US4091257A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Deep diode devices and method and apparatus
Assignee: General Electric Co
•
Filing: 1976-11-19
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Granted: 1978-05-23
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Expires: 1996-11-19
Abstract
Abstract Deep diodes which extend in straight lines through a silicon wafer are produced by migrating aluminum droplets through the wafer while maintaining a finite temperature gradient through the wafer in the direction of straight line droplet travel, and at the same time maintaining a zero temperature gradient through the wafer in a direction normal to the droplet travel course. Unidirectional heat flow apparatus implementing this method is also disclosed.
Inventors
- 👤 Thomas R. Anthony
- 👤 Harvey E. Cline
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-23 13:12
CPC Classifications
H; H10; H10P; H10P95/00; H10P95/50; Y; Y10; Y10S; Y10S118/00; Y10S118/90
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
146 words
Apparatus for the production of deep diode devices which comprises a refractory metal shell providing a chamber, heat sink means in the chamber, a heat source in the chamber comprising a first refractory metal body spaced from the heat sink means, and combination workpiece support and heat shield means positioned between and spaced from the heat sink means and the heat source body, said support and heat shield means comprising a second refractory metal body having an opening to receive a workpiece with upper and lower sides exposed to the first refractory metal body and to the heat sink means and with edge portions enclosed by the annular opening-defining surface of the second refractory metal body, and a plurality of non-metallic refractory material-spacer elements resting on the heat sink means and bearing against the second refractory metal body at spaced intervals around the workpiece-receiving opening therein.
Claim 2
Dependent Claim
146 words
Apparatus for the production of deep diode devices which comprises a refractory metal shell providing a chamber, heat sink means in the chamber, a heat source in the chamber comprising a first refractory metal body spaced from the heat sink means, and combination workpiece support and heat shield means positioned between and spaced from the heat sink means and the heat source body, said support and heat shield means comprising a second refractory metal body having an opening to receive a workpiece with upper and lower sides exposed to the first refractory metal body and to the heat sink means and with edge portions enclosed by the annular opening-defining surface of the second refractory metal body, and a plurality of non-metallic refractory material-spacer elements resting on the heat sink means and bearing against the second refractory metal body at spaced intervals around the workpiece-receiving opening therein.
Claim 3
Dependent Claim
40 words
Apparatus of claim 1 in which the support and heat shield means also includes non-metallic refractory spacer elements resting on the second refractory metal body at spaced intervals around the workpiece-receiving opening and bearing against the first refractory metal body.
Claim 4
Dependent Claim
39 words
Apparatus of claim 1 in which the refractory metal shell has an electron beam-access opening in its top wall and the first refractory metal body is situated adjacent to the beam-access opening in the upper portion of the chamber.
Claim 5
Dependent Claim
65 words
Apparatus of claim 1 in which the heat sink means comprises a water-cooled copper pedestal of peripheral dimension greater than that of the second refractory metal body, and in which the first and second refractory metal bodies and the heat sink pedestal are disposed substantially coaxially in vertical stacked relation, and in which the workpiece-receiving opening in the second refractory metal body is centrally located.
Claim 6
Dependent Claim
23 words
Apparatus of claim 3 in which the shell has an annular outwardly-extending flange disposed as a hood over the electron beam access opening.
Claim 7
Dependent Claim
17 words
Apparatus of claim 1 in which the second refractory metal body has a plurality of workpiece-receiving openings.
Claim 8
Dependent Claim
28 words
Apparatus of claim 1 in which the second refractory metal body is spaced about three millimeters from both the first refractory metal body and the heat sink means.
Claim 9
Dependent Claim
17 words
Apparatus of claim 6 in which the first refractory metal body is an electrical resistance heater element.
Claim 10
Dependent Claim
37 words
Apparatus of claim 3 in which an electron beam source is provided outside the chamber to direct an electron beam into the top of the shell and against the upper surface of the first refractory metal body.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1981-05-22 | 1981-11-21 | 1982-05-23 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1985-05-22 | 1985-11-21 | 1986-05-23 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1989-05-22 | 1989-11-21 | 1990-05-23 | $7700.00 | Window Closed / Lapsed |