Patent US4339522A successfully refreshed from Google Patents.
US4339522A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Ultra-violet lithographic resist composition and process
Assignee: International Business Machines Corp
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Filing: 1980-10-24
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Granted: 1982-07-13
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Expires: 2000-10-24
Abstract
Abstract Phenolic-aldehyde resins sensitized with Meldrum's diazo or a homologue thereof are useful as lithographic resists sensitive to deep ultra-violet light.
Inventors
- 👤 Richard D. Balanson
- 👤 Nicholas J. Clecak
- 👤 Barbara D. Grant
- 👤 Augustus C. Ouano
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-31 09:12
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/016; G03F7/0163
Claims Analysis
Total Claims: 8
Claim 1
Independent Claim
89 words
A lithographic resist composition for use with ultraviolet light of less than 3,000 A wavelength, said composition comprising a phenolic-aldehyde resin and in admixture therewith as a deep ultra-violet sensitizer, a sufficient quantity of compound having the formula ##STR3## wherein R 1 is alkyl or aryl having up to 20 carbon atoms, R 2 is H, alkyl or aryl having up to 20 carbon atoms, or together R 1 and R 2 are cycloalkyl whereby upon exposure to deep ultra-violet radiation, the composition becomes more soluble in alkaline developer.
Claim 2
Dependent Claim
89 words
A lithographic resist composition for use with ultraviolet light of less than 3,000 A wavelength, said composition comprising a phenolic-aldehyde resin and in admixture therewith as a deep ultra-violet sensitizer, a sufficient quantity of compound having the formula ##STR3## wherein R 1 is alkyl or aryl having up to 20 carbon atoms, R 2 is H, alkyl or aryl having up to 20 carbon atoms, or together R 1 and R 2 are cycloalkyl whereby upon exposure to deep ultra-violet radiation, the composition becomes more soluble in alkaline developer.
Claim 3
Dependent Claim
27 words
A composition as claimed in claim 1 wherein the sensitizer is present in an amount of from about 5 to about 50% by weight of the resin.
Claim 4
Dependent Claim
14 words
A composition as claimed in claim 1 wherein the resin is a cresol-formaldehyde resin.
Claim 5
Dependent Claim
87 words
A process for forming a lithographic resist image comprising image-wise exposing to ultra-violet light of less than 3000 A wavelength a film cast on a substrate and comprising a phenolic-aldehyde resin and in admixture therewith a sensitizer having the formula ##STR4## wherein R 1 is alkyl or aryl having up to 20 carbon atoms, R 2 is H, alkyl or aryl having up to 20 carbon atoms, or together R 1 and R 2 are cycloalkyl, and dissolving the exposed portion of said film with aqueous alkali.
Claim 6
Dependent Claim
87 words
A process for forming a lithographic resist image comprising image-wise exposing to ultra-violet light of less than 3000 A wavelength a film cast on a substrate and comprising a phenolic-aldehyde resin and in admixture therewith a sensitizer having the formula ##STR4## wherein R 1 is alkyl or aryl having up to 20 carbon atoms, R 2 is H, alkyl or aryl having up to 20 carbon atoms, or together R 1 and R 2 are cycloalkyl, and dissolving the exposed portion of said film with aqueous alkali.
Claim 7
Dependent Claim
12 words
A process as claimed in claim 4 wherein the resin is cresol-formaldehyde.
Claim 8
Dependent Claim
27 words
A process as claimed in claim 4 wherein the sensitizer is present in an amount of from about 5 to about 50% by weight of the resin.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-07-12 | 1986-01-11 | 1986-07-13 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-07-12 | 1990-01-11 | 1990-07-13 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-07-12 | 1994-01-11 | 1994-07-13 | $7700.00 | Window Closed / Lapsed |