Patent US3941630A successfully refreshed from Google Patents.
US3941630A
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Method of fabricating a charged couple radiation sensing device
Assignee: RCA Corp
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Filing: 1974-04-29
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Granted: 1976-03-02
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Expires: 1994-04-29
Abstract
Abstract Method of fabricating an image sensing array, such as one of the charge coupled device (CCD) type, with a set of transparent insulated conductors over the image receiving surface. A transparent conductor layer on an insulated substrate surface is covered with a thin layer of aluminum. The desired pattern of electrodes is then defined in the aluminum by, for example, a photolithographic masking and etching process. The aluminum remaining is then anodically oxidized to form aluminum oxide, a transparent insulator. The portions of the transparent conductor not protected by the aluminum oxide are then removed and what remains are transparent conductors covered on top by transparent insulation.
Inventors
- 👤 Robert Dean Larrabee
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-28 23:10
CPC Classifications
H; H10; H10D; H10D64/00; H10D64/60; H10D64/66; H10D64/68; H10D64/681; H10D64/685; H10D44/00; H10D44/40; H10D44/45; H10D44/472; H10D44/476; H10D64/691; H10D64/693; H10D84/00; H10D84/01; H10D84/0198; H10D84/02; H10D84/03; H10D84/038; H10F; H10F39/00; H10F39/10; H10F39/12; H10F39/15; H10P; H10P14/00; H10P14/60; H10P14/63; H10P14/6302; H10P14/6304; H10P14/6314; H10P14/6324; H10P14/66; H10P14/662; H10P14/69; H10P14/692; H10P14/6921; H10P14/69215; H10P14/6938; H10P14/6939; H10P14/69391; H10P14/694; H10P14/6943; H10P14/69433
Claims Analysis
Total Claims: 10
Claim 1
Independent Claim
107 words
A method of fabricating a charge coupled radiation sensing array comprising the steps of: forming an insulating layer on a semiconductor substrate; covering a surface of this layer with a transparent conductor; forming a pattern of gate electrodes on this transparent conductor layer of a metal which, when oxidized, is transparent in a region of the radiation spectrum of interest; oxidizing substantially in its entirety the pattern of gate electrodes to convert the same to a transparent insulating pattern; and etching away that portion of the transparent conductor layer not covered by said insulating pattern to thereby form a pattern of transparent conductors covered by transparent insulation.
Claim 2
Independent Claim
107 words
A method of fabricating a charge coupled radiation sensing array comprising the steps of: forming an insulating layer on a semiconductor substrate; covering a surface of this layer with a transparent conductor; forming a pattern of gate electrodes on this transparent conductor layer of a metal which, when oxidized, is transparent in a region of the radiation spectrum of interest; oxidizing substantially in its entirety the pattern of gate electrodes to convert the same to a transparent insulating pattern; and etching away that portion of the transparent conductor layer not covered by said insulating pattern to thereby form a pattern of transparent conductors covered by transparent insulation.
Claim 3
Dependent Claim
34 words
A method as set forth in claim 1 wherein said step of forming an insulating layer on the substrate comprises forming a silicon dioxide layer then covering that silicon dioxide layer with silicon nitride.
Claim 4
Dependent Claim
30 words
A method as set forth in claim 2, wherein said step of covering a surface of the insulating layer with a transparent conductor comprises sputtering said conductor onto said surface.
Claim 5
Dependent Claim
45 words
A method as set forth in claim 1 wherein the step of forming a pattern of gate electrodes comprises depositing aluminum onto said transparent conductor, defining a masking pattern on said aluminum, and then removing the portions of the aluminum not covered by the pattern.
Claim 6
Dependent Claim
19 words
A method as set forth in claim 4 wherein the deposition of aluminum is carried out in a vacuum.
Claim 7
Dependent Claim
20 words
A method as set forth in claim 4, wherein the step of oxidizing the pattern comprises anodically oxidizing said pattern.
Claim 8
Dependent Claim
15 words
A method as set forth in claim 1, wherein the etching step comprising chemically etching.
Claim 9
Dependent Claim
15 words
A method as set forth in claim 1, wherein the transparent conductor is tin oxide.
Claim 10
Dependent Claim
43 words
A method as set forth in claim 1, wherein said etching step comprises chemically etching and wherein the etching is carried out for a time interval sufficient to cause the pattern of transparent conductors to be undercut beyond the edges of the insulation.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1979-03-02 | 1979-09-01 | 1980-03-02 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1983-03-02 | 1983-09-01 | 1984-03-02 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1987-03-02 | 1987-09-01 | 1988-03-02 | $7700.00 | Window Closed / Lapsed |