US3617375A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Electron beam evaporated quartz insulating material process
Assignee: Texas Instruments Inc
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Filing: 1969-08-11
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Granted: 1971-11-02
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Expires: 1989-08-11
Abstract
Abstract Disclosed is a method of forming multilevel electrically conductive interconnections for microminiature devices by electron beam evaporation of a layer of quartz over the first level of interconnections. A second level of interconnections are formed on the quartz layer and make ohmic contact to the first level of interconnections through openings in the quartz layer.
Inventors
- 👤 Daniel A Marek
- 👤 Kurt W Kreiselmaier
- 👤 James H Van Tassel
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-24 22:46
CPC Classifications
H; H10; H10P; H10P95/00; H10P14/00; H10P14/60; H10P14/63; H10P14/6326; H10P14/6328; H10P14/6329; H10P14/69; H10P14/692; H10P14/6921; H10P14/69215; H10W; H10W20/00; H10W20/40; Y; Y10; Y10T; Y10T29/00; Y10T29/43
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
87 words
In a method of fabricating an electronic device, the steps of: a. forming a first conductive film upon a substrate; b. electron beam evaporating a first layer of quartz upon said first film; c. polishing the surface of said first layer; d. electron beam evaporating a second layer of quartz upon said cleaned surfaced of said first layer; and e. forming a second conductive film upon said second layer of quartz, said first and second layer electrically isolating said first conductive film from said second conductive film.
Claim 2
Dependent Claim
93 words
In a method for fabricating an electronic device, the steps of: a. forming a first conductive film upon a substrate; b. electron beam evaporating a first layer of quartz upon said first film; c. buffing the surface of said first layer so as to remove dust particles; d. electron beam evaporating a second layer of quartz upon said cleaned surface of said first layer; and e. forming a second conductive film upon said second layer of quartz, said first and second layer electrically isolating said first conductive film from said second conductive film.
References Cited (Backward Citations)
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1974-11-01 | 1975-05-03 | 1975-11-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1978-11-01 | 1979-05-03 | 1979-11-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1982-11-01 | 1983-05-03 | 1983-11-02 | $7700.00 | Window Closed / Lapsed |