EP1420299A2
Expired / Lapsed
EP
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Immersion lithographic apparatus and device manufacturing method
Assignee: ASML Netherlands BV
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Filing: 2003-11-10
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Granted: —
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Expires: 2023-11-10
Abstract
Abstract In a lithographic projection apparatus a liquid supply system maintains liquid in a space between the final element of the projection system and the substrate of the lithographic projection apparatus. A shutter member (150) is provided to take the place of the substrate in containing the liquid (11) in the liquid supply system during substrate exchange.
Inventors
- 👤 Joeri Lof
- 👤 Antonius Theodorus Anna Maria Derksen
- 👤 Christiaan Alexander Hoogendam
- 👤 Erik Roelof Loopstra
- 👤 Johannes Catharinus Hubertus Mulkens
- 👤 Alexander Straaijer
- 👤 Bob Streefkerk
- 👤 Sjoerd Nicolaas Lambertus Donders
- 👤 Jeroen Johannes Sophia Maria Mertens
- 👤 Timotheus Franciscus Sengers
Bibliographic Details
Application Number
—
Jurisdiction
EP
Data Source
google_patents
Last Synchronized
2026-10-30 05:31
CPC Classifications
G; G03; G03F; G03F7/00; G03F7/70; G03F7/70691; G03F7/707; G03F7/70216; G03F7/70341; G03F7/708; G03F7/7085; G03F7/70908; G03F7/70916
Claims Analysis
Total Claims: 16
Claim 1
Independent Claim
110 words
A lithographic projection apparatus comprising: a radiation system for providing a projection beam of radiation; a support structure for supporting patterning means, the patterning means serving
to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; a projection system for projecting the patterned beam onto a target portion of the
substrate; and a liquid supply system for providing an immersion liquid to a space between the
final element of said projection system and said substrate; characterised in that said apparatus further comprises means for keeping said final element
in contact with liquid when said substrate is moved away from under said projection
system.
Claim 2
Dependent Claim
49 words
An apparatus according to claim 1, wherein said means for keeping comprises a
shutter member positionable on a side of said supply system opposite said projection
system such that said immersion liquid can be confined in said liquid supply system and
between said projection system and said shutter member.
Claim 3
Dependent Claim
17 words
An apparatus according to claim 2, wherein said shutter member is a surface of
said substrate table.
Claim 4
Dependent Claim
18 words
An apparatus according to claim 2, wherein said shutter member is separable from
the remainder of said apparatus.
Claim 5
Dependent Claim
28 words
An apparatus according to claim 4, wherein said shutter member and/or said
substrate table has or have means for releasably holding said shutter member to said
substrate table.
Claim 6
Dependent Claim
22 words
An apparatus according to claim 4 or 5, further comprising means for releasably
attaching said shutter member to said liquid supply system.
Claim 7
Dependent Claim
23 words
An apparatus according to claim 5 or 6, wherein said means for releasably holding
and/or said means for releasably attaching comprise magnetic means.
Claim 8
Dependent Claim
38 words
An apparatus according to claim 5, 6 or 7, wherein said means for releasably
holding and/or said means for releasably attaching comprise a vacuum outlet for attracting
said shutter member to said substrate table and/or liquid supply system.
Claim 9
Dependent Claim
61 words
An apparatus according to claim 8, wherein said liquid supply system comprises a
seal member which extends along at least part of the boundary of said space for containing
said liquid and which comprises a low pressure source for sealing between said seal
member and said substrate, said low pressure source forming at least part of said means for
releasably attaching.
Claim 10
Independent Claim
35 words
An apparatus according to any one of claims 2 to 9, wherein, in a stowed position,
said shutter member has a primary surface substantially co-planar with a surface of said
substrate facing said final element.
Claim 11
Independent Claim
23 words
An apparatus according to any one of claims 2 to 10, wherein said shutter member
comprises a mark for guiding said shutter member.
Claim 12
Dependent Claim
21 words
An apparatus according to claim 11, further comprising a sensor for measuring the
position of said shutter member using said mark.
Claim 13
Independent Claim
55 words
An apparatus according to any one of claims 2 to 12, wherein the liquid supply
system comprises a seal member extending along at least a part of the boundary of said
space between the final element and the substrate table and wherein said shutter member,
when confining said liquid, is positioned in said seal member.
Claim 14
Independent Claim
34 words
An apparatus according to any one of the preceding claims, wherein said liquid
supply system comprises means for removing liquid from said space and a gas inlet for
providing flushing gas in said space.
Claim 15
Independent Claim
121 words
A device manufacturing method comprising the steps of: providing a substrate that is at least partially covered by a layer of radiation-sensitive
material; providing a projection beam of radiation using a radiation system; using patterning means to endow the projection beam with a pattern in its cross-section; providing an immersion liquid at least partly filling a space between the final
element of a projection system used in said step of projecting and a said substrate; projecting the patterned beam of radiation onto a target portion of the layer of
radiation-sensitive material; moving said substrate away from under said projection system; characterized maintaining said final element in contact with liquid after said substrate has
been moved away from under said projection system.
Claim 16
Dependent Claim
57 words
A method according to claim 15, wherein said final element is maintained in
contact with said immersion liquid by positioning a shutter member on a side of said liquid
supply system opposite to said projection system such that said immersion liquid is
confined in said liquid supply system and between said projection system and said shutter
member.
References Cited (Backward Citations)
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