetic flux of straight arch portions connected to arcuate end portions which combine to project at least one intense, closed-loop plasma over the sputtering face of the tubular target.
Claim 3
Dependent Claim
38 words
An improved cylindrical magnetron cathodic sputtering apparatus as in claim 1 wherein the plurality of magnets is arranged to form a single closed-loop intense plasma extending in a meandering manner over the sputtering face of the sputtering target.
Claim 4
Dependent Claim
33 words
An improved cylindrical magnetron cathodic sputtering apparatus as in claim 2 wherein the sputtering face of the tubular target is its outer face, and the magnet assembly is inserted inside the tubular target.
Claim 5
Dependent Claim
38 words
An improved cylindrical magnetron cathodic sputtering apparatus as in claim 2 wherein the sputtering face of the tubular target is its inner face and the magnet assembly is circumferentially arranged around the outer face of the tubular target.
Claim 6
Dependent Claim
36 words
An improved cylindrical magnetron cathodic sputtering apparatus as in claim 2 further comprising means for axially rotating the magnet assembly relative to the tubular target and relative to the substrate according to a to-and-fro rotatory movement.
Claim 7
Dependent Claim
35 words
An improved cylindrical magnetron cathodic sputtering apparatus as in claim 2 further comprising means for a unidirectional rotatory movement causing full revolutions of the magnet assembly relative to the tubular target and to the substrate.
Claim 8
Dependent Claim
123 words
A cylindrical magnetron sputtering cathode comprising: A. a tubular target having a sputtering face of a material to be sputtered and a back face opposed to the sputtering face; B. a magnet assembly that is radially magnetized, disposed behind the back face of the tubular target and having a plurality of equiangularly spaced axially extending magnets with longitudinal spaces between adjacent magnets, wherein the magnet assembly is designed to generate a magnetic flux of straight arch portions connected to arcuate end-portions which combine to project at least one intense, closed-loop plasma over the sputtering face of the tubular target; and C. means for continuously cooling the target with a liquid coolant that is freely circulated along the longitudinal spaces between the adjacent magnets.
Claim 9
Dependent Claim
123 words
A cylindrical magnetron sputtering cathode comprising: A. a tubular target having a sputtering face of a material to be sputtered and a back face opposed to the sputtering face; B. a magnet assembly that is radially magnetized, disposed behind the back face of the tubular target and having a plurality of equiangularly spaced axially extending magnets with longitudinal spaces between adjacent magnets, wherein the magnet assembly is designed to generate a magnetic flux of straight arch portions connected to arcuate end-portions which combine to project at least one intense, closed-loop plasma over the sputtering face of the tubular target; and C. means for continuously cooling the target with a liquid coolant that is freely circulated along the longitudinal spaces between the adjacent magnets.
Claim 10
Dependent Claim
31 words
Cylindrical magnetron sputtering cathode as in claim 7 wherein the plurality of magnets is arranged to form a single closed-loop intense plasma meandering over the sputtering face of the tubular target.
Claim 11
Dependent Claim
30 words
Cylindrical magnetron sputtering cathode as in claim 8 wherein the sputtering face of the tubular target is its outer face, and the magnet assembly is inserted inside the tubular target.
Claim 12
Dependent Claim
35 words
Cylindrical magnetron sputtering cathode as in claim 8 wherein the sputtering face of the tubular target is its inner face, and the magnet assembly is circumferentially arranged around the outer face of the tubular target.
Claim 13
Dependent Claim
22 words
Cylindrical magnetron sputtering cathode as in claim 8 further comprising means for axially rotating the magnet assembly with respect to the target.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1986-10-03 | 1987-04-04 | 1987-10-04 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1990-10-03 | 1991-04-04 | 1991-10-04 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1994-10-03 | 1995-04-04 | 1995-10-04 | $7700.00 | Window Closed / Lapsed |