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US4133925A Expired / Lapsed US ⏱️ 0.0 years remaining

Planar silicon-on-sapphire composite

Assignee: RCA Corp
•
Filing: 1978-01-06
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Granted: 1979-01-09
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Expires: 1998-01-06
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Abstract

Abstract A semi-planar silicon-on-sapphire composite comprises a sapphire substrate, an epitaxial monocrystalline silicon mesa formed adjacent the substrate and an epitaxial deposition of monocrystalline aluminum oxide surrounding the mesa.

Inventors

  • 👤 Joseph M. Shaw
  • 👤 Karl H. Zaininger

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-01 22:44
CPC Classifications
H; H10; H10P; H10P14/00; H10P14/60; H10P14/69; H10P14/692; H10P14/6938; H10P14/6939; H10P14/69391; H10D; H10D86/00; H10D86/01; H10D86/03; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6334; H10P14/6349; H10P50/00; H10P50/20; H10P50/28; H10P50/282; H10P50/283; H10P90/00; H10P90/19; H10P90/1904; H10P90/1906; H10W; H10W10/00; H10W10/01; H10W10/061; H10W10/10; H10W10/181; H10W10/011; H10W10/014; H10W10/17; Y; Y10; Y10S; Y10S117/00; Y10S117/906; Y10S148/00; Y10S148/085; Y10S148/118; Y10S148/15; Y10S438/00; Y10S438/969; Y10T; Y10T428/00; Y10T428/24; Y10T428/24802

Claims Analysis

Total Claims: 6
Claim 1
Independent Claim 76 words
A composite comprising an epitaxially grown silicon island having at least one sidewall transverse to a major surface of said island, a monocrystalline aluminum oxide substrate supporting said island, and a layer of monocrystalline aluminum oxide adjacent to said substrate, said layer having a surface substantially coplanar with said major surface of said island, said layer surrounding said island in contiguous contact with said sidewall, whereby an interface between the island and the substrate is covered.
Claim 2
Dependent Claim 76 words
A composite comprising an epitaxially grown silicon island having at least one sidewall transverse to a major surface of said island, a monocrystalline aluminum oxide substrate supporting said island, and a layer of monocrystalline aluminum oxide adjacent to said substrate, said layer having a surface substantially coplanar with said major surface of said island, said layer surrounding said island in contiguous contact with said sidewall, whereby an interface between the island and the substrate is covered.
Claim 3
Dependent Claim 20 words
A composite as defined in claim 1 wherein said layer of monocrystalline aluminum oxide is epitaxially related to said substrate.
Claim 4
Dependent Claim 100 words
An improved semiconductor structure of a silicon mesa having a top surface and a steep side wall transverse thereto deposited on a major surface of a sapphire substrate, the improvement comprising: a layer of monocrystalline aluminum oxide deposited on the major surface of the substrate; the layer having a surface substantially co-planar with the top surface of the mesa; the layer surrounding the mesa and in contiguous contact with the side wall thereof; and the layer having been pyrohydrolytically formed by the reaction of aluminum trichloride, carbon dioxide and hydrogen at a temperature ranging between 857° C. and 990° C.
Claim 5
Dependent Claim 100 words
An improved semiconductor structure of a silicon mesa having a top surface and a steep side wall transverse thereto deposited on a major surface of a sapphire substrate, the improvement comprising: a layer of monocrystalline aluminum oxide deposited on the major surface of the substrate; the layer having a surface substantially co-planar with the top surface of the mesa; the layer surrounding the mesa and in contiguous contact with the side wall thereof; and the layer having been pyrohydrolytically formed by the reaction of aluminum trichloride, carbon dioxide and hydrogen at a temperature ranging between 857° C. and 990° C.
Claim 6
Dependent Claim 19 words
The improved structure of claim 3 wherein: the layer of monocrystalline aluminum oxide is epitaxially related to the substrate.

References Cited (Backward Citations)

US3425879A Cited
US3661676A Cited
US3764413A Cited
US3728153A Cited
US3740280A Cited
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USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 1982-01-08 1982-07-10 1983-01-09 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 1986-01-08 1986-07-10 1987-01-09 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 1990-01-08 1990-07-10 1991-01-09 $7700.00 Window Closed / Lapsed

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