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US4365588A Expired / Lapsed US ⏱️ 0.0 years remaining

Fixture for VPE reactor

Assignee: RCA Corp
•
Filing: 1981-03-13
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Granted: 1982-12-28
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Expires: 2001-03-13
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Abstract

Abstract A fixture for use within an epitaxial deposition reactor includes a box adapted to receive a semiconductor substrate. The box is movable to a position of reactant gas flow within the reactor and it includes a porous cover. A stagnant mixture of reactant gases is maintained between the substrate and the cover while the box is within the zone of reactant gas flow.

Inventors

  • 👤 Stuart T. Jolly

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-06 02:01
CPC Classifications
C; C23; C23C; C23C16/00; C23C16/44; C23C16/458; C23C16/4582; C23C16/4583; C30; C30B; C30B25/00; C30B25/02; C30B25/14

Claims Analysis

Total Claims: 9
Claim 1
Independent Claim 76 words
A fixture for use within an epitaxial deposition reactor, comprising: a box adapted to receive a semiconductor substrate, the box being movable to a position of turbulent reactant gas flow within the reactor; and a porous cover for said box, said cover permitting reactant gas to diffuse therethrough, such that a stagnant mixture of reactant gas is maintained between the substrate and the cover while the box is within the zone of turbulent reactant gas flow.
Claim 2
Dependent Claim 76 words
A fixture for use within an epitaxial deposition reactor, comprising: a box adapted to receive a semiconductor substrate, the box being movable to a position of turbulent reactant gas flow within the reactor; and a porous cover for said box, said cover permitting reactant gas to diffuse therethrough, such that a stagnant mixture of reactant gas is maintained between the substrate and the cover while the box is within the zone of turbulent reactant gas flow.
Claim 3
Dependent Claim 15 words
A fixture in accordance with claim 1, wherein the cover is sintered quartz filter plate.
Claim 4
Dependent Claim 21 words
A fixture in accordance with claim 1, wherein the spacing between the cover and the substrate ranges approximately between 0.005-0.20 inches.
Claim 5
Dependent Claim 15 words
A fixture in accordance with claim 1, wherein the box is attached to a rod.
Claim 6
Dependent Claim 74 words
An epitaxial deposition system, comprising: a reactor having a deposition zone of turbulent reactant gas flow; a box adapted to receive a semiconductor substrate, the box being movable to a position within the deposition zone; and a porous cover for said box, said cover permitting reactant gas to diffuse therethrough, such that a stagnant mixture of reactant gas is maintained between the substrate and the cover while the box is within the deposition zone.
Claim 7
Dependent Claim 74 words
An epitaxial deposition system, comprising: a reactor having a deposition zone of turbulent reactant gas flow; a box adapted to receive a semiconductor substrate, the box being movable to a position within the deposition zone; and a porous cover for said box, said cover permitting reactant gas to diffuse therethrough, such that a stagnant mixture of reactant gas is maintained between the substrate and the cover while the box is within the deposition zone.
Claim 8
Dependent Claim 15 words
A system in accordance with claim 5, wherein: the deposition zone contains flowing reactant gas.
Claim 9
Dependent Claim 12 words
A system in accordance with claim 5, wherein the reactor is tube-shaped.

References Cited (Backward Citations)

US3316130A Cited
US3394390A Cited
US3617371A Cited
US3603284A Cited
US3901746A Cited
US3701682A Cited
US4129090A Cited
US4256053A Cited

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1985-12-27 1986-06-28 1986-12-28 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1989-12-27 1990-06-28 1990-12-28 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1993-12-27 1994-06-28 1994-12-28 $7700.00 Window Closed / Lapsed

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