Patent US8068209B2 successfully refreshed from Google Patents.
US8068209B2
Active / In Force
US
⏱️ 1.4 years remaining
Nozzle to help reduce the escape of immersion liquid from an immersion lithography tool
Assignee: Nikon Corp
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Filing: 2008-03-10
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Granted: 2011-11-29
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Expires: 2028-03-10
Abstract
Abstract An immersion lithography tool with a diverter element, positioned between the immersion element and the substrate, for altering the “footprint” or shape of the meniscus of the body of immersion liquid between the last optical element and an immersion element on one side, and the substrate on the other side when the substrate is moved. The apparatus includes a substrate holder to hold the substrate having an imaging surface and a projection optical system having a last optical element. The projection optical system projects an image onto a target imaging area on the substrate through the immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element. An immersion element maintains the immersion fluid in the gap. The diverter element is positioned between the immersion element and the substrate. The diverter element alters the footprint shape of the meniscus of the body of immersion liquid, thereby preventing or reducing the amount of leakage from a space between the substrate and the immersion element.
Inventors
- 👤 Alex Ka Tim Poon
- 👤 Leonard Wai Fung Kho
- 👤 Guarav Keswani
- 👤 Derek Coon
Bibliographic Details
Application Number
—
Jurisdiction
US
Data Source
google_patents
Last Synchronized
2026-10-30 07:13
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70216; G03F7/70341
Claims Analysis
Total Claims: 9
Claim 1
Independent Claim
223 words
An apparatus, comprising: a substrate holder configured to hold a substrate having an imaging surface; a projection optical system having a last optical element and an optical axis, the projection optical system configured to project an image onto a target imaging area on the imaging surface of the substrate through an immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element; an immersion element which maintains the immersion liquid in the gap between the imaging surface of the substrate and the last optical element, the immersion element including an aperture through which the image is projected onto the substrate and a non-fluid removal area which surrounds the aperture; and a plurality of plates positioned between the immersion element and the substrate such that there is a first gap in a direction of the optical axis between the immersion element and the plurality of plates and a second gap in the direction of the optical axis between the plurality of plates and the substrate, the plurality of plates being provided further away from the aperture than is the non-fluid removal area in a radial direction perpendicular to the optical axis, the plurality of plates being arranged in succession in the radial direction, and the plurality of plates being spaced from one another in the radial direction.
Claim 2
Independent Claim
223 words
An apparatus, comprising: a substrate holder configured to hold a substrate having an imaging surface; a projection optical system having a last optical element and an optical axis, the projection optical system configured to project an image onto a target imaging area on the imaging surface of the substrate through an immersion liquid filled in a gap between the imaging surface of the substrate and the last optical element; an immersion element which maintains the immersion liquid in the gap between the imaging surface of the substrate and the last optical element, the immersion element including an aperture through which the image is projected onto the substrate and a non-fluid removal area which surrounds the aperture; and a plurality of plates positioned between the immersion element and the substrate such that there is a first gap in a direction of the optical axis between the immersion element and the plurality of plates and a second gap in the direction of the optical axis between the plurality of plates and the substrate, the plurality of plates being provided further away from the aperture than is the non-fluid removal area in a radial direction perpendicular to the optical axis, the plurality of plates being arranged in succession in the radial direction, and the plurality of plates being spaced from one another in the radial direction.
Claim 3
Dependent Claim
35 words
The apparatus of claim 1 , wherein the immersion element has a bottom surface a part of which faces the substrate, the plurality of plates being arranged along the bottom surface of the immersion element.
Claim 4
Dependent Claim
45 words
The apparatus of claim 2 , wherein the immersion element includes a fluid removal element through which the immersion liquid between the immersion element and the substrate is removed, the bottom surface of the immersion element includes the bottom surface of the fluid removal element.
Claim 5
Dependent Claim
21 words
The apparatus of claim 3 , wherein the plurality of plates are disposed between the fluid removal element and the substrate.
Claim 6
Dependent Claim
33 words
The apparatus of claim 4 , wherein the plurality of plates have respective top surfaces which face the bottom surface of the fluid removal element, and respective bottom surfaces which face the substrate.
Claim 7
Dependent Claim
15 words
The apparatus of claim 5 , wherein the bottom surfaces of the plates are liquid-phobic.
Claim 8
Dependent Claim
15 words
The apparatus of claim 5 , wherein the top surfaces of the plates are liquid-philic.
Claim 9
Dependent Claim
37 words
A device manufacturing method comprising: exposing a substrate by projecting a pattern image onto the substrate through an immersion liquid and the projection optical system of the apparatus of claim 1 ; and developing the exposed substrate.
References Cited (Backward Citations)
US4509852A
Cited
EP1420299A2
Cited
US20060023182A1
Cited
EP1477856A1
Cited
US20050007569A1
Cited
WO2005024517A2
Cited
US20060152697A1
Cited
WO2005111722A2
Cited
WO2005119742A1
Cited
EP1768169A1
Cited
US20070139628A1
Cited
US20060250593A1
Cited
US20060038968A1
Cited
US7474379B2
Cited
US20070110213A1
Cited
US20070109512A1
Cited
US20070279608A1
Cited
USPTO Annuity & Maintenance Windows
| Annuity Stage | Window Opens | Payment Deadline | Surcharge Period Until | Estimated Fee | Status |
|---|---|---|---|---|---|
| 3.5 Years (Year 4) | 2014-11-28 | 2015-05-30 | 2015-11-29 | $2000.00 | Window Closed / Lapsed |
| 7.5 Years (Year 8) | 2018-11-28 | 2019-05-30 | 2019-11-29 | $3760.00 | Window Closed / Lapsed |
| 11.5 Years (Year 12) | 2022-11-28 | 2023-05-30 | 2023-11-29 | $7700.00 | Window Closed / Lapsed |