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Nonvolatile semiconductor memory device and its manufacturing method

Assignee: Toshiba Corp
•
Filing: 2000-12-11
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Granted: 2004-04-13
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Expires: 2020-12-11
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Abstract

Abstract A non-volatile semiconductor memory device, which is intended to prevent data destruction by movements of electric charges between floating gates and thereby improve the reliability, includes element isolation/insulation films buried into a silicon substrate to isolate stripe-shaped element-forming regions. Formed on the substrate area floating gate via a first gate insulating film and further a control gate via a second gate insulating film. Source and drain diffusion layers are formed in self-alignment with control gates. The second gate insulating film on the floating gate is divided and separated together with the floating gate by slits above the element isolation/insulation films into discrete portions of individual memory cells.

Inventors

  • 👤 Tadashi Iguchi
  • 👤 Yoshiaki Himeno
  • 👤 Hiroaki Tsunoda

Bibliographic Details

Application Number —
Jurisdiction US
Data Source google_patents
Last Synchronized 2026-11-03 12:12
CPC Classifications
H; H10; H10B; H10B41/00; H10B41/30; H10B41/35; H10B69/00; H10D; H10D30/00; H10D30/01; H10D30/021; H10D30/0411

Claims Analysis

Total Claims: 3
Claim 1
Independent Claim 157 words
A nonvolatile semiconductor memory device comprising: a semiconductor substrate; a plurality of element-forming regions partitioned by element isolation/insulation films in said semiconductor substrate; floating gates formed in said element-forming regions via a first gate insulating film and separated for individual of said element-forming regions, a level of a top surface of said first gate insulating film being lower than a level of a top surface of said element isolation/insulation film and a part of said floating gates reaching a side surface of said element isolation/insulation films; a second gate insulating film formed on said floating gates, at least a part of said second gate insulating film reaching a top surface of said element isolation/insulation films; control gates formed on said floating gates by said second gate insulating films; and source and drain diffusion layers formed in self-alignment with said control ages, wherein said second gate insulating film is divided and separated only above said element isolation/insulation films.
Claim 2
Dependent Claim 157 words
A nonvolatile semiconductor memory device comprising: a semiconductor substrate; a plurality of element-forming regions partitioned by element isolation/insulation films in said semiconductor substrate; floating gates formed in said element-forming regions via a first gate insulating film and separated for individual of said element-forming regions, a level of a top surface of said first gate insulating film being lower than a level of a top surface of said element isolation/insulation film and a part of said floating gates reaching a side surface of said element isolation/insulation films; a second gate insulating film formed on said floating gates, at least a part of said second gate insulating film reaching a top surface of said element isolation/insulation films; control gates formed on said floating gates by said second gate insulating films; and source and drain diffusion layers formed in self-alignment with said control ages, wherein said second gate insulating film is divided and separated only above said element isolation/insulation films.
Claim 3
Dependent Claim 29 words
The nonvolatile semiconductor memory device according to claim 1 , wherein each said second gate insulating film is a multi-layered film including silicon oxide film/silicon nitride film/silicon oxide film.

USPTO Annuity & Maintenance Windows

Annuity Stage Window Opens Payment Deadline Surcharge Period Until Estimated Fee Status
3.5 Years (Year 4) 2007-04-13 2007-10-13 2008-04-13 $2000.00 Window Closed / Lapsed
7.5 Years (Year 8) 2011-04-13 2011-10-13 2012-04-13 $3760.00 Window Closed / Lapsed
11.5 Years (Year 12) 2015-04-13 2015-10-13 2016-04-13 $7700.00 Window Closed / Lapsed

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