US3304595A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Method of making a conductive connection to a semiconductor device electrode
Assignee: NEC Corp
•
Filing: 1963-11-19
•
Granted: 1967-02-21
•
Expires: 1983-11-19
Abstract
No abstract record available.
Inventors
- 👤 Sato Katsuo
- 👤 Irie Toshiaki
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-29 00:33
CPC Classifications
H; H10; H10W; H10W74/00; H10W74/40; H10W74/43; H10W20/00; H10W20/40; H10W72/00; H10W72/90; H10W72/50; H10W72/531; H10W72/5363; H10W72/59
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
157 words
THE METHOD OF MAKING A SEMICONDUCTOR DEVICE WHICH COMPRISES THE STEPS OF FORMING FIRST AND SECOND REGIONS IN A SEMICONDUCTOR MATERIAL, FORMING A SOFT METAL ELECTRODE ON ONE OF SAID REGIONS AND ANOTHER ELECTRODE ON THE OTHER OF SAID REGIONS, PROVIDING A LAYER OF INSULATING MATERIAL OVER SAI ELECTRODES AND THE SURFACE OF SAID SEMICONDUCTOR MATERIAL ADJACENT THERETO. PROVIDING A PLURALITY OF THIN CONDUCTIVE LAYERS SEPARATED FROM ONE ANOTHER ON THE SURFACE OF SAID INSULATING LAYER SO THAT AT LEAST A PORTION OF EACH CONDUCTIVE LAYER OVERLIES A DIFFERENT ELECTRODE, PRESSING A SHARP TOOL AGAINST ONE OF SAID CONDUCTIVE LAYERS TO PIERCE THE INSULATING LAYER IN THE REGION BETWEEN SAID ONE LAYER AND THE ELECTRODE ASSOCIATED THEREWITH AND TO PASS A PORTION OF SAID ONE LAYER THROUGH THE RESULTING RUPTURE IN SAID INSULATING LAYER AND ALSO TO DEFORM SAID LATTER MENTIONED ELECTRODE TO MAKE A PERMANENT ELECTRICAL CONNECTION BETWEEN SAID LATTER MENTIONED ELECTRODE AND SAID ONE LAYER,
Claim 2
Independent Claim
157 words
THE METHOD OF MAKING A SEMICONDUCTOR DEVICE WHICH COMPRISES THE STEPS OF FORMING FIRST AND SECOND REGIONS IN A SEMICONDUCTOR MATERIAL, FORMING A SOFT METAL ELECTRODE ON ONE OF SAID REGIONS AND ANOTHER ELECTRODE ON THE OTHER OF SAID REGIONS, PROVIDING A LAYER OF INSULATING MATERIAL OVER SAI ELECTRODES AND THE SURFACE OF SAID SEMICONDUCTOR MATERIAL ADJACENT THERETO. PROVIDING A PLURALITY OF THIN CONDUCTIVE LAYERS SEPARATED FROM ONE ANOTHER ON THE SURFACE OF SAID INSULATING LAYER SO THAT AT LEAST A PORTION OF EACH CONDUCTIVE LAYER OVERLIES A DIFFERENT ELECTRODE, PRESSING A SHARP TOOL AGAINST ONE OF SAID CONDUCTIVE LAYERS TO PIERCE THE INSULATING LAYER IN THE REGION BETWEEN SAID ONE LAYER AND THE ELECTRODE ASSOCIATED THEREWITH AND TO PASS A PORTION OF SAID ONE LAYER THROUGH THE RESULTING RUPTURE IN SAID INSULATING LAYER AND ALSO TO DEFORM SAID LATTER MENTIONED ELECTRODE TO MAKE A PERMANENT ELECTRICAL CONNECTION BETWEEN SAID LATTER MENTIONED ELECTRODE AND SAID ONE LAYER,
References Cited (Backward Citations)
US2680220A
Cited
US3006067A
Cited
US2899344A
Cited
US2977672A
Cited
US3200468A
Cited
US3191070A
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1970-02-20 | 1970-08-22 | 1971-02-21 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1974-02-20 | 1974-08-22 | 1975-02-21 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1978-02-20 | 1978-08-22 | 1979-02-21 | $7700.00 | Window Closed / Lapsed |