Abstract A resist utilized to prepare semiconductor elements or the like comprises a copolymer of, for example, 2,3 dibromo-n-propyl methacrylate and methylmethacrylate. The resist is applied onto a substrate to form a copolymer resist layer, the copolymer resist layer is irradiated with ionizing radiations, the irradiated portions of the copolymer resist layer are dissolved to form a positive pattern, the positive pattern is heated in inert atmosphere to cause crosslinking reaction of reactive radicals remaining in the copolymer resist, and then the assembly is etched with a liquid etchant to form an etched pattern on the substrate. Alternatively, the positive pattern and the underlying substrate are treated with plasma or ions to cause a crosslinking reaction of reactive radicals remaining in the copolymer resist to simultaneously etch portions of the substrate not covered by the positive pattern.
A method of forming a fine pattern on a substrate comprising the steps of preparing a resist consisting essentially of a copolymer of 10-90 mole % of a first monomer of the formula ##STR6## where R 1 represents an alkyl group of 1-3 carbon atoms containing at least one member selected from the group consisting of bromine, chlorine and an epoxide radical, and 90-10 mole % of a second monomer of the formula ##STR7## where R 2 represents an alkyl radical; applying said copolymer resist onto a substrate to form a copolymer resist layer; irradiating said copolymer resist layer with ionizing radiations; dissolving irradiated portions of said copolymer resist layer to form a positive pattern; heating the resulting assembly in an inert atmosphere at a temperature of about 180° C. for about 20 to 30 minutes to cause a crosslinking reaction of reactive radicals remaining in said copolymer resist; and etching the heated assembly with a liquid etchant to form an etched pattern on said substrate.
Claim 2
Independent Claim
166 words
A method of forming a fine pattern on a substrate comprising the steps of preparing a resist consisting essentially of a copolymer of 10-90 mole % of a first monomer of the formula ##STR6## where R 1 represents an alkyl group of 1-3 carbon atoms containing at least one member selected from the group consisting of bromine, chlorine and an epoxide radical, and 90-10 mole % of a second monomer of the formula ##STR7## where R 2 represents an alkyl radical; applying said copolymer resist onto a substrate to form a copolymer resist layer; irradiating said copolymer resist layer with ionizing radiations; dissolving irradiated portions of said copolymer resist layer to form a positive pattern; heating the resulting assembly in an inert atmosphere at a temperature of about 180° C. for about 20 to 30 minutes to cause a crosslinking reaction of reactive radicals remaining in said copolymer resist; and etching the heated assembly with a liquid etchant to form an etched pattern on said substrate.
Claim 3
Dependent Claim
19 words
The method according to claim 1 wherein said heating is at a temperature of 180° C. for 30 minutes.
Claim 4
Dependent Claim
26 words
The method according to claim 1 wherein said ionizing radiations are far ultraviolet rays emitted by a deuterium lamp, a xenon lamp or a mercury lamp.
Claim 5
Dependent Claim
32 words
The method according to claim 1 wherein said substrate comprises a polycrystalline silicon film, a silicon oxide film, a silicon nitride film, a phosphosilicate film, an aluminium film or a chromium film.