Patent US3544445A successfully refreshed from Google Patents.
US3544445A
Expired / Lapsed
US
⏱️ 0.0 years remaining
Floating shield in a triode sputtering apparatus protecting the base from the discharge
Assignee: Bendix Corp
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Filing: 1966-09-01
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Granted: 1970-12-01
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Expires: 1986-09-01
Abstract
No abstract record available.
Inventors
- 👤 Roger M Moseson
- 👤 John H Smith
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-11-01 09:39
CPC Classifications
H; H01; H01J; H01J37/00; H01J37/32; H01J37/34; H01J37/3402; C; C23; C23C; C23C14/00; C23C14/22; C23C14/34; C23C14/35; C23C14/354; C23C14/355
Claims Analysis
Total Claims: 2
Claim 1
Independent Claim
162 words
AN APPARATUS FOR DEPOSITING THIN FILMS BY SPUTTERING MATERIAL FROM AN ION TARGET ONTO A SUBSTRATE, WHICH COMPRISES: AN ENCLOSURE HAVING A BASE; MEANS FOR EVACUATING SAID ENCLOSURE AND FOR ESTABLISHING AN IONIZABLE ATMOSPHERE THEREIN; A BASE PLATE HAVING A CENTRAL APERTURE, SAID BASE PLATE LOCATED ABOVE AND ELECTRICALLY ISOLATED FROM THE BASE OF SAID ENCLOSURE AND DEFINING A SPUTTERING ZONE ABOVE AND ISOLATED FROM THE BASE AND ISOLATED FROM THE BASE OF SAID ENCLOSURE; MEANS FOR ESTABLISHING AN ION PLASMA IN SAID ZONE, SAID MEANS INCLUDING AN ANODE, A CATHODE, AND A TUBULAR CATHODE SHIELD ENCOMPASSING SAID CATHODE, WITH SAID SHIELD EXTENDING THROUGH THE CENTRAL APERTURE AND ELECTRICAL ISOLATED FROM SAID BASE PLATE; MEANS FOR POSITIONING THE ION TARGET INSIDE SAID ZONE; MEANS FOR APPLYING AN ELECTRICAL BIAS TO THE ION TARGET TO ATTRACT IONS TO THE TARGET AND SPUTTER MATERIAL THEREFROM; AND MEANS FOR POSITIONING THE SUBSTRATE INSIDE SAID ZONE FOR THE RECEPTION OF MATERIAL SPUTTERED FROM THE ION TARGET.
Claim 2
Independent Claim
162 words
AN APPARATUS FOR DEPOSITING THIN FILMS BY SPUTTERING MATERIAL FROM AN ION TARGET ONTO A SUBSTRATE, WHICH COMPRISES: AN ENCLOSURE HAVING A BASE; MEANS FOR EVACUATING SAID ENCLOSURE AND FOR ESTABLISHING AN IONIZABLE ATMOSPHERE THEREIN; A BASE PLATE HAVING A CENTRAL APERTURE, SAID BASE PLATE LOCATED ABOVE AND ELECTRICALLY ISOLATED FROM THE BASE OF SAID ENCLOSURE AND DEFINING A SPUTTERING ZONE ABOVE AND ISOLATED FROM THE BASE AND ISOLATED FROM THE BASE OF SAID ENCLOSURE; MEANS FOR ESTABLISHING AN ION PLASMA IN SAID ZONE, SAID MEANS INCLUDING AN ANODE, A CATHODE, AND A TUBULAR CATHODE SHIELD ENCOMPASSING SAID CATHODE, WITH SAID SHIELD EXTENDING THROUGH THE CENTRAL APERTURE AND ELECTRICAL ISOLATED FROM SAID BASE PLATE; MEANS FOR POSITIONING THE ION TARGET INSIDE SAID ZONE; MEANS FOR APPLYING AN ELECTRICAL BIAS TO THE ION TARGET TO ATTRACT IONS TO THE TARGET AND SPUTTER MATERIAL THEREFROM; AND MEANS FOR POSITIONING THE SUBSTRATE INSIDE SAID ZONE FOR THE RECEPTION OF MATERIAL SPUTTERED FROM THE ION TARGET.
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USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 1973-11-30 | 1974-06-01 | 1974-12-01 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 1977-11-30 | 1978-06-01 | 1978-12-01 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 1981-11-30 | 1982-06-01 | 1982-12-01 | $7700.00 | Window Closed / Lapsed |