Vapor phase growth technique of III-V compounds utilizing a preheating step

Claim 1

In the method of fabricating a III-V semiconductor device wherein a semiconductor layer is vapor phase deposited onto a deposition body having a deposition surface and the deposition body is preheated prior to deposition, the improvement wherein the preheating step comprises: preheating said deposition body to a temperature about 40° to 60° C. lower than the temperature of deposition for a predetermined period of time prior to raising the temperature of the body to the temperature of deposition.

Claim 5

A method for making a III-V semiconductor device having an active layer of GaAs l-x P x , wherein x is between about 0.1 and 0.4, a first and a second confining layer contiguous to said active layer and opposite each other, said first and second confining layers composed of In y Ga l-y P, wherein y is between about 0.25 and 0.5, a substrate of gallium arsenide phosphide contiguous to the second confining layer, and opposite the first confining layer layer, and an electrode on the first confining layer opposite the active layer said electrode composed of gallium arsenide phosphide comprising the steps of: (a) preheating said substrate to a temperature between about 640° C. and 660° C. in an atmosphere of arsine and phosphine, (b) depositing said first confining layer on said substrate by vapor deposition at about 700° C., (c) preheating the substrate from Step (b) to between about 640° C. and 660° C. in an atmosphere of phosphine, (d) depositing the active layer on said first confining layer from Step (b) by vapor deposition at about 700° C., (e) preheating the substrate from Step (d) to a temperature between about 640° C. and 660° C. in an atmosphere of arsine and phosphine, (f) depositing on said active layer from Step (d) the second confining layer by vapor deposition at about 700° C., (g) preheating the substrate from Step (f) to a temperature between about 640° C. in an atmosphere of phosphine, (h) depositing on said second confining layer from Step (f) the electrode layer by vapor deposition at about 700° C.

Claim 6

A method for making a III-V semiconductor device having an active layer of GaAs l-x P x , wherein x is between about 0.1 and 0.4, a first and a second confining layer contiguous to said active layer and opposite each other, said first and second confining layers composed of In y Ga l-y P, wherein y is between about 0.25 and 0.5, a substrate of gallium arsenide phosphide contiguous to the second confining layer, and opposite the first confining layer layer, and an electrode on the first confining layer opposite the active layer said electrode composed of gallium arsenide phosphide comprising the steps of: (a) preheating said substrate to a temperature between about 640° C. and 660° C. in an atmosphere of arsine and phosphine, (b) depositing said first confining layer on said substrate by vapor deposition at about 700° C., (c) preheating the substrate from Step (b) to between about 640° C. and 660° C. in an atmosphere of phosphine, (d) depositing the active layer on said first confining layer from Step (b) by vapor deposition at about 700° C., (e) preheating the substrate from Step (d) to a temperature between about 640° C. and 660° C. in an atmosphere of arsine and phosphine, (f) depositing on said active layer from Step (d) the second confining layer by vapor deposition at about 700° C., (g) preheating the substrate from Step (f) to a temperature between about 640° C. in an atmosphere of phosphine, (h) depositing on said second confining layer from Step (f) the electrode layer by vapor deposition at about 700° C.