US3916036A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Sensitized decomposition of polysulfone resists
Assignee: International Business Machines Corp
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Filing: 1974-09-26
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Granted: 1975-10-28
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Expires: 1994-09-26
Abstract
Abstract Polysulfone resists are made more sensitive to decomposition by electron beam radiation and also made sensitive to radiation of light in the 3,000 to 5,000 A region by the addition of sensitizers which are either energy transfer agents or sources of free radicals.
Inventors
- 👤 Edward Gipstein
- 👤 Wayne M Moreau
- 👤 Iii Omar U Need
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-26 05:31
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/004; G03F7/039; Y; Y10; Y10S; Y10S430/00; Y10S430/1053; Y10S430/1055; Y10S430/114; Y10S430/126; Y10S430/143
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
18 words
A PROCESS FOR FORMING AN IMAGE WITH A HIGH RESOLUTION RADITION SENSITIVE POSITIVE RESIST COMPRISING THE STEPS OF:
Claim 2
Dependent Claim
18 words
A PROCESS FOR FORMING AN IMAGE WITH A HIGH RESOLUTION RADITION SENSITIVE POSITIVE RESIST COMPRISING THE STEPS OF:
Claim 3
Dependent Claim
25 words
FORMING ON A SUBSTRATE A FILM COMPRISING A POLYSULFONE SENSITIZED BY THE ADDITION OF A CHARGE TRANSFER AGENT OR A CHEMICAL SOURCE OF FREE RADICALS,
Claim 4
Dependent Claim
25 words
FORMING ON A SUBSTRATE A FILM COMPRISING A POLYSULFONE SENSITIZED BY THE ADDITION OF A CHARGE TRANSFER AGENT OR A CHEMICAL SOURCE OF FREE RADICALS,
Claim 5
Dependent Claim
10 words
EXPOSING SAID FILM IN A PREDETERMED PATTERN UNER RADIATION, AND
Claim 6
Dependent Claim
10 words
EXPOSING SAID FILM IN A PREDETERMED PATTERN UNER RADIATION, AND
Claim 7
Dependent Claim
24 words
A process as claimed in claim 1 wherein the radiation is low energy electron beam radiation of from about 10 to about 30 KeV.
Claim 8
Dependent Claim
10 words
exposing said film in a predetermined pattern under radiation, and
Claim 9
Dependent Claim
10 words
exposing said film in a predetermined pattern under radiation, and
Claim 10
Dependent Claim
12 words
REMOVING THE RADIATION EXPOSED OF PORTION OF SAID FILM WITH A SOLVENT.
Claim 11
Dependent Claim
12 words
REMOVING THE RADIATION EXPOSED OF PORTION OF SAID FILM WITH A SOLVENT.
Claim 12
Dependent Claim
11 words
removing the radiation exposed portion of said film with a solvent.
Claim 13
Dependent Claim
11 words
removing the radiation exposed portion of said film with a solvent.
Claim 14
Dependent Claim
21 words
A process as claimed in claim 1 wherein the radiation is light having several lengths of from 3,000 to 5,000 A.
Claim 15
Dependent Claim
27 words
A process as claimed in claim 1 wherein the energy transfer agent is a material selected from the group consisting of azulene, 2,4,7-trinitrofluorenone, fluorene, diphenylamine and p-nitroaniline.
Claim 16
Dependent Claim
35 words
A process as claimed in claim 1 wherein the free radical source is a material selected from the group consisting of carbon tetrachloride, carbon tetrabromide, carbon tetraiodide, phenyl disulfide, azobenzene and poly ( Alpha -chloromethylacrylate).
References Cited (Backward Citations)
US3661582A
Cited
US3820993A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1978-10-27 | 1979-04-28 | 1979-10-28 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1982-10-27 | 1983-04-28 | 1983-10-28 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1986-10-27 | 1987-04-28 | 1987-10-28 | $7700.00 | Window Closed / Lapsed |