Patent US4336277A successfully refreshed from Google Patents.
US4336277A
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Transparent electrical conducting films by activated reactive evaporation
Assignee: University of California
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Filing: 1980-09-29
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Granted: 1982-06-22
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Expires: 2000-09-29
Abstract
Abstract Process and apparatus for producing transparent electrical conducting thin films by activated reactive evaporation. Thin films of low melting point metals and alloys, such as indium oxide and indium oxide doped with tin, are produced by physical vapor deposition. The metal or alloy is vaporized by electrical resistance heating in a vacuum chamber, oxygen and an inert gas such as argon are introduced into the chamber, and vapor and gas are ionized by a beam of low energy electrons in a reaction zone between the resistance heater and the substrate. There is a reaction between the ionized oxygen and the metal vapor resulting in the metal oxide which deposits on the substrate as a thin film which is ready for use without requiring post deposition heat treatment.
Inventors
- 👤 Rointan Bunshah
- 👤 Prem Nath
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 15:10
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/0021; C03; C03C; C03C17/00; C03C17/22; C03C17/23; C03C17/245; C23C14/22; C23C14/24; C23C14/32; H; H10; H10F; H10F71/00; H10F71/138; C03C2217/00; C03C2217/20; C03C2217/21; C03C2217/215; C03C2217/23; C03C2217/231; C03C2218/00; C03C2218/10; C03C2218/15; C03C2218/152; Y; Y02; Y02E; Y02E10/00; Y02E10/50
Claims Analysis
Total Claims: 23
Claim 1
Independent Claim
211 words
In a process for depositing a transparent electrical conducting film on a substrate by activated reactive evaporation, the steps of: supporting the substrate in a vacuum; evaporating a low melting point metal or alloy by resistive heating of the solid material producing a metal vapor in a zone between the resistance heat source and the substrate, with the substrate above the resistance heat source so that the metal vapor moves upward from the heat source toward the substrate; introducing oxygen gas into the zone; extracting low energy electrons from a heated cathode by a dc electric field directed across the path of the metal vapor in the zone between the resistance heat source and the substrate, which electric field is produced by applying an electrical potential between cathode and anode of about 20 to about 200 volts; directing a beam of the low energy electrons laterally through the zone for colliding with the gas and metal atoms producing gas and metal ions and energetic neutral atoms which react with each other and with neutral metal and gas atoms in the zone resulting in a metal oxide deposit on the substrate; and providing a magnetic field along the beam of electrons so that electrons travel in a helical path in the zone.
Claim 2
Dependent Claim
211 words
In a process for depositing a transparent electrical conducting film on a substrate by activated reactive evaporation, the steps of: supporting the substrate in a vacuum; evaporating a low melting point metal or alloy by resistive heating of the solid material producing a metal vapor in a zone between the resistance heat source and the substrate, with the substrate above the resistance heat source so that the metal vapor moves upward from the heat source toward the substrate; introducing oxygen gas into the zone; extracting low energy electrons from a heated cathode by a dc electric field directed across the path of the metal vapor in the zone between the resistance heat source and the substrate, which electric field is produced by applying an electrical potential between cathode and anode of about 20 to about 200 volts; directing a beam of the low energy electrons laterally through the zone for colliding with the gas and metal atoms producing gas and metal ions and energetic neutral atoms which react with each other and with neutral metal and gas atoms in the zone resulting in a metal oxide deposit on the substrate; and providing a magnetic field along the beam of electrons so that electrons travel in a helical path in the zone.
Claim 3
Dependent Claim
34 words
The process as defined in claim 1 including directing the beam of electrons from a heated cathode to an anode separate from the substrate, with an electrical potential connected across the anode and cathode.
Claim 4
Dependent Claim
15 words
The process as defined in claim 2 including introducing an inert gas into the zone.
Claim 5
Dependent Claim
13 words
The process as defined in claim 3 wherein said inert gas is argon.
Claim 6
Dependent Claim
26 words
The process as defined in claim 4 including heating the substrate to a predetermined temperature to control the electrical and optical properties of the deposited film.
Claim 7
Dependent Claim
24 words
The process as defined in claim 5 wherein the low melting point metal or alloy has a melting point less than about 450° C.
Claim 8
Dependent Claim
24 words
The process as defined in claim 5 wherein the metal or alloy is selected from the group consisting of indium, tin, and mixtures thereof.
Claim 9
Dependent Claim
30 words
The process as defined in claim 7 including producing producing the low energy electrons by applying an electrical potential across the anode and cathode in the order of 100 volts.
Claim 10
Dependent Claim
16 words
The process as defined in claim 1 including introducing an inert gas with the oxygen gas.
Claim 11
Dependent Claim
15 words
The process as defined in claim 1 including introducing argon gas with the oxygen gas.
Claim 12
Dependent Claim
30 words
The process as defined in claim 1 including introducing the low energy electrons by applying an electrical potential across a cathode and anode of about 20 to about 200 volts.
Claim 13
Dependent Claim
24 words
The process as defined in claim 1 wherein the metal or alloy is selected from the group consisting of indium, tin, and mixtures thereof.
Claim 14
Dependent Claim
25 words
The process as defined in claim 1 wherein the low melting point metal or alloy has a melting point of less than about 450° C.
Claim 15
Dependent Claim
11 words
The process as defined in claim 1 including heating the substrate.
Claim 16
Dependent Claim
134 words
In an apparatus for producing transparent electrical conducting thin films by activated reactive evaporation, the combination of: a vacuum chamber; an electrical resistance heater mounted in said chamber; means for connecting an electrical power supply to said heater; a substrate holder mounted in said chamber spaced upward from said heater with a reaction zone therebetween and defining a first metal vapor path from said heater upward to said holder through said zone; means for directing a gas into said zone; a source of a beam of low energy electrons mounted in said chamber for directing an electron beam into said zone along a second electron path transverse to said first path; and magnetic means for providing a magnetic field along said second path to cause said low energy electrons to travel in helical paths.
Claim 17
Dependent Claim
134 words
In an apparatus for producing transparent electrical conducting thin films by activated reactive evaporation, the combination of: a vacuum chamber; an electrical resistance heater mounted in said chamber; means for connecting an electrical power supply to said heater; a substrate holder mounted in said chamber spaced upward from said heater with a reaction zone therebetween and defining a first metal vapor path from said heater upward to said holder through said zone; means for directing a gas into said zone; a source of a beam of low energy electrons mounted in said chamber for directing an electron beam into said zone along a second electron path transverse to said first path; and magnetic means for providing a magnetic field along said second path to cause said low energy electrons to travel in helical paths.
Claim 18
Dependent Claim
32 words
An apparatus as defined in claim 15 wherein said source of low energy electrons includes a cathode and an anode positioned on opposite sides of said zone separate from said substrate holder.
Claim 19
Dependent Claim
29 words
An apparatus as defined in claim 16 including an electrical power supply providing voltage across said anode and cathode in the range of about 20 to about 200 volts.
Claim 20
Dependent Claim
25 words
An apparatus as defined in claim 16 including an electrical power supply providing voltage across said anode and cathode in the order of 100 volts.
Claim 21
Dependent Claim
32 words
An apparatus as defined in claim 16 including means for directing a first gas and second gas into said zone and means for controlling the ratio of said first and second gases.
Claim 22
Dependent Claim
40 words
An apparatus as defined in claim 15 wherein said magnetic means includes first and second coils spaced from each other along the path from said cathode to said anode, and means for connecting an electrical power source to said coils.
Claim 23
Dependent Claim
32 words
An apparatus as defined in claim 15 including means for heating substrates mounted on said substrate holder to a predetermined temperature to control the electrical and optical properties of the deposited films.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1985-06-21 | 1985-12-21 | 1986-06-22 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1989-06-21 | 1989-12-21 | 1990-06-22 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1993-06-21 | 1993-12-21 | 1994-06-22 | $7700.00 | Window Closed / Lapsed |