Vacuum deposition through plural masks on plural substrates

Claim 2

Apparatus for depositing under vacuum successive plural layers on a plurality of substrates with the use of masks, comprising a vacuum chamber, and in said chamber at least one support carrying substrates, at least one support carrying masks, and means for the vacuum deposition of at least two layers of material contained in evaporative cups on the said substrates through the said masks, said substrate support comprising a horizontal rotating plate, said mask support comprising a rotating plate parallel to the first-mentioned plate, and the means for depositing layers comprising at least one cup containing materials to be disposed on the substrates, a mechanism for changing masks which permits moving the rotatable plates toward and away from each other and advancing one of them with respect to the other, an alignment system for masks relative to the substrates, and drive mechanism for uniformly rotating the assembly of masks and substrates, characterized in that a rotative drive axle of the substrate support and an axle of the mask support are coaxial and in that the mask and substrate supports are secured in the vacuum chamber to the ends of these axles.

Claim 3

Apparatus according to claim 1, characterized in that said axles are concentric, one of said axles being disposed within the other of said axles.

Claim 4

Apparatus for depositing under vacuum successive plural layers on a plurality of substrates with the use of masks, comprising a vacuum chamber, and in said chamber at least one support carrying substrates, at least one support carrying masks, and means for the vacuum deposition of at least two layers of material contained in evaporative cups on the said substrates through the said masks, said substrate support comprising a horizontal rotating plate, said mask support comprising a rotating plate parallel to the first-mentioned plate, and the means for depositing layers comprising at least one cup containing materials to be disposed on the substrates, a mechanism for changing masks which permits moving the rotatable plates toward and away from each other and advancing one of them with respect to the other, an alignment system for masks relative to the substrates, and drive mechanism for uniformly rotating the assembly of masks and substrates, characterized by mask-change mechanism comprising lock means to avoid that a layer i + 2 deposited through the corresponding i + 2 mask will not be disposed directly after layer i without layer i + 1 first being deposited, said mechanism comprising a toothed wheel and a ratchet whose action is controlled by a cam and a coupler.

Claim 5

Apparatus for depositing under vacuum successive plural layers on a plurality of substrates with the use of masks, comprising a vacuum chamber, and in said chamber at least one support carrying substrates, at least one support carrying masks, and means for the vacuum deposition of at least two layers of material contained in evaporative cups on the said substrates through the said masks, said substrate support comprising a horizontal rotating plate, said mask support comprising a rotating plate parallel to the first-mentioned plate, and the means for depositing layers comprising at least one cup containing materials to be disposed on the substrates, a mechanism for changing masks which permits moving the rotatable plates toward and away from each other and advancing one of them with respect to the other, an alignment system for masks relative to the substrates, and drive mechanism for uniformly rotating the assembly of masks and substrates, characterized by mask-change mechanism comprising lock means to avoid that a layer i + 2 deposited through the corresponding i + 2 mask will not be disposed directly after layer i without layer i + 1 first being deposited, said mechanism comprising a toothed wheel and a ratchet whose action is controlled by a cam and a coupler.

Claim 6

Apparatus according to claim 3, characterized in that the ratchet is comprised by an enlarged portion of a nut of the mask-change mechanism having a number of peripheral recesses equal to the number of different masks to be brought into correspondence with the surface of the substrates, the ratchet also comprising an articulated lever carrying a fixed pin which is urged by a spring to a position such that the said pin will be introduced into one of the recesses.

Claim 7

Apparatus according to claim 4, and a second lever articulated on a control cam of the ratchet and cooperating with a pin fixed to the nut to prevent the pin of the ratchet lever from passing from a first recess to a third recess without entering the intermediate recess.

Claim 8

Apparatus for depositing under vacuum successive plural layers on a plurality of substrates with the use of masks, comprising a vacuum chamber, and in said chamber at least one support carrying substrates, at least one support carrying masks, and means for the vacuum deposition of at least two layers of material contained in evaporative cups on the said substrates through the said masks, said substrate support comprising a horizontal rotating plate, said masks support comprising a rotating plate parallel to the first-mentioned plate, and the means for depositing layers comprising at least one cup containing materials to be disposed on the substrates, a mechanism for changing masks which permits moving the rotatable plates toward and away from each other and advancing one of them with respect to the other, an alignment system for masks relative to the substrates, and drive mechanism for uniformly rotating the assembly of masks and substrates, characterized in that the mask mechanism comprises a screwthreaded shaft cooperating with a threaded nut which supports the first-mentioned rotating plate, so as to move together or apart with respect to each other the mask carrier plate and the substrate carrier plate upon relative rotation of said shaft and nut.

Claim 9

Apparatus for depositing under vacuum successive plural layers on a plurality of substrates with the use of masks, comprising a vacuum chamber, and in said chamber at least one support carrying substrates, at least one support carrying masks, and means for the vacuum deposition of at least two layers of material contained in evaporative cups on the said substrates through the said masks, said substrate support comprising a horizontal rotating plate, said masks support comprising a rotating plate parallel to the first-mentioned plate, and the means for depositing layers comprising at least one cup containing materials to be disposed on the substrates, a mechanism for changing masks which permits moving the rotatable plates toward and away from each other and advancing one of them with respect to the other, an alignment system for masks relative to the substrates, and drive mechanism for uniformly rotating the assembly of masks and substrates, characterized in that the mask mechanism comprises a screwthreaded shaft cooperating with a threaded nut which supports the first-mentioned rotating plate, so as to move together or apart with respect to each other the mask carrier plate and the substrate carrier plate upon relative rotation of said shaft and nut.