Light sensitive reproduction and electron beam sensitive material

Abstract

Abstract Light sensitive reproduction and electron beam sensitive material useful in preparing positive and/or negative copies, planographic and deep etched lithographic plates, deep etched printing plates, thin and thick film printed circuits, circuits for microelectronics, and chemical milling of metals, plastics and glass, is formed by coating a suitable support with a composition which includes (1) a hydroxy alkyl cellulose; (2) an ethenically unsaturated vinyl monomer including N-vinyl monomers; (3) at least one compound which produces free-radicals on exposure to light; (4) color formers taken from the general class of intermediates which produce color on exposure to condensation agents, oxidizing agents, and/or acids; (5) organic sulphur compounds for the promotion of adhesion; and (6) agents for improving the shelf stability of the product either in dissolved form or in the form of a solvent-free layer on a suitable surface taken from the class of cresols, phenols and triaryl compounds of the A sub group of metals taken from the 5th column of the Periodic Table. The composition may or may not contain other compounds which promote polymerization and/or crosslinking on exposure to light. The composition is dry working and is placed into solution for coating purposes only in organic solvents. After exposure and suitable development, the non-image areas may be removed by washing in water which has no effect on the areas which are exposed to light or electron beams. The exposed areas are colored and are hydrophobic in nature, readily accepting ink so as to make the end result suitable for lithographic and printing purposes. The composition has the further feature that while the non-image areas are soluble in cold water the image areas after exposure, development and washing in cold water may be removed readily for circuit purposes by washing in hot deionized water or in certain cases by a mixture of water and acetone. The composition is characterized by exceptionally high resolution, and though originally sensitive primarily to the ultraviolet and to electron beams can be sensitized to the visible through the panchromatic range by the addition of suitable color sensitizers. Certain aspects of the composition may be operated positively or negatively. The composition is further characterized that under suitable conditions it will print-out in any one of a variety of prechosen colors, if desired. The composition may be utilized for imaging and/or resist purposes as desired.

Inventors

• 👤 J Lewis
• 👤 E Wainer

Bibliographic Details