Patent US4187331A successfully refreshed from Google Patents.
US4187331A
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Fluorine plasma resist image hardening
Assignee: International Business Machines Corp
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Filing: 1978-08-24
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Granted: 1980-02-05
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Expires: 1998-08-24
Abstract
Abstract An organic polymer resist image layer, formed on a substrate, is stabilized by placing the substrate with the resist image layer in an electrodeless glow discharge in a low pressure fluorine containing atmosphere, for example, CF 4 , so as to harden the exposed surface of the layer and then heating the layer.
Inventors
- 👤 William Hsioh-Lien Ma
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 15:20
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/26; G03F7/40
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
48 words
A process for stabilizing an organic polymer resist image layer formed on a substrate comprising placing the image layer bearing substrate in an electrodeless glow discharge in a low pressure fluorine containing atmosphere so as to harden the exposed surface of said layer and then heating said layer.
Claim 2
Dependent Claim
48 words
A process for stabilizing an organic polymer resist image layer formed on a substrate comprising placing the image layer bearing substrate in an electrodeless glow discharge in a low pressure fluorine containing atmosphere so as to harden the exposed surface of said layer and then heating said layer.
Claim 3
Dependent Claim
18 words
The process of claim 1 wherein the heating is at a temperature of at least about 210° C.
Claim 4
Dependent Claim
19 words
The process of claim 1 wherein the heating is at a temperature of from about 210° to 330° C.
Claim 5
Dependent Claim
37 words
The process of claim 1 wherein the fluorine containing atmosphere is formed from a compound selected from the group consisting of a fluorine substituted organic compound having from 1 to 3 carbon atoms and SF 6 .
Claim 6
Dependent Claim
26 words
The process of claim 1 wherein the image layer bearing substrate is subjected to the glow discharge for from about 15 seconds to about 15 minutes.
Claim 7
Dependent Claim
15 words
The process of claim 5 wherein the time is from about 15 to 30 seconds.
Claim 8
Dependent Claim
26 words
The process of claim 5 wherein the time is at least about 2 minutes so as to provide a rounded resist profile upon heating said layer.
Claim 9
Dependent Claim
25 words
The process of claim 1 wherein the pressure ranges from about 0.1 to 1.5 torr and the power ranges from about 25 to 500 watts.
Claim 10
Dependent Claim
25 words
The process of claim 1 wherein the resist image layer has a lift-off profile having an overhanging lip at the top of the resist layer.
Claim 11
Dependent Claim
38 words
The process of claim 1 wherein the fluorine containing atmosphere includes CF 4 the pressure is about 0.5 torr and the power is about 25 watts and the treatment time is from about 15 seconds to 2 minutes.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1983-02-04 | 1983-08-06 | 1984-02-05 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1987-02-04 | 1987-08-06 | 1988-02-05 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1991-02-04 | 1991-08-06 | 1992-02-05 | $7700.00 | Window Closed / Lapsed |