US3855112A
Expired / Lapsed
US
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Method of manufacturing interconnection substrate
Assignee: Hitachi Ltd
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Filing: 1974-01-07
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Granted: 1974-12-17
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Expires: 1994-01-07
Abstract
Abstract A method of manufacturing an interconnection substrate, includes the steps of forming the first and second conductor layers of metals which have good ohmic contact and bonding properties on a substrate and each of which can be etched without corroding the other. A thin part of the upper surface of the second metal conductor layer is oxidized to form a porous film and a photoresist film having predetermined pattern is formed on the porous film. Those parts of the porous film and the second layer which are not covered with the photoresist film are etched and the photoresist film is removed. The entire surface of the remaining second metal portions is anodized by employing the first metal layer as an electrode, to form a porous metal oxide film. An additional anodization is effected to form a non-porous metal oxide film at the boundary between the last-mentioned porous film and the interconnection metal portions. Then, a CVD (chemical vapor deposition) film is deposited on the resultant substrate.
Inventors
- 👤 A Tomozawa
- 👤 K Nakata
- 👤 A Kikuchi
- 👤 T Agatsuma
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-25 20:17
CPC Classifications
H; H10; H10W; H10W74/00; H10W74/40; H10W74/43; H10W20/00; H10W20/40
Claims Analysis
Total Claims: 11
Claim 1
Independent Claim
110 words
A METHOD OF MANUFACTURING AN INTERCONECTION ARRANGEMENT ON A SUBSTRATE COMPRISING THE STEPS OF: A. FORMING A FIRST METALLIC LAYER OVERLYING THE SURFACE OF A SUPPORTING SUBSTRATE; B. FORMING A SECOND METALLIC LAYER ON THE SURFACE OF SAID FIRST METALLIC LAYER; C. SHAPING THE SIDE PORTIONS OF SAID SECOND METALLIC LAYER TO HAVING A GRADUALLY SLOPED SURFACE; D. FORMING A POROUS INSULATING FILM COVERING THE ENTIRE EXPOSED SURFACES OF SAID SECOND METALLIC LAYER; AND E. CONVERTING THE SURFACEPORTION OF SAID SECOND METALLIC LYAER FACING SAID POROUS INSULATING FILM INTO A RELATIVELY THIN, NON-POROUS INSULATING LAYER WHICH DIRECTLY COVERS SAID SECOND METALLIC LAYER AND IS DISPOSED BENEATH SAID POROUS INSULATING FILM.
Claim 2
Independent Claim
110 words
A METHOD OF MANUFACTURING AN INTERCONECTION ARRANGEMENT ON A SUBSTRATE COMPRISING THE STEPS OF: A. FORMING A FIRST METALLIC LAYER OVERLYING THE SURFACE OF A SUPPORTING SUBSTRATE; B. FORMING A SECOND METALLIC LAYER ON THE SURFACE OF SAID FIRST METALLIC LAYER; C. SHAPING THE SIDE PORTIONS OF SAID SECOND METALLIC LAYER TO HAVING A GRADUALLY SLOPED SURFACE; D. FORMING A POROUS INSULATING FILM COVERING THE ENTIRE EXPOSED SURFACES OF SAID SECOND METALLIC LAYER; AND E. CONVERTING THE SURFACEPORTION OF SAID SECOND METALLIC LYAER FACING SAID POROUS INSULATING FILM INTO A RELATIVELY THIN, NON-POROUS INSULATING LAYER WHICH DIRECTLY COVERS SAID SECOND METALLIC LAYER AND IS DISPOSED BENEATH SAID POROUS INSULATING FILM.
Claim 3
Dependent Claim
43 words
A method according to claim 1, wherein said step (c) comprises the step of selectively etching said second metallic layer with an etchant, the etching rate of which for said second Metallic layer is considerably greater than that for said first metallic layer.
Claim 4
Dependent Claim
37 words
A method according to claim 2, wherein said first metallic layer is a layer of a metal selected from the group consisting of Ag, Cr-Ag alloy, Cr, Ti and Mo, and said second metallic layer is aluminum.
Claim 5
Dependent Claim
28 words
A method according to claim 2, wherein said step (d) comprises the step of forming a porous metallic oxide on the exposed surfaces of said second metallic layer.
Claim 6
Dependent Claim
26 words
A method according to claim 4, wherein said step (d) comprises anodically oxidizing the exposed surfaces of said second metallic layer to form said metallic oxide.
Claim 7
Dependent Claim
23 words
A method according to claim 5, wherein said second metallic layer is a layer of aluminum and said metallic oxide is porous alumina.
Claim 8
Dependent Claim
40 words
A method according to claim 4, wherein said step (e) comprises the step of anodizing the surface portion of said second metallic layer using an anodizing electrolyte which penetrates through said porous metallic oxide to form a non-porous metallic oxide.
Claim 9
Dependent Claim
29 words
A method according to claim 7, wherein said second metallic layer is a layer of aluminum, said porous metallic oxide is alumina, and said anodizing electrolyte is boric acid.
Claim 10
Dependent Claim
45 words
A method according to claim 1, further comprising the step of: f. etching the exposed portions of said first metallic layer with an etchant, the etching rate of which relative to said first metallic layer is considerably greater than that for said porous insulating film.
Claim 11
Dependent Claim
24 words
A method according to claim 9, further comprising the step of: g. forming a further insulating layer over the entire surface of said substrate.
References Cited (Backward Citations)
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1977-12-16 | 1978-06-17 | 1978-12-17 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1981-12-16 | 1982-06-17 | 1982-12-17 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1985-12-16 | 1986-06-17 | 1986-12-17 | $7700.00 | Window Closed / Lapsed |