US3791852A
Expired / Lapsed
US
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High rate deposition of carbides by activated reactive evaporation
Assignee: University of California
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Filing: 1972-06-16
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Granted: 1974-02-12
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Expires: 1992-06-16
Abstract
Abstract Process and apparatus for the production of carbide films at high rates by physical vapor deposition. The metal is evaporated in a vacuum chamber by an electron beam, the hydrocarbon gas is introduced into the chamber, and the metal vapor atoms and gas atoms are activated by electrons deflected from the electron beam to the reaction zone by a low voltage electrode at the reaction zone. The reaction takes place primarily in the vapor phase in the reaction zone, rather than on the substrate. A high reaction efficiency is obtained with the activated atoms and a deposition rate in the range of 1 to 12 micrometers per minute and higher is achieved.
Inventors
- 👤 R Bunshah
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 14:29
CPC Classifications
C; C23; C23C; C23C14/00; C23C14/06; C23C14/0635
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
24 words
The process as defined in claim 1 including generating the low voltage electric field with a potential of not more than about 200 volts.
Claim 2
Dependent Claim
18 words
The process as defined in claim 1 including generating the low voltage electric field with a D.C. potential.
Claim 3
Dependent Claim
18 words
The process as defined in claim 1 including generating the low voltage electric field with an A.C. potential.
Claim 4
Dependent Claim
21 words
The process as defined in claim 1 wherein said hydrocarbon gas is selected from the grop consisting of acetylene and ethylene.
Claim 5
Dependent Claim
27 words
The process as defined in claim 1 wherein said metal is selected from the group consisting of titanium, zirconium, hafnium, vanadium, niobium and tantalum and combinations thereof.
Claim 6
Dependent Claim
18 words
The process as defined in claim 1 wherein said hydrocarbon gas is acetylene and said metal is titanium.
Claim 7
Dependent Claim
22 words
ThE process as defined in claim 1 wherein the partial pressure of the gas atoms is at least about 10 4 torr.
Claim 8
Dependent Claim
27 words
The process as defined in claim 1 wherein the rate of deposition of the carbide film on the substrate is at least about 1 micrometer per minute.
Claim 9
Dependent Claim
29 words
The process as defined in claim 1 including the step of heating the substrate to a predetermined temperature to produce a predetermined density of the deposit on the substrate.
Claim 10
Dependent Claim
31 words
The process as defined in claim 1 including the step of controlling the relative amounts of metal vapor and gas in the zone to produce a metal-carbon compound of predetermined stoichiometry.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1977-02-11 | 1977-08-13 | 1978-02-12 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1981-02-11 | 1981-08-13 | 1982-02-12 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1985-02-11 | 1985-08-13 | 1986-02-12 | $7700.00 | Window Closed / Lapsed |